NO872114L - Surt bad for elektrolytisk belegning med gull. - Google Patents
Surt bad for elektrolytisk belegning med gull.Info
- Publication number
- NO872114L NO872114L NO872114A NO872114A NO872114L NO 872114 L NO872114 L NO 872114L NO 872114 A NO872114 A NO 872114A NO 872114 A NO872114 A NO 872114A NO 872114 L NO872114 L NO 872114L
- Authority
- NO
- Norway
- Prior art keywords
- gold
- acrylic acid
- concentration
- pyridyl
- acid
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title claims description 17
- 239000011248 coating agent Substances 0.000 title claims description 10
- 239000002253 acid Substances 0.000 title abstract description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 34
- 229910052737 gold Inorganic materials 0.000 claims abstract description 34
- 239000010931 gold Substances 0.000 claims abstract description 34
- 238000009713 electroplating Methods 0.000 claims abstract description 19
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000000654 additive Substances 0.000 claims abstract description 16
- VUVORVXMOLQFMO-ONEGZZNKSA-N (e)-3-pyridin-3-ylprop-2-enoic acid Chemical compound OC(=O)\C=C\C1=CC=CN=C1 VUVORVXMOLQFMO-ONEGZZNKSA-N 0.000 claims abstract description 11
- 230000000996 additive effect Effects 0.000 claims abstract description 8
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 8
- 239000010941 cobalt Substances 0.000 claims abstract description 8
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 8
- YBIWIEFOLKWDNV-UHFFFAOYSA-N 3-quinolin-3-ylprop-2-enoic acid Chemical compound C1=CC=CC2=CC(C=CC(=O)O)=CN=C21 YBIWIEFOLKWDNV-UHFFFAOYSA-N 0.000 claims abstract description 6
- 150000002505 iron Chemical class 0.000 claims abstract 2
- 230000002378 acidificating effect Effects 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- 241000102542 Kara Species 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- XTFKWYDMKGAZKK-UHFFFAOYSA-N potassium;gold(1+);dicyanide Chemical compound [K+].[Au+].N#[C-].N#[C-] XTFKWYDMKGAZKK-UHFFFAOYSA-N 0.000 abstract description 2
- PVNIIMVLHYAWGP-UHFFFAOYSA-N Niacin Chemical compound OC(=O)C1=CC=CN=C1 PVNIIMVLHYAWGP-UHFFFAOYSA-N 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- -1 Transition metal salts Chemical class 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229910001369 Brass Inorganic materials 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 3
- 239000010951 brass Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 235000001968 nicotinic acid Nutrition 0.000 description 3
- 239000011664 nicotinic acid Substances 0.000 description 3
- 239000006259 organic additive Substances 0.000 description 3
- CUYKNJBYIJFRCU-UHFFFAOYSA-N 3-aminopyridine Chemical compound NC1=CC=CN=C1 CUYKNJBYIJFRCU-UHFFFAOYSA-N 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 2
- MUBZPKHOEPUJKR-UHFFFAOYSA-L Oxalate Chemical compound [O-]C(=O)C([O-])=O MUBZPKHOEPUJKR-UHFFFAOYSA-L 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- YNBADRVTZLEFNH-UHFFFAOYSA-N methyl nicotinate Chemical compound COC(=O)C1=CC=CN=C1 YNBADRVTZLEFNH-UHFFFAOYSA-N 0.000 description 2
- 229960003512 nicotinic acid Drugs 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 150000003248 quinolines Chemical class 0.000 description 2
- 150000003460 sulfonic acids Chemical class 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- BZFGKBQHQJVAHS-UHFFFAOYSA-N 2-(trifluoromethyl)pyridine-4-carboxylic acid Chemical compound OC(=O)C1=CC=NC(C(F)(F)F)=C1 BZFGKBQHQJVAHS-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- SIOXPEMLGUPBBT-UHFFFAOYSA-N Picolinic acid Natural products OC(=O)C1=CC=CC=N1 SIOXPEMLGUPBBT-UHFFFAOYSA-N 0.000 description 1
- 229920002873 Polyethylenimine Polymers 0.000 description 1
- BERPCVULMUPOER-UHFFFAOYSA-N Quinolinediol Chemical compound C1=CC=C2NC(=O)C(O)=CC2=C1 BERPCVULMUPOER-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- DFPAKSUCGFBDDF-ZQBYOMGUSA-N [14c]-nicotinamide Chemical compound N[14C](=O)C1=CC=CN=C1 DFPAKSUCGFBDDF-ZQBYOMGUSA-N 0.000 description 1
- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229940027991 antiseptic and disinfectant quinoline derivative Drugs 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- MUYSADWCWFFZKR-UHFFFAOYSA-N cinchomeronic acid Chemical compound OC(=O)C1=CC=NC=C1C(O)=O MUYSADWCWFFZKR-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- WJJMNDUMQPNECX-UHFFFAOYSA-N dipicolinic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=N1 WJJMNDUMQPNECX-UHFFFAOYSA-N 0.000 description 1
- AEOCXXJPGCBFJA-UHFFFAOYSA-N ethionamide Chemical compound CCC1=CC(C(N)=S)=CC=N1 AEOCXXJPGCBFJA-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 159000000014 iron salts Chemical class 0.000 description 1
- TWBYWOBDOCUKOW-UHFFFAOYSA-N isonicotinic acid Natural products OC(=O)C1=CC=NC=C1 TWBYWOBDOCUKOW-UHFFFAOYSA-N 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- NCYVXEGFNDZQCU-UHFFFAOYSA-N nikethamide Chemical compound CCN(CC)C(=O)C1=CC=CN=C1 NCYVXEGFNDZQCU-UHFFFAOYSA-N 0.000 description 1
- 229960003226 nikethamide Drugs 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- RGOPGRSAYPXWIG-UHFFFAOYSA-N pyridin-2-ylmethanesulfonic acid Chemical compound [O-]S(=O)(=O)CC1=CC=CC=[NH+]1 RGOPGRSAYPXWIG-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- KZVLNAGYSAKYMG-UHFFFAOYSA-N pyridine-2-sulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=N1 KZVLNAGYSAKYMG-UHFFFAOYSA-N 0.000 description 1
- DVECLMOWYVDJRM-UHFFFAOYSA-N pyridine-3-sulfonic acid Chemical compound OS(=O)(=O)C1=CC=CN=C1 DVECLMOWYVDJRM-UHFFFAOYSA-N 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- ZKIHLVYBGPFUAD-UHFFFAOYSA-N quinoline-2-sulfonic acid Chemical compound C1=CC=CC2=NC(S(=O)(=O)O)=CC=C21 ZKIHLVYBGPFUAD-UHFFFAOYSA-N 0.000 description 1
- RYGIHSLRMNXWCN-UHFFFAOYSA-N quinoline-3-carbaldehyde Chemical compound C1=CC=CC2=CC(C=O)=CN=C21 RYGIHSLRMNXWCN-UHFFFAOYSA-N 0.000 description 1
- DJXNJVFEFSWHLY-UHFFFAOYSA-N quinoline-3-carboxylic acid Chemical compound C1=CC=CC2=CC(C(=O)O)=CN=C21 DJXNJVFEFSWHLY-UHFFFAOYSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- VXKWYPOMXBVZSJ-UHFFFAOYSA-N tetramethyltin Chemical compound C[Sn](C)(C)C VXKWYPOMXBVZSJ-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/48—Electroplating: Baths therefor from solutions of gold
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electrolytic Production Of Metals (AREA)
- Building Environments (AREA)
- Residential Or Office Buildings (AREA)
- Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB868612361A GB8612361D0 (en) | 1986-05-21 | 1986-05-21 | Gold electroplating bath |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| NO872114D0 NO872114D0 (no) | 1987-05-20 |
| NO872114L true NO872114L (no) | 1987-11-23 |
Family
ID=10598205
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO872114A NO872114L (no) | 1986-05-21 | 1987-05-20 | Surt bad for elektrolytisk belegning med gull. |
Country Status (14)
| Country | Link |
|---|---|
| US (1) | US4767507A (ko) |
| EP (1) | EP0246869B1 (ko) |
| JP (1) | JPS62287094A (ko) |
| KR (1) | KR870011277A (ko) |
| AT (1) | ATE68835T1 (ko) |
| DE (1) | DE3773990D1 (ko) |
| DK (1) | DK168303B1 (ko) |
| ES (1) | ES2026910T3 (ko) |
| FI (1) | FI872065A (ko) |
| GB (1) | GB8612361D0 (ko) |
| GR (1) | GR3002980T3 (ko) |
| HK (1) | HK58592A (ko) |
| NO (1) | NO872114L (ko) |
| SG (1) | SG16192G (ko) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5039381A (en) * | 1989-05-25 | 1991-08-13 | Mullarkey Edward J | Method of electroplating a precious metal on a semiconductor device, integrated circuit or the like |
| JP2779207B2 (ja) * | 1989-06-06 | 1998-07-23 | 富士通株式会社 | 半導体装置の製造方法 |
| US6417366B2 (en) * | 1999-06-24 | 2002-07-09 | Abbott Laboratories | Preparation of quinoline-substituted carbonate and carbamate derivatives |
| FR2807422B1 (fr) * | 2000-04-06 | 2002-07-05 | Engelhard Clal Sas | Sel complexe de palladium et son utilisation pour ajuster la concentration en palladium d'un bain electrolytique destine au depot de palladium ou d'un de ses alliages |
| FR2807450B1 (fr) * | 2000-04-06 | 2002-07-05 | Engelhard Clal Sas | Bain electrolytique destine au depot electrochimique du palladium ou de ses alliages |
| FR2828889B1 (fr) * | 2001-08-24 | 2004-05-07 | Engelhard Clal Sas | Bain electrolytique pour le depot electrochimique de l'or et de ses alliages |
| US7279086B2 (en) * | 2003-05-21 | 2007-10-09 | Technic, Inc. | Electroplating solution for alloys of gold with tin |
| JP5116956B2 (ja) * | 2005-07-14 | 2013-01-09 | 関東化学株式会社 | 無電解硬質金めっき液 |
| JP4868116B2 (ja) * | 2005-09-30 | 2012-02-01 | 学校法人早稲田大学 | 金−コバルト系アモルファス合金めっき皮膜、電気めっき液及び電気めっき方法 |
| JP5317433B2 (ja) * | 2007-06-06 | 2013-10-16 | ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． | 酸性金合金めっき液 |
| EP2431502B1 (en) * | 2010-09-21 | 2017-05-24 | Rohm and Haas Electronic Materials LLC | Cyanide-free silver electroplating solutions |
| DE102016211594A1 (de) * | 2016-06-28 | 2017-12-28 | Voith Patent Gmbh | Elektrokontakt-Kupplung |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH455434A (de) * | 1963-08-15 | 1968-07-15 | Werner Fluehmann Galvanische A | Verfahren zur Herstellung von Weissgoldüberzügen |
| DE2237807C3 (de) * | 1972-08-01 | 1978-04-27 | Langbein-Pfanhauser Werke Ag, 4040 Neuss | Verfahren zur Erzeugung mikrorissiger Chromschichten über Zwischenschichten |
| DE2355581C3 (de) * | 1973-11-07 | 1979-07-12 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler, 6000 Frankfurt | Galvanisches Glanzgoldbad mit hoher Abscheidungsgeschwindigkeit |
| US4038161A (en) * | 1976-03-05 | 1977-07-26 | R. O. Hull & Company, Inc. | Acid copper plating and additive composition therefor |
| GB8334226D0 (en) * | 1983-12-22 | 1984-02-01 | Learonal Uk Ltd | Electrodeposition of gold alloys |
-
1986
- 1986-05-21 GB GB868612361A patent/GB8612361D0/en active Pending
-
1987
- 1987-05-11 FI FI872065A patent/FI872065A/fi not_active Application Discontinuation
- 1987-05-19 DE DE8787304445T patent/DE3773990D1/de not_active Expired - Lifetime
- 1987-05-19 DK DK252987A patent/DK168303B1/da active IP Right Grant
- 1987-05-19 AT AT87304445T patent/ATE68835T1/de not_active IP Right Cessation
- 1987-05-19 EP EP87304445A patent/EP0246869B1/en not_active Expired - Lifetime
- 1987-05-19 ES ES198787304445T patent/ES2026910T3/es not_active Expired - Lifetime
- 1987-05-20 KR KR870004986A patent/KR870011277A/ko not_active Application Discontinuation
- 1987-05-20 NO NO872114A patent/NO872114L/no unknown
- 1987-05-20 JP JP62121429A patent/JPS62287094A/ja active Pending
-
1988
- 1988-01-11 US US07/144,607 patent/US4767507A/en not_active Expired - Lifetime
-
1991
- 1991-10-24 GR GR91400797T patent/GR3002980T3/el unknown
-
1992
- 1992-02-19 SG SG161/92A patent/SG16192G/en unknown
- 1992-08-06 HK HK585/92A patent/HK58592A/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| ES2026910T3 (es) | 1992-05-16 |
| DK252987D0 (da) | 1987-05-19 |
| EP0246869A1 (en) | 1987-11-25 |
| FI872065A0 (fi) | 1987-05-11 |
| US4767507A (en) | 1988-08-30 |
| JPS62287094A (ja) | 1987-12-12 |
| ATE68835T1 (de) | 1991-11-15 |
| KR870011277A (ko) | 1987-12-22 |
| DE3773990D1 (de) | 1991-11-28 |
| FI872065A (fi) | 1987-11-22 |
| NO872114D0 (no) | 1987-05-20 |
| DK168303B1 (da) | 1994-03-07 |
| DK252987A (da) | 1987-11-22 |
| HK58592A (en) | 1992-08-14 |
| EP0246869B1 (en) | 1991-10-23 |
| SG16192G (en) | 1992-04-16 |
| GR3002980T3 (en) | 1993-01-25 |
| GB8612361D0 (en) | 1986-06-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4384930A (en) | Electroplating baths, additives therefor and methods for the electrodeposition of metals | |
| US4591415A (en) | Plating baths and methods for electro-deposition of gold or gold alloys | |
| USRE35513E (en) | Cyanide-free plating solutions for monovalent metals | |
| US5750018A (en) | Cyanide-free monovalent copper electroplating solutions | |
| US2830014A (en) | Electroplating process | |
| JPS6362595B2 (ko) | ||
| NO872114L (no) | Surt bad for elektrolytisk belegning med gull. | |
| GB2187204A (en) | Electroplating solution for deposition of palladium or alloys thereof | |
| SE506531C2 (sv) | Komposition och förfarande för elektroplätering av guld eller guldlegering | |
| US4406755A (en) | Bright palladium electrodeposition | |
| JP3933930B2 (ja) | 光沢のある金層および金合金層を電着するための酸性浴および電着用光沢剤 | |
| US4170526A (en) | Electroplating bath and process | |
| GB2089374A (en) | Electrodeposition of palladium and palladium alloys | |
| EP0225422A1 (en) | Alkaline baths and methods for electrodeposition of palladium and palladium alloys | |
| JPS6250560B2 (ko) | ||
| US3769184A (en) | Acid zinc electroplating | |
| US6143160A (en) | Method for improving the macro throwing power for chloride zinc electroplating baths | |
| US5415685A (en) | Electroplating bath and process for white palladium | |
| US4297179A (en) | Palladium electroplating bath and process | |
| EP0188386A2 (en) | Gold electroplating bath | |
| US4293391A (en) | Cadmium plating baths and methods for electrodepositing bright cadmium deposits | |
| CA1180677A (en) | Bath and process for high speed nickel electroplating | |
| US4411744A (en) | Bath and process for high speed nickel electroplating | |
| US4741818A (en) | Alkaline baths and methods for electrodeposition of palladium and palladium alloys | |
| GB2133040A (en) | Copper plating bath process and anode therefore |