NO841233L - Lysfoelsomt, diazoniumgruppeholdig polykondensasjonsprodukt, fremgangsmaate til dets fremstilling og lysfoelsomt opptegningsmaterial som inneholder dette polykondensasjonsprodukt - Google Patents

Lysfoelsomt, diazoniumgruppeholdig polykondensasjonsprodukt, fremgangsmaate til dets fremstilling og lysfoelsomt opptegningsmaterial som inneholder dette polykondensasjonsprodukt

Info

Publication number
NO841233L
NO841233L NO841233A NO841233A NO841233L NO 841233 L NO841233 L NO 841233L NO 841233 A NO841233 A NO 841233A NO 841233 A NO841233 A NO 841233A NO 841233 L NO841233 L NO 841233L
Authority
NO
Norway
Prior art keywords
compound
aromatic
parts
groups
light
Prior art date
Application number
NO841233A
Other languages
English (en)
Norwegian (no)
Inventor
Walter Lutz
Hartmut Steppan
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of NO841233L publication Critical patent/NO841233L/no

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/021Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G12/00Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen
    • C08G12/02Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes
    • C08G12/04Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with acyclic or carbocyclic compounds
    • C08G12/06Amines
    • C08G12/08Amines aromatic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Medicinal Preparation (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Polyamides (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
NO841233A 1983-03-29 1984-03-28 Lysfoelsomt, diazoniumgruppeholdig polykondensasjonsprodukt, fremgangsmaate til dets fremstilling og lysfoelsomt opptegningsmaterial som inneholder dette polykondensasjonsprodukt NO841233L (no)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19833311435 DE3311435A1 (de) 1983-03-29 1983-03-29 Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt, verfahren zu seiner herstellung und lichtempfindliches aufzeichnungsmaterial, das dieses polykondensationsprodukt enthaelt

Publications (1)

Publication Number Publication Date
NO841233L true NO841233L (no) 1984-10-01

Family

ID=6195002

Family Applications (1)

Application Number Title Priority Date Filing Date
NO841233A NO841233L (no) 1983-03-29 1984-03-28 Lysfoelsomt, diazoniumgruppeholdig polykondensasjonsprodukt, fremgangsmaate til dets fremstilling og lysfoelsomt opptegningsmaterial som inneholder dette polykondensasjonsprodukt

Country Status (14)

Country Link
US (1) US4661432A (da)
EP (1) EP0126875B1 (da)
JP (1) JPH0727201B2 (da)
AT (1) ATE27499T1 (da)
AU (1) AU566652B2 (da)
BR (1) BR8401442A (da)
CA (1) CA1212106A (da)
DE (2) DE3311435A1 (da)
DK (1) DK113484A (da)
ES (1) ES530803A0 (da)
FI (1) FI75679C (da)
IL (1) IL71050A (da)
NO (1) NO841233L (da)
ZA (1) ZA842091B (da)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4618562A (en) * 1984-12-27 1986-10-21 American Hoechst Corporation Aqueous developable lithographic printing plates containing an admixture of diazonium salts and polymers and composition therefor
DE3509383A1 (de) * 1985-03-15 1986-09-18 Hoechst Ag, 6230 Frankfurt Lichtempfindliches diazoniumsalz-polykondensationsprodukt und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3528309A1 (de) * 1985-08-07 1987-02-12 Hoechst Ag Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
US4692397A (en) * 1985-11-27 1987-09-08 American Hoechst Corporation Process for developing an aqueous alkaline development diazo photographic element
US4914000A (en) * 1988-02-03 1990-04-03 Hoechst Celanese Corporation Three dimensional reproduction material diazonium condensates and use in light sensitive
JP2657516B2 (ja) * 1988-04-05 1997-09-24 コニカ株式会社 感光性組成物
JP2671406B2 (ja) * 1988-07-19 1997-10-29 三菱化学株式会社 感光性組成物
JP2768692B2 (ja) * 1988-08-01 1998-06-25 株式会社日立製作所 感放射線組成物及びパターン形成方法
DE3924812A1 (de) * 1989-07-27 1991-01-31 Hoechst Ag Loesemittelgemisch und beschichtungsloesung fuer die herstellung negativ arbeitender lichtempfindlicher aufzeichnungsmaterialien
JP2687018B2 (ja) * 1989-08-31 1997-12-08 富士写真フイルム株式会社 感光性組成物
JP2627565B2 (ja) * 1990-02-19 1997-07-09 富士写真フイルム株式会社 感光性平版印刷版
JPH03290663A (ja) * 1990-04-09 1991-12-20 Fuji Photo Film Co Ltd 感光性組成物
JPH03296756A (ja) * 1990-04-16 1991-12-27 Fuji Photo Film Co Ltd 画像形成方法
JPH04172354A (ja) * 1990-11-05 1992-06-19 Fuji Photo Film Co Ltd 画像形成方法
JPH04172353A (ja) * 1990-11-05 1992-06-19 Fuji Photo Film Co Ltd 感光性組成物
JP2709532B2 (ja) * 1991-03-01 1998-02-04 富士写真フイルム株式会社 感光性平版印刷版
US5370965A (en) * 1991-12-10 1994-12-06 Fuji Photo Film Co., Ltd. Positive-working light-sensitive composition containing diazonium salt and novolak resin
IT1264010B (it) * 1993-04-06 1996-09-06 Policondensato fotosensibile per lastre litografiche negative
JP3810215B2 (ja) * 1998-06-17 2006-08-16 富士写真フイルム株式会社 感光性平版印刷版

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3849392A (en) * 1969-05-20 1974-11-19 Kalle Ag Process for the production of polycondensation products of aromatic diazonium compounds
US3867147A (en) * 1969-05-20 1975-02-18 Hoechst Co American Light-sensitive diazo compounds and reproduction material employing the same
US3679419A (en) * 1969-05-20 1972-07-25 Azoplate Corp Light-sensitive diazo condensate containing reproduction material
US4436804A (en) * 1981-03-20 1984-03-13 American Hoechst Corporation Light-sensitive polymeric diazonium condensates and reproduction compositions and materials therewith

Also Published As

Publication number Publication date
DE3463979D1 (en) 1987-07-02
ATE27499T1 (de) 1987-06-15
ES8505707A1 (es) 1985-06-01
JPH0727201B2 (ja) 1995-03-29
ZA842091B (en) 1984-10-31
US4661432A (en) 1987-04-28
BR8401442A (pt) 1984-11-06
EP0126875A1 (de) 1984-12-05
ES530803A0 (es) 1985-06-01
IL71050A (en) 1987-07-31
AU566652B2 (en) 1987-10-29
DE3311435A1 (de) 1984-10-04
DK113484D0 (da) 1984-02-28
FI841216A (fi) 1984-09-30
EP0126875B1 (de) 1987-05-27
FI75679B (fi) 1988-03-31
FI841216A0 (fi) 1984-03-27
CA1212106A (en) 1986-09-30
JPS59196325A (ja) 1984-11-07
DK113484A (da) 1984-09-30
AU2611784A (en) 1984-10-04
FI75679C (fi) 1988-07-11
IL71050A0 (en) 1984-05-31

Similar Documents

Publication Publication Date Title
NO841233L (no) Lysfoelsomt, diazoniumgruppeholdig polykondensasjonsprodukt, fremgangsmaate til dets fremstilling og lysfoelsomt opptegningsmaterial som inneholder dette polykondensasjonsprodukt
US3679419A (en) Light-sensitive diazo condensate containing reproduction material
US3849392A (en) Process for the production of polycondensation products of aromatic diazonium compounds
JPS60182437A (ja) 感光性組成物
US3219447A (en) Material for the photo mechanical manufacture of printing plates and method for converting the same into printing plates
JPS6313529B2 (da)
JPH039454B2 (da)
US3179518A (en) Presensitized printing foil having as a coating thereon a light-sensitive diazo compound with polyvinyl phosphonic acid
US4692397A (en) Process for developing an aqueous alkaline development diazo photographic element
US3061429A (en) Diazo printing plates and method for the production thereof
US3235383A (en) Reproduction material for the photomechanical preparation of planographic and offsetprinting plates
US6783913B2 (en) Polymeric acetal resins containing free radical inhibitors and their use in lithographic printing
JPS62169154A (ja) 感光性組成物
JPWO2017141612A1 (ja) レジスト下層膜形成用組成物、レジスト下層膜及びパターニングされた基板の製造方法
US20150370168A1 (en) Negative photoresist and methods of preparing and using the same
DK143621B (da) Fremgangsmaade til fremstilling af etlysfoelsomt kondensationsprodukt af en aromatisk diazoniumforbindelse
US4492748A (en) Light-sensitive polycondensation product containing diazonium and dialdehyde groups, and light-sensitive recording material prepared therewith
JPH0222369B2 (da)
US4264713A (en) Process of producing a lithographic printing plate
JPH08507878A (ja) 高温で安定した光画像を形成できる組成物のための新規なマトリックス樹脂
US5143815A (en) Light-sensitive mixture based on 1,2-naphthoquinone-diazides, and reproduction material produced with this mixture
JPH0573016B2 (da)
JPH04134346A (ja) 感光性組成物
JPH0543100B2 (da)
JPH07168353A (ja) 感光性組成物