FR2912397B1 - Installation d'affinage de silicium. - Google Patents
Installation d'affinage de silicium.Info
- Publication number
- FR2912397B1 FR2912397B1 FR0753256A FR0753256A FR2912397B1 FR 2912397 B1 FR2912397 B1 FR 2912397B1 FR 0753256 A FR0753256 A FR 0753256A FR 0753256 A FR0753256 A FR 0753256A FR 2912397 B1 FR2912397 B1 FR 2912397B1
- Authority
- FR
- France
- Prior art keywords
- facility
- silicon refining
- refining
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title 1
- 238000007670 refining Methods 0.000 title 1
- 229910052710 silicon Inorganic materials 0.000 title 1
- 239000010703 silicon Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/225—Refining
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/037—Purification
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/02—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in electric furnaces, e.g. by dielectric heating
- C03B5/021—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in electric furnaces, e.g. by dielectric heating by induction heating
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/06—Crucible or pot furnaces heated electrically, e.g. induction crucible furnaces with or without any other source of heat
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/08—Details peculiar to crucible or pot furnaces
- F27B14/10—Crucibles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0753256A FR2912397B1 (fr) | 2007-02-14 | 2007-02-14 | Installation d'affinage de silicium. |
PCT/FR2008/050220 WO2008104702A2 (fr) | 2007-02-14 | 2008-02-12 | Installation d'affinage de silicium |
JP2009549842A JP5415285B2 (ja) | 2007-02-14 | 2008-02-12 | シリコン精製装置 |
EP08762072A EP2118005A2 (fr) | 2007-02-14 | 2008-02-12 | Installation d'affinage de silicium |
CN2008800050944A CN101646621B (zh) | 2007-02-14 | 2008-02-12 | 硅提纯设备 |
US12/527,036 US20130133373A1 (en) | 2007-02-14 | 2008-02-12 | Silicon refining equipment |
AU2008220638A AU2008220638B2 (en) | 2007-02-14 | 2008-02-12 | Silicon refining equipment |
ZA2009/06337A ZA200906337B (en) | 2007-02-14 | 2009-09-11 | Silicon refining equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0753256A FR2912397B1 (fr) | 2007-02-14 | 2007-02-14 | Installation d'affinage de silicium. |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2912397A1 FR2912397A1 (fr) | 2008-08-15 |
FR2912397B1 true FR2912397B1 (fr) | 2009-05-08 |
Family
ID=38543853
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0753256A Expired - Fee Related FR2912397B1 (fr) | 2007-02-14 | 2007-02-14 | Installation d'affinage de silicium. |
Country Status (8)
Country | Link |
---|---|
US (1) | US20130133373A1 (fr) |
EP (1) | EP2118005A2 (fr) |
JP (1) | JP5415285B2 (fr) |
CN (1) | CN101646621B (fr) |
AU (1) | AU2008220638B2 (fr) |
FR (1) | FR2912397B1 (fr) |
WO (1) | WO2008104702A2 (fr) |
ZA (1) | ZA200906337B (fr) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2981740B1 (fr) * | 2011-10-20 | 2018-03-23 | Francewafer | Installation de purification d'un materiau |
CN105276980B (zh) * | 2014-05-28 | 2017-11-03 | 国核华清(北京)核电技术研发中心有限公司 | 陶瓷坩埚 |
US10069535B2 (en) | 2016-12-08 | 2018-09-04 | At&T Intellectual Property I, L.P. | Apparatus and methods for launching electromagnetic waves having a certain electric field structure |
US11912608B2 (en) | 2019-10-01 | 2024-02-27 | Owens-Brockway Glass Container Inc. | Glass manufacturing |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2009459A1 (de) * | 1970-02-28 | 1971-09-09 | Consortium Elektrochem Ind | Verfahren zur Herstellung von Sihciumformkorpern |
DE3732073A1 (de) * | 1987-09-23 | 1989-04-06 | Siemens Ag | Hochreine innenauskleidung fuer einen elektroniederschachtofen |
JP3205352B2 (ja) * | 1990-05-30 | 2001-09-04 | 川崎製鉄株式会社 | シリコン精製方法及び装置 |
JPH09142823A (ja) * | 1995-11-29 | 1997-06-03 | Kawasaki Steel Corp | 金属シリコンの精製方法および精製装置 |
FR2751738B1 (fr) * | 1996-07-25 | 1998-08-28 | Commissariat Energie Atomique | Four de fusion par induction directe en creuset froid |
JPH10182133A (ja) * | 1996-12-26 | 1998-07-07 | Kawasaki Steel Corp | シリコン精製方法 |
DE19962449C2 (de) * | 1999-12-22 | 2003-09-25 | Heraeus Quarzglas | Quarzglastiegel und Verfahren für seine Herstellung |
FR2871151B1 (fr) * | 2004-06-07 | 2006-08-11 | Centre Nat Rech Scient Cnrse | Installation d'affinage de silicium |
-
2007
- 2007-02-14 FR FR0753256A patent/FR2912397B1/fr not_active Expired - Fee Related
-
2008
- 2008-02-12 JP JP2009549842A patent/JP5415285B2/ja not_active Expired - Fee Related
- 2008-02-12 US US12/527,036 patent/US20130133373A1/en not_active Abandoned
- 2008-02-12 WO PCT/FR2008/050220 patent/WO2008104702A2/fr active Application Filing
- 2008-02-12 CN CN2008800050944A patent/CN101646621B/zh not_active Expired - Fee Related
- 2008-02-12 AU AU2008220638A patent/AU2008220638B2/en not_active Ceased
- 2008-02-12 EP EP08762072A patent/EP2118005A2/fr not_active Withdrawn
-
2009
- 2009-09-11 ZA ZA2009/06337A patent/ZA200906337B/en unknown
Also Published As
Publication number | Publication date |
---|---|
EP2118005A2 (fr) | 2009-11-18 |
CN101646621A (zh) | 2010-02-10 |
JP2010517924A (ja) | 2010-05-27 |
ZA200906337B (en) | 2010-11-24 |
FR2912397A1 (fr) | 2008-08-15 |
US20130133373A1 (en) | 2013-05-30 |
AU2008220638B2 (en) | 2012-10-25 |
JP5415285B2 (ja) | 2014-02-12 |
WO2008104702A2 (fr) | 2008-09-04 |
AU2008220638A1 (en) | 2008-09-04 |
WO2008104702A3 (fr) | 2008-11-06 |
CN101646621B (zh) | 2013-11-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PLFP | Fee payment |
Year of fee payment: 9 |
|
ST | Notification of lapse |
Effective date: 20161028 |