IT1264010B - Policondensato fotosensibile per lastre litografiche negative - Google Patents

Policondensato fotosensibile per lastre litografiche negative

Info

Publication number
IT1264010B
IT1264010B ITMI930679A ITMI930679A IT1264010B IT 1264010 B IT1264010 B IT 1264010B IT MI930679 A ITMI930679 A IT MI930679A IT MI930679 A ITMI930679 A IT MI930679A IT 1264010 B IT1264010 B IT 1264010B
Authority
IT
Italy
Prior art keywords
polycondensate
photosensitive
negative lithographic
lithographic sheets
sheets
Prior art date
Application number
ITMI930679A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to ITMI930679A priority Critical patent/IT1264010B/it
Publication of ITMI930679A0 publication Critical patent/ITMI930679A0/it
Priority to EP94200771A priority patent/EP0619519A1/en
Priority to CA002120404A priority patent/CA2120404A1/en
Publication of ITMI930679A1 publication Critical patent/ITMI930679A1/it
Application granted granted Critical
Publication of IT1264010B publication Critical patent/IT1264010B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
ITMI930679A 1993-04-06 1993-04-06 Policondensato fotosensibile per lastre litografiche negative IT1264010B (it)

Priority Applications (3)

Application Number Priority Date Filing Date Title
ITMI930679A IT1264010B (it) 1993-04-06 1993-04-06 Policondensato fotosensibile per lastre litografiche negative
EP94200771A EP0619519A1 (en) 1993-04-06 1994-03-24 Photosensitive polycondensation compound for negative lithographic plates
CA002120404A CA2120404A1 (en) 1993-04-06 1994-03-31 Photosensitive polycondensation compound for negative lithographic plates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ITMI930679A IT1264010B (it) 1993-04-06 1993-04-06 Policondensato fotosensibile per lastre litografiche negative

Publications (3)

Publication Number Publication Date
ITMI930679A0 ITMI930679A0 (it) 1993-04-06
ITMI930679A1 ITMI930679A1 (it) 1994-10-06
IT1264010B true IT1264010B (it) 1996-09-06

Family

ID=11365664

Family Applications (1)

Application Number Title Priority Date Filing Date
ITMI930679A IT1264010B (it) 1993-04-06 1993-04-06 Policondensato fotosensibile per lastre litografiche negative

Country Status (3)

Country Link
EP (1) EP0619519A1 (it)
CA (1) CA2120404A1 (it)
IT (1) IT1264010B (it)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0811878A1 (en) * 1996-06-06 1997-12-10 Agfa-Gevaert N.V. A diazo based imaging element having increased sensitivity
CN104262193B (zh) * 2014-09-17 2016-06-08 京东方科技集团股份有限公司 一种二硝基二苯胺重氮树脂、含有该树脂的光刻胶组合物及其制备方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3679419A (en) * 1969-05-20 1972-07-25 Azoplate Corp Light-sensitive diazo condensate containing reproduction material
US4533620A (en) * 1982-03-18 1985-08-06 American Hoechst Corporation Light sensitive co-condensates
DE3311435A1 (de) * 1983-03-29 1984-10-04 Hoechst Ag, 6230 Frankfurt Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt, verfahren zu seiner herstellung und lichtempfindliches aufzeichnungsmaterial, das dieses polykondensationsprodukt enthaelt
DE3541723A1 (de) * 1985-11-26 1987-05-27 Hoechst Ag Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt, verfahren zu seiner herstellung und lichtempfindliches aufzeichnungsmaterial, das dieses polykondensationsprodukt enthaelt

Also Published As

Publication number Publication date
ITMI930679A1 (it) 1994-10-06
EP0619519A1 (en) 1994-10-12
CA2120404A1 (en) 1994-10-07
ITMI930679A0 (it) 1993-04-06

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Legal Events

Date Code Title Description
0001 Granted
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19970424