PH26861A - Method for preparing lithographically sensitive branched novolaks using a mannich base intermediate - Google Patents

Method for preparing lithographically sensitive branched novolaks using a mannich base intermediate Download PDF

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Publication number
PH26861A
PH26861A PH40380A PH40380A PH26861A PH 26861 A PH26861 A PH 26861A PH 40380 A PH40380 A PH 40380A PH 40380 A PH40380 A PH 40380A PH 26861 A PH26861 A PH 26861A
Authority
PH
Philippines
Prior art keywords
phenol
polymer
preparing
branched
acid
Prior art date
Application number
PH40380A
Other languages
English (en)
Inventor
Leonard Edward Bogan Jr
Original Assignee
Rohm & Haas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm & Haas filed Critical Rohm & Haas
Publication of PH26861A publication Critical patent/PH26861A/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/10Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Materials For Photolithography (AREA)
PH40380A 1989-05-12 1990-04-17 Method for preparing lithographically sensitive branched novolaks using a mannich base intermediate PH26861A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/351,154 US4939229A (en) 1989-05-12 1989-05-12 Method for preparing lithographically sensitive branched novolaks using a mannich base intermediate

Publications (1)

Publication Number Publication Date
PH26861A true PH26861A (en) 1992-11-16

Family

ID=23379799

Family Applications (1)

Application Number Title Priority Date Filing Date
PH40380A PH26861A (en) 1989-05-12 1990-04-17 Method for preparing lithographically sensitive branched novolaks using a mannich base intermediate

Country Status (14)

Country Link
US (1) US4939229A (pt)
EP (1) EP0399691A3 (pt)
JP (1) JPH0347820A (pt)
KR (1) KR900018187A (pt)
CN (1) CN1022690C (pt)
AU (1) AU635929B2 (pt)
BR (1) BR9001952A (pt)
CA (1) CA2014644A1 (pt)
FI (1) FI902376A0 (pt)
IL (1) IL94352A0 (pt)
MY (1) MY105698A (pt)
NO (1) NO902062L (pt)
PH (1) PH26861A (pt)
ZA (1) ZA903559B (pt)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5091282A (en) * 1989-04-03 1992-02-25 Kabushiki Kaisha Toshiba Alkali soluble phenol polymer photosensitive composition
CA2015721A1 (en) * 1989-05-12 1990-11-12 Karen Ann Graziano Method of using highly branched novolaks in photoresists
EP1035438A3 (en) * 1999-03-12 2000-09-20 Shipley Company LLC Phenolic resins and photoresist compositions comprising same
TWI263861B (en) * 1999-03-26 2006-10-11 Shinetsu Chemical Co Resist material and pattern forming method
KR100994818B1 (ko) * 2002-03-04 2010-11-16 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨 단파장 이미지화용 네거티브 포토레지스트
US6828383B2 (en) * 2002-12-13 2004-12-07 Occidental Petroleum Phenolic modified resorcinolic resins for rubber compounding
US7425402B2 (en) * 2003-08-13 2008-09-16 Agfa Graphics, N.V. Heat-sensitive lithographic printing plate precursor
US7205084B2 (en) * 2003-12-18 2007-04-17 Agfa-Gevaert Heat-sensitive lithographic printing plate precursor
WO2016021594A1 (ja) * 2014-08-08 2016-02-11 日産化学工業株式会社 芳香族メチロール化合物が反応したノボラック樹脂を含むレジスト下層膜形成組成物

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2147789A (en) * 1936-05-29 1939-02-21 Du Pont Resins from aminophenols and formaldehyde
US2431011A (en) * 1941-01-29 1947-11-18 Standard Oil Dev Co Corrosive inhibited additive for mineral lubricating oil composition
US2636019A (en) * 1951-06-26 1953-04-21 Research Corp Ion exchange resins from a trifunctional phenol, formaldehyde and a mannich base made from a trifunctional phenol, formaldehyde and a dialkylamine, morpholine or piperidine
JPS57102960A (en) * 1972-09-14 1982-06-26 Yoshizaki Kozo Production of thermosetting resin paint
EP0070624B1 (en) * 1981-06-22 1986-11-20 Philip A. Hunt Chemical Corporation Novolak resin and a positive photoresist composition containing the same
JPS58101108A (ja) * 1981-12-11 1983-06-16 Unitika Ltd キレ−ト形成基を有するフエノ−ル樹脂とその製造方法及び吸着処理方法
US4500691A (en) * 1983-01-13 1985-02-19 Ciba-Geigy Corporation Phenol-novolaks containing amino groups
US4474929A (en) * 1983-09-30 1984-10-02 The Dow Chemical Company Polyglycidyl ethers of branched novolacs
US4468507A (en) * 1983-11-21 1984-08-28 The Dow Chemical Company Method of limiting rate of heat evolution during acid-catalyzed phenol/polymethylolphenol condensations
SU1154297A1 (ru) * 1984-01-04 1985-05-07 Предприятие П/Я В-2304 Герметизирующа порошкова композици
US4571374A (en) * 1984-12-27 1986-02-18 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive
EP0662636A3 (en) * 1986-10-23 1995-11-22 Ciba Geigy Ag Imaging processes.
CA2015721A1 (en) * 1989-05-12 1990-11-12 Karen Ann Graziano Method of using highly branched novolaks in photoresists

Also Published As

Publication number Publication date
CA2014644A1 (en) 1990-11-12
IL94352A0 (en) 1991-03-10
CN1047309A (zh) 1990-11-28
ZA903559B (en) 1991-01-30
MY105698A (en) 1994-11-30
JPH0347820A (ja) 1991-02-28
AU5488490A (en) 1990-11-15
NO902062L (no) 1990-11-13
CN1022690C (zh) 1993-11-10
KR900018187A (ko) 1990-12-20
EP0399691A2 (en) 1990-11-28
EP0399691A3 (en) 1991-04-03
BR9001952A (pt) 1991-07-30
US4939229A (en) 1990-07-03
AU635929B2 (en) 1993-04-08
FI902376A0 (fi) 1990-05-11
NO902062D0 (no) 1990-05-10

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