NO912074L - Fremgangsmaate og apparat for rensing av silisium. - Google Patents

Fremgangsmaate og apparat for rensing av silisium.

Info

Publication number
NO912074L
NO912074L NO91912074A NO912074A NO912074L NO 912074 L NO912074 L NO 912074L NO 91912074 A NO91912074 A NO 91912074A NO 912074 A NO912074 A NO 912074A NO 912074 L NO912074 L NO 912074L
Authority
NO
Norway
Prior art keywords
procedure
silicon cleaning
silicon
cleaning
Prior art date
Application number
NO91912074A
Other languages
English (en)
Other versions
NO912074D0 (no
NO310347B1 (no
Inventor
Noriyoshi Yuge
Hiroyuki Baba
Fukuo Arantani
Original Assignee
Kawasaki Steel Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Co filed Critical Kawasaki Steel Co
Publication of NO912074D0 publication Critical patent/NO912074D0/no
Publication of NO912074L publication Critical patent/NO912074L/no
Publication of NO310347B1 publication Critical patent/NO310347B1/no

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/037—Purification
NO19912074A 1990-05-30 1991-05-29 Fremgangsmåte for rensing av silisium NO310347B1 (no)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP13826890 1990-05-30
JP13826690 1990-05-30
JP10434291A JP3205352B2 (ja) 1990-05-30 1991-05-09 シリコン精製方法及び装置

Publications (3)

Publication Number Publication Date
NO912074D0 NO912074D0 (no) 1991-05-29
NO912074L true NO912074L (no) 1991-12-02
NO310347B1 NO310347B1 (no) 2001-06-25

Family

ID=27310203

Family Applications (1)

Application Number Title Priority Date Filing Date
NO19912074A NO310347B1 (no) 1990-05-30 1991-05-29 Fremgangsmåte for rensing av silisium

Country Status (6)

Country Link
US (1) US5182091A (no)
EP (1) EP0459421B1 (no)
JP (1) JP3205352B2 (no)
CA (1) CA2043492C (no)
DE (1) DE69124287T2 (no)
NO (1) NO310347B1 (no)

Families Citing this family (50)

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US5346724A (en) * 1991-04-12 1994-09-13 Nippon Oil Company, Ltd. Oil and fat composition for lubricating food processing machines and use thereof
NO180532C (no) * 1994-09-01 1997-05-07 Elkem Materials Fremgangsmåte for fjerning av forurensninger fra smeltet silisium
US5753567A (en) * 1995-08-28 1998-05-19 Memc Electronic Materials, Inc. Cleaning of metallic contaminants from the surface of polycrystalline silicon with a halogen gas or plasma
FR2746785B1 (fr) * 1996-04-02 1998-05-22 Pechiney Electrometallurgie Silicium metallurgique a structure controlee destine a la synthese des halogenosilanes
KR100263220B1 (ko) * 1996-10-14 2000-09-01 에모토 간지 다결정실리콘의 제조방법과 장치 및 태양전지용실리콘기판의 제조방법
EP0855367A1 (en) * 1997-01-22 1998-07-29 Kawasaki Steel Corporation Method for removing boron from metallurgical grade silicon and apparatus
US6368403B1 (en) * 1997-08-28 2002-04-09 Crystal Systems, Inc. Method and apparatus for purifying silicon
US5972107A (en) * 1997-08-28 1999-10-26 Crystal Systems, Inc. Method for purifying silicon
FR2772741B1 (fr) * 1997-12-19 2000-03-10 Centre Nat Rech Scient Procede et installation d'affinage du silicium
WO2002016265A1 (en) 2000-08-21 2002-02-28 Astropower, Inc. Method and apparatus for purifying silicon
DE60037944T2 (de) * 2000-12-28 2009-01-22 Sumco Corp. Kontinuierliches giessverfahren für silizium
FR2827592B1 (fr) * 2001-07-23 2003-08-22 Invensil Silicium metallurgique de haute purete et procede d'elaboration
JP2007513048A (ja) * 2003-12-04 2007-05-24 ダウ・コーニング・コーポレイション 太陽電池グレードのケイ素を生産するための、冶金グレードのケイ素から不純物を除去する方法
JP4766837B2 (ja) 2004-03-03 2011-09-07 新日鉄マテリアルズ株式会社 シリコンからのホウ素除去方法
FR2871151B1 (fr) * 2004-06-07 2006-08-11 Centre Nat Rech Scient Cnrse Installation d'affinage de silicium
JP4665479B2 (ja) * 2004-09-27 2011-04-06 株式会社 アイアイエスマテリアル 電子ビームを用いたボロン含有シリコンの精錬方法及び装置
JP4632769B2 (ja) 2004-12-09 2011-02-16 シャープ株式会社 シリコンの精製方法
JP4966560B2 (ja) 2005-03-07 2012-07-04 新日鉄マテリアルズ株式会社 高純度シリコンの製造方法
JP5140835B2 (ja) * 2005-03-07 2013-02-13 新日鉄住金マテリアルズ株式会社 高純度シリコンの製造方法
JP4741860B2 (ja) * 2005-03-07 2011-08-10 新日鉄マテリアルズ株式会社 高純度のシリコンの製造方法
US7572334B2 (en) * 2006-01-03 2009-08-11 Applied Materials, Inc. Apparatus for fabricating large-surface area polycrystalline silicon sheets for solar cell application
JP5084144B2 (ja) * 2006-01-18 2012-11-28 新日鉄マテリアルズ株式会社 高純度シリコンの製造方法
EP2749533B1 (en) * 2006-04-04 2016-02-24 Silicor Materials Inc. Method for purifying silicon
US7682585B2 (en) 2006-04-25 2010-03-23 The Arizona Board Of Regents On Behalf Of The University Of Arizona Silicon refining process
FR2912397B1 (fr) * 2007-02-14 2009-05-08 Commissariat Energie Atomique Installation d'affinage de silicium.
JP2008241197A (ja) * 2007-03-28 2008-10-09 Fuji Electric Systems Co Ltd 通電加熱装置
CA2700997A1 (en) 2007-10-03 2009-04-09 6N Silicon Inc. Method for processing silicon powder to obtain silicon crystals
FR2928641B1 (fr) 2008-03-14 2010-03-26 Centre Nat Rech Scient Procede de purification de silicium pour applications photovoltaiques
ITMI20081085A1 (it) * 2008-06-16 2009-12-17 N E D Silicon S P A Metodo per la preparazione di silicio di grado metallurgico di elevata purezza.
US8454920B2 (en) * 2008-08-15 2013-06-04 Ulvac, Inc. Silicon purification method
JP5512941B2 (ja) * 2008-08-27 2014-06-04 株式会社アルバック シリコンの精製装置および精製方法
JP2011251853A (ja) * 2008-08-29 2011-12-15 Shin-Etsu Chemical Co Ltd 珪素の精製方法
IT1394029B1 (it) 2009-05-12 2012-05-25 Raysolar S R L Metodo per la purificazione di silicio ed apparato con cui realizzarlo
KR100966755B1 (ko) * 2009-05-25 2010-06-29 (주)원익머트리얼즈 금속실리콘의 정제방법 및 그 정제장치
WO2011001919A1 (ja) 2009-07-03 2011-01-06 三菱化学株式会社 シリコンの製造方法、シリコンおよび太陽電池用パネル
US8562932B2 (en) 2009-08-21 2013-10-22 Silicor Materials Inc. Method of purifying silicon utilizing cascading process
FR2950046B1 (fr) * 2009-09-15 2011-11-25 Apollon Solar Dispositif a basse pression de fusion et purification de silicium et procede de fusion/purification/solidification
TWI393805B (zh) 2009-11-16 2013-04-21 Masahiro Hoshino Purification method of metallurgical silicon
CN101708850B (zh) * 2009-11-19 2011-09-14 大连理工大学 连续熔炼去除多晶硅中磷和硼的方法及装置
TWI397617B (zh) * 2010-02-12 2013-06-01 Masahiro Hoshino Metal silicon purification device
TWI403461B (zh) * 2010-07-21 2013-08-01 Masahiro Hoshino Method and apparatus for improving yield and yield of metallurgical silicon
CN102834935B (zh) * 2010-08-16 2015-06-03 星野政宏 用于太阳能电池的冶金硅的提纯设备和方法
CN102742034B (zh) * 2010-08-16 2015-10-14 星野政宏 冶金硅的提纯方法
CN101948113B (zh) * 2010-09-19 2014-01-01 江西盛丰新能源科技有限公司 一种物理除磷制备多晶硅的方法及设备
AU2016336428A1 (en) 2015-10-09 2018-05-24 Milwaukee Silicon, Llc Devices and systems for purifying silicon
CN105671474B (zh) * 2016-03-18 2018-11-30 李光武 制造半导体基片的方法和装置
RU2693172C1 (ru) * 2018-10-09 2019-07-01 Федеральное государственное бюджетное образовательное учреждение высшего образования "Рязанский государственный радиотехнический университет" ФГБОУ ВО "РГРТУ" Способ очистки металлургического кремния от примесей
CN109161963A (zh) * 2018-10-29 2019-01-08 大连颐和顺新材料科技有限公司 一种高效回收金刚线切割硅粉制备太阳能级多晶硅的方法
RU2707053C1 (ru) * 2018-12-25 2019-11-21 Федеральное государственное бюджетное образовательное учреждение высшего образования "Рязанский государственный радиотехнический университет" Способ очистки металлургического кремния от углерода
CN115872408B (zh) * 2022-10-19 2023-08-11 北京理工大学 一种基于热等离子体射流的石英砂纯化方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2623413C2 (de) * 1976-05-25 1985-01-10 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Herstellen von für Halbleiterbauelemente verwendbarem Silicium
FR2438499A1 (fr) * 1978-10-13 1980-05-09 Anvar Procede de purification et d'elaboration de cristaux par fusion de zone utilisant un jet de plasma et installation correspondante
JPS6031761B2 (ja) * 1979-12-28 1985-07-24 富士写真フイルム株式会社 非晶質シリコン微粉末の製造方法
DE3016807A1 (de) * 1980-05-02 1981-11-05 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zur herstellung von silizium
CA1147698A (en) * 1980-10-15 1983-06-07 Maher I. Boulos Purification of metallurgical grade silicon
JPS57149815A (en) * 1981-03-05 1982-09-16 Shin Etsu Chem Co Ltd Manufacture of granular silicon
EP0274283B1 (fr) * 1987-01-08 1989-05-24 Rhone-Poulenc Chimie Procédé de purification sous plasma de silicium divisé
JPH075288B2 (ja) * 1985-07-31 1995-01-25 フォトワット・インタナショナル・ソシエテ・アノニム 分割されたけい素をプラズマの下で精製する方法
US4680096A (en) * 1985-12-26 1987-07-14 Dow Corning Corporation Plasma smelting process for silicon
JPS62292613A (ja) * 1986-06-10 1987-12-19 Kawasaki Steel Corp 高純度けい素の精製方法

Also Published As

Publication number Publication date
JP3205352B2 (ja) 2001-09-04
EP0459421A1 (en) 1991-12-04
CA2043492A1 (en) 1991-12-01
NO912074D0 (no) 1991-05-29
NO310347B1 (no) 2001-06-25
JPH04228414A (ja) 1992-08-18
DE69124287D1 (de) 1997-03-06
DE69124287T2 (de) 1997-05-07
CA2043492C (en) 2000-05-23
EP0459421B1 (en) 1997-01-22
US5182091A (en) 1993-01-26

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