FR2438499A1 - Procede de purification et d'elaboration de cristaux par fusion de zone utilisant un jet de plasma et installation correspondante - Google Patents
Procede de purification et d'elaboration de cristaux par fusion de zone utilisant un jet de plasma et installation correspondanteInfo
- Publication number
- FR2438499A1 FR2438499A1 FR7829265A FR7829265A FR2438499A1 FR 2438499 A1 FR2438499 A1 FR 2438499A1 FR 7829265 A FR7829265 A FR 7829265A FR 7829265 A FR7829265 A FR 7829265A FR 2438499 A1 FR2438499 A1 FR 2438499A1
- Authority
- FR
- France
- Prior art keywords
- jet
- prepn
- heating
- heat source
- boat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
- C30B13/22—Heating of the molten zone by irradiation or electric discharge
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Silicon Compounds (AREA)
Abstract
PROCEDE ET INSTALLATION D'ELABORATION DE CRISTAUX DE HAUTE PURETE PAR FUSION DE ZONE. SELON L'INVENTION, LE MOYEN DE CHAUFFAGE UTILISE POUR PROVOQUER LA FUSION DE ZONE EST UN JET DE PLASMA SOUS ATMOSPHERE CONTROLEE. CE PROCEDE PERMET D'AMELIORER LA PURETE DES CRISTAUX OBTENUS ET D'ACCELERER LE TRAITEMENT. APPLICATION A LA REALISATION DE SILICIUM TRES PUR DESTINE NOTAMMENT AUX CELLULES SOLAIRES.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7829265A FR2438499A1 (fr) | 1978-10-13 | 1978-10-13 | Procede de purification et d'elaboration de cristaux par fusion de zone utilisant un jet de plasma et installation correspondante |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7829265A FR2438499A1 (fr) | 1978-10-13 | 1978-10-13 | Procede de purification et d'elaboration de cristaux par fusion de zone utilisant un jet de plasma et installation correspondante |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2438499A1 true FR2438499A1 (fr) | 1980-05-09 |
FR2438499B1 FR2438499B1 (fr) | 1982-04-23 |
Family
ID=9213719
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7829265A Granted FR2438499A1 (fr) | 1978-10-13 | 1978-10-13 | Procede de purification et d'elaboration de cristaux par fusion de zone utilisant un jet de plasma et installation correspondante |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2438499A1 (fr) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2487808A1 (fr) * | 1980-08-01 | 1982-02-05 | Electricite De France | Procede et dispositif d'elimination du bore dans le silicium par fusion de zone sous plasma reactif |
EP0158563A1 (fr) * | 1984-04-02 | 1985-10-16 | Rhone-Poulenc Chimie | Procédé de fabrication non polluant de silicium massif à partir de silicium divisé |
FR2585690A1 (fr) * | 1985-07-31 | 1987-02-06 | Rhone Poulenc Spec Chim | Procede de purification sous plasma de silicium divise |
FR2594856A1 (fr) * | 1986-02-27 | 1987-08-28 | Photowatt Int | Procede d'obtention de cristaux de silicium pour applications photovoltaiques |
EP0274283A1 (fr) * | 1987-01-08 | 1988-07-13 | Rhone-Poulenc Chimie | Procédé de purification sous plasma de silicium divisé |
EP0459421A1 (fr) * | 1990-05-30 | 1991-12-04 | Kawasaki Steel Corporation | Méthode et appareil pour purifier le silicium |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1581300A (fr) * | 1967-09-09 | 1969-09-12 | ||
FR2171417A1 (fr) * | 1972-02-09 | 1973-09-21 | Vysoka Skola Banska Ostrava |
-
1978
- 1978-10-13 FR FR7829265A patent/FR2438499A1/fr active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1581300A (fr) * | 1967-09-09 | 1969-09-12 | ||
FR2171417A1 (fr) * | 1972-02-09 | 1973-09-21 | Vysoka Skola Banska Ostrava |
Non-Patent Citations (2)
Title |
---|
EXBK/64 * |
EXBK/68 * |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2487808A1 (fr) * | 1980-08-01 | 1982-02-05 | Electricite De France | Procede et dispositif d'elimination du bore dans le silicium par fusion de zone sous plasma reactif |
EP0045689A1 (fr) * | 1980-08-01 | 1982-02-10 | Electricite De France | Procédé d'élimination du bore dans le silicium par fusion de zone sous plasma réactif |
EP0158563A1 (fr) * | 1984-04-02 | 1985-10-16 | Rhone-Poulenc Chimie | Procédé de fabrication non polluant de silicium massif à partir de silicium divisé |
FR2585690A1 (fr) * | 1985-07-31 | 1987-02-06 | Rhone Poulenc Spec Chim | Procede de purification sous plasma de silicium divise |
FR2594856A1 (fr) * | 1986-02-27 | 1987-08-28 | Photowatt Int | Procede d'obtention de cristaux de silicium pour applications photovoltaiques |
EP0239794A1 (fr) * | 1986-02-27 | 1987-10-07 | Photowatt International S.A. | Procédé d'obtention de cristaux de silicium pour applications photovoltaiques |
EP0274283A1 (fr) * | 1987-01-08 | 1988-07-13 | Rhone-Poulenc Chimie | Procédé de purification sous plasma de silicium divisé |
EP0459421A1 (fr) * | 1990-05-30 | 1991-12-04 | Kawasaki Steel Corporation | Méthode et appareil pour purifier le silicium |
Also Published As
Publication number | Publication date |
---|---|
FR2438499B1 (fr) | 1982-04-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA1155735A (fr) | Methode de fabrication de tiges de silicone | |
AU1058188A (en) | Method of growing profiled monocrystals | |
AU2003237489A1 (en) | Method for producing semi-insulating resistivity in high purity silicon carbide crystals | |
JPS581044B2 (ja) | 板状シリコン片の製造方法 | |
MY113637A (en) | Rapid cooling of cz silicon crystal growth system | |
FR2438499A1 (fr) | Procede de purification et d'elaboration de cristaux par fusion de zone utilisant un jet de plasma et installation correspondante | |
Novak et al. | The production of EFG sapphire ribbon for heteroepitaxial silicon substrates | |
US4547256A (en) | Method for thermally treating a semiconductor substrate | |
MY129966A (en) | Method and device for producing monocrystals | |
US3261722A (en) | Process for preparing semiconductor ingots within a depression | |
US4561930A (en) | Process for the production of coarsely crystalline silicon | |
EP0390671A3 (fr) | Procédé de dosage des impuretés métalliques dans du silicium monocristallin obtenu par le procédé Czochralski | |
US4464557A (en) | Crystal growth in glasses and amorphous semiconductors | |
JPS539209A (en) | High frequency heating coil of floating zone purifying apparatus | |
JPS5637292A (en) | Crystal growing method | |
FR2455921A2 (en) | Single crystal prepn. by zone melting - using plasma jet to effect melting, with acid pickle operation between two melting steps | |
JPS56163226A (en) | Refining method of aluminum | |
Helmreich et al. | Progress in ingot and foil casting of silicon | |
JPS57205395A (en) | Manufacture of crystal substrate | |
JPS5645893A (en) | Reducing method for defect of silicon single crystal | |
JPH06191814A (ja) | シリコン薄板の製造方法 | |
JPS57129896A (en) | Liquid phase epitaxial growing apparatus | |
JPS55140792A (en) | Manufacture of 3-5 group compound semiconductor single crystal | |
JP2601204B2 (ja) | 化合物半導体の固相再結晶法 | |
JPH08165191A (ja) | 単結晶の製造方法及びその製造装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |