ZA842091B - Light-sensitive,diazonium group-containing polycondensation product,process for its production,and light-sensitive recording material containing this polycondensation product - Google Patents

Light-sensitive,diazonium group-containing polycondensation product,process for its production,and light-sensitive recording material containing this polycondensation product

Info

Publication number
ZA842091B
ZA842091B ZA842091A ZA842091A ZA842091B ZA 842091 B ZA842091 B ZA 842091B ZA 842091 A ZA842091 A ZA 842091A ZA 842091 A ZA842091 A ZA 842091A ZA 842091 B ZA842091 B ZA 842091B
Authority
ZA
South Africa
Prior art keywords
light
polycondensation product
sensitive
production
iii
Prior art date
Application number
ZA842091A
Other languages
English (en)
Inventor
Lutz Walter
Steppan Hartmut
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of ZA842091B publication Critical patent/ZA842091B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G12/00—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen
    • C08G12/02—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes
    • C08G12/04—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with acyclic or carbocyclic compounds
    • C08G12/06—Amines
    • C08G12/08—Amines aromatic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Medicinal Preparation (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polyamides (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
ZA842091A 1983-03-29 1984-03-21 Light-sensitive,diazonium group-containing polycondensation product,process for its production,and light-sensitive recording material containing this polycondensation product ZA842091B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19833311435 DE3311435A1 (de) 1983-03-29 1983-03-29 Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt, verfahren zu seiner herstellung und lichtempfindliches aufzeichnungsmaterial, das dieses polykondensationsprodukt enthaelt

Publications (1)

Publication Number Publication Date
ZA842091B true ZA842091B (en) 1984-10-31

Family

ID=6195002

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA842091A ZA842091B (en) 1983-03-29 1984-03-21 Light-sensitive,diazonium group-containing polycondensation product,process for its production,and light-sensitive recording material containing this polycondensation product

Country Status (14)

Country Link
US (1) US4661432A (xx)
EP (1) EP0126875B1 (xx)
JP (1) JPH0727201B2 (xx)
AT (1) ATE27499T1 (xx)
AU (1) AU566652B2 (xx)
BR (1) BR8401442A (xx)
CA (1) CA1212106A (xx)
DE (2) DE3311435A1 (xx)
DK (1) DK113484A (xx)
ES (1) ES8505707A1 (xx)
FI (1) FI75679C (xx)
IL (1) IL71050A (xx)
NO (1) NO841233L (xx)
ZA (1) ZA842091B (xx)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4618562A (en) * 1984-12-27 1986-10-21 American Hoechst Corporation Aqueous developable lithographic printing plates containing an admixture of diazonium salts and polymers and composition therefor
DE3509383A1 (de) * 1985-03-15 1986-09-18 Hoechst Ag, 6230 Frankfurt Lichtempfindliches diazoniumsalz-polykondensationsprodukt und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3528309A1 (de) * 1985-08-07 1987-02-12 Hoechst Ag Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
US4692397A (en) * 1985-11-27 1987-09-08 American Hoechst Corporation Process for developing an aqueous alkaline development diazo photographic element
US4914000A (en) * 1988-02-03 1990-04-03 Hoechst Celanese Corporation Three dimensional reproduction material diazonium condensates and use in light sensitive
JP2657516B2 (ja) * 1988-04-05 1997-09-24 コニカ株式会社 感光性組成物
JP2671406B2 (ja) * 1988-07-19 1997-10-29 三菱化学株式会社 感光性組成物
JP2768692B2 (ja) * 1988-08-01 1998-06-25 株式会社日立製作所 感放射線組成物及びパターン形成方法
DE3924812A1 (de) * 1989-07-27 1991-01-31 Hoechst Ag Loesemittelgemisch und beschichtungsloesung fuer die herstellung negativ arbeitender lichtempfindlicher aufzeichnungsmaterialien
JP2687018B2 (ja) * 1989-08-31 1997-12-08 富士写真フイルム株式会社 感光性組成物
JP2627565B2 (ja) * 1990-02-19 1997-07-09 富士写真フイルム株式会社 感光性平版印刷版
JPH03290663A (ja) * 1990-04-09 1991-12-20 Fuji Photo Film Co Ltd 感光性組成物
JPH03296756A (ja) * 1990-04-16 1991-12-27 Fuji Photo Film Co Ltd 画像形成方法
JPH04172354A (ja) * 1990-11-05 1992-06-19 Fuji Photo Film Co Ltd 画像形成方法
JPH04172353A (ja) * 1990-11-05 1992-06-19 Fuji Photo Film Co Ltd 感光性組成物
JP2709532B2 (ja) * 1991-03-01 1998-02-04 富士写真フイルム株式会社 感光性平版印刷版
US5370965A (en) * 1991-12-10 1994-12-06 Fuji Photo Film Co., Ltd. Positive-working light-sensitive composition containing diazonium salt and novolak resin
IT1264010B (it) * 1993-04-06 1996-09-06 Policondensato fotosensibile per lastre litografiche negative
JP3810215B2 (ja) * 1998-06-17 2006-08-16 富士写真フイルム株式会社 感光性平版印刷版

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3849392A (en) * 1969-05-20 1974-11-19 Kalle Ag Process for the production of polycondensation products of aromatic diazonium compounds
US3679419A (en) * 1969-05-20 1972-07-25 Azoplate Corp Light-sensitive diazo condensate containing reproduction material
US3867147A (en) * 1969-05-20 1975-02-18 Hoechst Co American Light-sensitive diazo compounds and reproduction material employing the same
US4436804A (en) * 1981-03-20 1984-03-13 American Hoechst Corporation Light-sensitive polymeric diazonium condensates and reproduction compositions and materials therewith

Also Published As

Publication number Publication date
DE3311435A1 (de) 1984-10-04
ES530803A0 (es) 1985-06-01
IL71050A0 (en) 1984-05-31
AU2611784A (en) 1984-10-04
ATE27499T1 (de) 1987-06-15
DK113484A (da) 1984-09-30
NO841233L (no) 1984-10-01
US4661432A (en) 1987-04-28
EP0126875B1 (de) 1987-05-27
DK113484D0 (da) 1984-02-28
ES8505707A1 (es) 1985-06-01
FI841216A0 (fi) 1984-03-27
CA1212106A (en) 1986-09-30
EP0126875A1 (de) 1984-12-05
JPH0727201B2 (ja) 1995-03-29
FI841216A (fi) 1984-09-30
BR8401442A (pt) 1984-11-06
AU566652B2 (en) 1987-10-29
FI75679B (fi) 1988-03-31
IL71050A (en) 1987-07-31
DE3463979D1 (en) 1987-07-02
FI75679C (fi) 1988-07-11
JPS59196325A (ja) 1984-11-07

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