FR2292057A1 - Bain galvanique pour nickelage brillant - Google Patents
Bain galvanique pour nickelage brillantInfo
- Publication number
- FR2292057A1 FR2292057A1 FR7438112A FR7438112A FR2292057A1 FR 2292057 A1 FR2292057 A1 FR 2292057A1 FR 7438112 A FR7438112 A FR 7438112A FR 7438112 A FR7438112 A FR 7438112A FR 2292057 A1 FR2292057 A1 FR 2292057A1
- Authority
- FR
- France
- Prior art keywords
- alkyl
- cpd
- 2chch2o
- ch2cl
- bright nickel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
- C25D3/16—Acetylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
- C25D3/18—Heterocyclic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7438112A FR2292057A1 (fr) | 1974-11-20 | 1974-11-20 | Bain galvanique pour nickelage brillant |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7438112A FR2292057A1 (fr) | 1974-11-20 | 1974-11-20 | Bain galvanique pour nickelage brillant |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2292057A1 true FR2292057A1 (fr) | 1976-06-18 |
FR2292057B3 FR2292057B3 (fr) | 1977-05-20 |
Family
ID=9145073
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7438112A Granted FR2292057A1 (fr) | 1974-11-20 | 1974-11-20 | Bain galvanique pour nickelage brillant |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2292057A1 (fr) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2317381A1 (fr) * | 1975-06-23 | 1977-02-04 | Dart Ind Inc | Composition de galvanoplastie ou de revetement electrolytique et agent brillanteur pour depots electrolytiques de nickel brillant |
WO1993009275A1 (fr) * | 1991-10-30 | 1993-05-13 | Basf Aktiengesellschaft | Procede de fabrication de pieces moulees nickelees |
WO1993015241A1 (fr) * | 1992-01-25 | 1993-08-05 | Basf Aktiengesellschaft | Procede de fabrication de pieces moulees nickelees |
EP2801640A1 (fr) * | 2013-05-08 | 2014-11-12 | ATOTECH Deutschland GmbH | Bain électrolytique de nickel galvanique ou d'alliage de nickel pour déposer un alliage de nickel ou de nickel mi-lustré |
JP2016535166A (ja) * | 2013-11-06 | 2016-11-10 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | レベラーとしての窒素含有ポリマー |
-
1974
- 1974-11-20 FR FR7438112A patent/FR2292057A1/fr active Granted
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2317381A1 (fr) * | 1975-06-23 | 1977-02-04 | Dart Ind Inc | Composition de galvanoplastie ou de revetement electrolytique et agent brillanteur pour depots electrolytiques de nickel brillant |
WO1993009275A1 (fr) * | 1991-10-30 | 1993-05-13 | Basf Aktiengesellschaft | Procede de fabrication de pieces moulees nickelees |
WO1993015241A1 (fr) * | 1992-01-25 | 1993-08-05 | Basf Aktiengesellschaft | Procede de fabrication de pieces moulees nickelees |
EP2801640A1 (fr) * | 2013-05-08 | 2014-11-12 | ATOTECH Deutschland GmbH | Bain électrolytique de nickel galvanique ou d'alliage de nickel pour déposer un alliage de nickel ou de nickel mi-lustré |
WO2014180595A1 (fr) * | 2013-05-08 | 2014-11-13 | Atotech Deutschland Gmbh | Bain galvanoplastique à base de nickel galvanique ou d'un alliage de nickel pour déposer un nickel ou un alliage de nickel semi-brillant, procédé galvanoplastique et utilisation d'un tel bain et composés pour ledit bain |
US20160053395A1 (en) * | 2013-05-08 | 2016-02-25 | Atotech Deutschland Gmbh | Galvanic nickel or nickel alloy electroplating bath for depositing a semi-bright nickel or nickel alloy |
US9752244B2 (en) | 2013-05-08 | 2017-09-05 | Atotech Deutschland Gmbh | Galvanic nickel electroplating bath for depositing a semi-bright nickel |
US9790607B1 (en) | 2013-05-08 | 2017-10-17 | Atotech Deutschland Gmbh | 3-(carbamoyl) pyridinium-1-YL-propane-1-sulfonates useful in electroplating baths |
JP2016535166A (ja) * | 2013-11-06 | 2016-11-10 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | レベラーとしての窒素含有ポリマー |
Also Published As
Publication number | Publication date |
---|---|
FR2292057B3 (fr) | 1977-05-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |