ZA903559B - Method for preparing lithographically sensitive branched novolaks - Google Patents

Method for preparing lithographically sensitive branched novolaks

Info

Publication number
ZA903559B
ZA903559B ZA903559A ZA903559A ZA903559B ZA 903559 B ZA903559 B ZA 903559B ZA 903559 A ZA903559 A ZA 903559A ZA 903559 A ZA903559 A ZA 903559A ZA 903559 B ZA903559 B ZA 903559B
Authority
ZA
South Africa
Prior art keywords
preparing
novolaks
lithographically sensitive
lithographically
branched novolaks
Prior art date
Application number
ZA903559A
Other languages
English (en)
Inventor
Leonard Edward Bogan Jr
Edward Bogan Leonard Jr
Original Assignee
Rohm & Haas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm & Haas filed Critical Rohm & Haas
Publication of ZA903559B publication Critical patent/ZA903559B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/10—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Materials For Photolithography (AREA)
ZA903559A 1989-05-12 1990-05-10 Method for preparing lithographically sensitive branched novolaks ZA903559B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/351,154 US4939229A (en) 1989-05-12 1989-05-12 Method for preparing lithographically sensitive branched novolaks using a mannich base intermediate

Publications (1)

Publication Number Publication Date
ZA903559B true ZA903559B (en) 1991-01-30

Family

ID=23379799

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA903559A ZA903559B (en) 1989-05-12 1990-05-10 Method for preparing lithographically sensitive branched novolaks

Country Status (14)

Country Link
US (1) US4939229A (pt)
EP (1) EP0399691A3 (pt)
JP (1) JPH0347820A (pt)
KR (1) KR900018187A (pt)
CN (1) CN1022690C (pt)
AU (1) AU635929B2 (pt)
BR (1) BR9001952A (pt)
CA (1) CA2014644A1 (pt)
FI (1) FI902376A0 (pt)
IL (1) IL94352A0 (pt)
MY (1) MY105698A (pt)
NO (1) NO902062L (pt)
PH (1) PH26861A (pt)
ZA (1) ZA903559B (pt)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0396254B1 (en) * 1989-04-03 1996-07-10 Kabushiki Kaisha Toshiba Photosensitive composition and pattern formation method using the same
CA2015721A1 (en) * 1989-05-12 1990-11-12 Karen Ann Graziano Method of using highly branched novolaks in photoresists
EP1035438A3 (en) * 1999-03-12 2000-09-20 Shipley Company LLC Phenolic resins and photoresist compositions comprising same
US6455223B1 (en) * 1999-03-26 2002-09-24 Shin-Etsu Chemical Co., Ltd. Resist compositions and patterning process
WO2003077029A1 (en) * 2002-03-04 2003-09-18 Shipley Company, Llc Negative photoresists for short wavelength imaging
US6828383B2 (en) * 2002-12-13 2004-12-07 Occidental Petroleum Phenolic modified resorcinolic resins for rubber compounding
US7425402B2 (en) * 2003-08-13 2008-09-16 Agfa Graphics, N.V. Heat-sensitive lithographic printing plate precursor
US7205084B2 (en) * 2003-12-18 2007-04-17 Agfa-Gevaert Heat-sensitive lithographic printing plate precursor
JP6703308B2 (ja) * 2014-08-08 2020-06-03 日産化学株式会社 芳香族メチロール化合物が反応したノボラック樹脂を含むレジスト下層膜形成組成物

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2147789A (en) * 1936-05-29 1939-02-21 Du Pont Resins from aminophenols and formaldehyde
US2431011A (en) * 1941-01-29 1947-11-18 Standard Oil Dev Co Corrosive inhibited additive for mineral lubricating oil composition
US2636019A (en) * 1951-06-26 1953-04-21 Research Corp Ion exchange resins from a trifunctional phenol, formaldehyde and a mannich base made from a trifunctional phenol, formaldehyde and a dialkylamine, morpholine or piperidine
JPS57102960A (en) * 1972-09-14 1982-06-26 Yoshizaki Kozo Production of thermosetting resin paint
DE3274354D1 (en) * 1981-06-22 1987-01-08 Hunt Chem Corp Philip A Novolak resin and a positive photoresist composition containing the same
JPS58101108A (ja) * 1981-12-11 1983-06-16 Unitika Ltd キレ−ト形成基を有するフエノ−ル樹脂とその製造方法及び吸着処理方法
US4500691A (en) * 1983-01-13 1985-02-19 Ciba-Geigy Corporation Phenol-novolaks containing amino groups
US4474929A (en) * 1983-09-30 1984-10-02 The Dow Chemical Company Polyglycidyl ethers of branched novolacs
US4468507A (en) * 1983-11-21 1984-08-28 The Dow Chemical Company Method of limiting rate of heat evolution during acid-catalyzed phenol/polymethylolphenol condensations
SU1154297A1 (ru) * 1984-01-04 1985-05-07 Предприятие П/Я В-2304 Герметизирующа порошкова композици
US4571374A (en) * 1984-12-27 1986-02-18 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive
EP0662636A3 (en) * 1986-10-23 1995-11-22 Ciba Geigy Ag Imaging processes.
CA2015721A1 (en) * 1989-05-12 1990-11-12 Karen Ann Graziano Method of using highly branched novolaks in photoresists

Also Published As

Publication number Publication date
NO902062D0 (no) 1990-05-10
CA2014644A1 (en) 1990-11-12
US4939229A (en) 1990-07-03
EP0399691A2 (en) 1990-11-28
CN1022690C (zh) 1993-11-10
FI902376A0 (fi) 1990-05-11
NO902062L (no) 1990-11-13
MY105698A (en) 1994-11-30
CN1047309A (zh) 1990-11-28
AU635929B2 (en) 1993-04-08
PH26861A (en) 1992-11-16
IL94352A0 (en) 1991-03-10
AU5488490A (en) 1990-11-15
JPH0347820A (ja) 1991-02-28
EP0399691A3 (en) 1991-04-03
KR900018187A (ko) 1990-12-20
BR9001952A (pt) 1991-07-30

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