DK113484D0 - Lysfoelsomt diazoniumgruppeholdigt polykondensationsprodukt og fremgangsmaade til fremstilling heraf - Google Patents
Lysfoelsomt diazoniumgruppeholdigt polykondensationsprodukt og fremgangsmaade til fremstilling herafInfo
- Publication number
- DK113484D0 DK113484D0 DK1134/84A DK113484A DK113484D0 DK 113484 D0 DK113484 D0 DK 113484D0 DK 1134/84 A DK1134/84 A DK 1134/84A DK 113484 A DK113484 A DK 113484A DK 113484 D0 DK113484 D0 DK 113484D0
- Authority
- DK
- Denmark
- Prior art keywords
- polycondensation product
- light
- iii
- aromatic
- compound
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G12/00—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen
- C08G12/02—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes
- C08G12/04—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with acyclic or carbocyclic compounds
- C08G12/06—Amines
- C08G12/08—Amines aromatic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
- Polyesters Or Polycarbonates (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Medicinal Preparation (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
- Polyamides (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19833311435 DE3311435A1 (de) | 1983-03-29 | 1983-03-29 | Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt, verfahren zu seiner herstellung und lichtempfindliches aufzeichnungsmaterial, das dieses polykondensationsprodukt enthaelt |
Publications (2)
Publication Number | Publication Date |
---|---|
DK113484D0 true DK113484D0 (da) | 1984-02-28 |
DK113484A DK113484A (da) | 1984-09-30 |
Family
ID=6195002
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK113484A DK113484A (da) | 1983-03-29 | 1984-02-28 | Lysfoelsomt diazoniumgruppeholdigt polykondensationsprodukt og fremgangsmaade til fremstilling heraf |
Country Status (14)
Country | Link |
---|---|
US (1) | US4661432A (da) |
EP (1) | EP0126875B1 (da) |
JP (1) | JPH0727201B2 (da) |
AT (1) | ATE27499T1 (da) |
AU (1) | AU566652B2 (da) |
BR (1) | BR8401442A (da) |
CA (1) | CA1212106A (da) |
DE (2) | DE3311435A1 (da) |
DK (1) | DK113484A (da) |
ES (1) | ES530803A0 (da) |
FI (1) | FI75679C (da) |
IL (1) | IL71050A (da) |
NO (1) | NO841233L (da) |
ZA (1) | ZA842091B (da) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4618562A (en) * | 1984-12-27 | 1986-10-21 | American Hoechst Corporation | Aqueous developable lithographic printing plates containing an admixture of diazonium salts and polymers and composition therefor |
DE3509383A1 (de) * | 1985-03-15 | 1986-09-18 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches diazoniumsalz-polykondensationsprodukt und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
DE3528309A1 (de) * | 1985-08-07 | 1987-02-12 | Hoechst Ag | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
US4692397A (en) * | 1985-11-27 | 1987-09-08 | American Hoechst Corporation | Process for developing an aqueous alkaline development diazo photographic element |
US4914000A (en) * | 1988-02-03 | 1990-04-03 | Hoechst Celanese Corporation | Three dimensional reproduction material diazonium condensates and use in light sensitive |
JP2657516B2 (ja) * | 1988-04-05 | 1997-09-24 | コニカ株式会社 | 感光性組成物 |
JP2671406B2 (ja) * | 1988-07-19 | 1997-10-29 | 三菱化学株式会社 | 感光性組成物 |
JP2768692B2 (ja) * | 1988-08-01 | 1998-06-25 | 株式会社日立製作所 | 感放射線組成物及びパターン形成方法 |
DE3924812A1 (de) * | 1989-07-27 | 1991-01-31 | Hoechst Ag | Loesemittelgemisch und beschichtungsloesung fuer die herstellung negativ arbeitender lichtempfindlicher aufzeichnungsmaterialien |
JP2687018B2 (ja) * | 1989-08-31 | 1997-12-08 | 富士写真フイルム株式会社 | 感光性組成物 |
JP2627565B2 (ja) * | 1990-02-19 | 1997-07-09 | 富士写真フイルム株式会社 | 感光性平版印刷版 |
JPH03290663A (ja) * | 1990-04-09 | 1991-12-20 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPH03296756A (ja) * | 1990-04-16 | 1991-12-27 | Fuji Photo Film Co Ltd | 画像形成方法 |
JPH04172353A (ja) * | 1990-11-05 | 1992-06-19 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPH04172354A (ja) * | 1990-11-05 | 1992-06-19 | Fuji Photo Film Co Ltd | 画像形成方法 |
JP2709532B2 (ja) * | 1991-03-01 | 1998-02-04 | 富士写真フイルム株式会社 | 感光性平版印刷版 |
US5370965A (en) * | 1991-12-10 | 1994-12-06 | Fuji Photo Film Co., Ltd. | Positive-working light-sensitive composition containing diazonium salt and novolak resin |
IT1264010B (it) * | 1993-04-06 | 1996-09-06 | Policondensato fotosensibile per lastre litografiche negative | |
JP3810215B2 (ja) * | 1998-06-17 | 2006-08-16 | 富士写真フイルム株式会社 | 感光性平版印刷版 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3867147A (en) * | 1969-05-20 | 1975-02-18 | Hoechst Co American | Light-sensitive diazo compounds and reproduction material employing the same |
US3849392A (en) * | 1969-05-20 | 1974-11-19 | Kalle Ag | Process for the production of polycondensation products of aromatic diazonium compounds |
US3679419A (en) * | 1969-05-20 | 1972-07-25 | Azoplate Corp | Light-sensitive diazo condensate containing reproduction material |
US4436804A (en) * | 1981-03-20 | 1984-03-13 | American Hoechst Corporation | Light-sensitive polymeric diazonium condensates and reproduction compositions and materials therewith |
-
1983
- 1983-03-29 DE DE19833311435 patent/DE3311435A1/de not_active Withdrawn
-
1984
- 1984-02-23 IL IL71050A patent/IL71050A/xx unknown
- 1984-02-28 DK DK113484A patent/DK113484A/da not_active Application Discontinuation
- 1984-03-20 EP EP84103028A patent/EP0126875B1/de not_active Expired
- 1984-03-20 DE DE8484103028T patent/DE3463979D1/de not_active Expired
- 1984-03-20 AT AT84103028T patent/ATE27499T1/de not_active IP Right Cessation
- 1984-03-21 ZA ZA842091A patent/ZA842091B/xx unknown
- 1984-03-21 ES ES530803A patent/ES530803A0/es active Granted
- 1984-03-22 CA CA000450201A patent/CA1212106A/en not_active Expired
- 1984-03-27 FI FI841216A patent/FI75679C/fi not_active IP Right Cessation
- 1984-03-27 AU AU26117/84A patent/AU566652B2/en not_active Ceased
- 1984-03-28 BR BR8401442A patent/BR8401442A/pt not_active IP Right Cessation
- 1984-03-28 NO NO841233A patent/NO841233L/no unknown
- 1984-03-29 JP JP59059681A patent/JPH0727201B2/ja not_active Expired - Lifetime
-
1986
- 1986-01-23 US US06/824,257 patent/US4661432A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
ZA842091B (en) | 1984-10-31 |
NO841233L (no) | 1984-10-01 |
JPS59196325A (ja) | 1984-11-07 |
DK113484A (da) | 1984-09-30 |
EP0126875A1 (de) | 1984-12-05 |
ATE27499T1 (de) | 1987-06-15 |
DE3463979D1 (en) | 1987-07-02 |
JPH0727201B2 (ja) | 1995-03-29 |
DE3311435A1 (de) | 1984-10-04 |
FI841216A0 (fi) | 1984-03-27 |
US4661432A (en) | 1987-04-28 |
IL71050A (en) | 1987-07-31 |
FI841216A (fi) | 1984-09-30 |
IL71050A0 (en) | 1984-05-31 |
AU566652B2 (en) | 1987-10-29 |
AU2611784A (en) | 1984-10-04 |
CA1212106A (en) | 1986-09-30 |
FI75679C (fi) | 1988-07-11 |
ES8505707A1 (es) | 1985-06-01 |
ES530803A0 (es) | 1985-06-01 |
FI75679B (fi) | 1988-03-31 |
EP0126875B1 (de) | 1987-05-27 |
BR8401442A (pt) | 1984-11-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AHS | Application shelved for other reasons than non-payment |