NO20085230L - Superledende tynnfilmmateriale og fremgangsmate for fremstilling av superledende tynnfilmmateriale - Google Patents
Superledende tynnfilmmateriale og fremgangsmate for fremstilling av superledende tynnfilmmaterialeInfo
- Publication number
- NO20085230L NO20085230L NO20085230A NO20085230A NO20085230L NO 20085230 L NO20085230 L NO 20085230L NO 20085230 A NO20085230 A NO 20085230A NO 20085230 A NO20085230 A NO 20085230A NO 20085230 L NO20085230 L NO 20085230L
- Authority
- NO
- Norway
- Prior art keywords
- thin film
- film material
- superconducting thin
- manufacturing
- hobco layer
- Prior art date
Links
- 239000000463 material Substances 0.000 title abstract 3
- 239000010409 thin film Substances 0.000 title abstract 3
- 238000000034 method Methods 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000002184 metal Substances 0.000 abstract 4
- 238000000151 deposition Methods 0.000 abstract 2
- 239000010408 film Substances 0.000 abstract 2
- 238000005240 physical vapour deposition Methods 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 230000008021 deposition Effects 0.000 abstract 1
- 238000005289 physical deposition Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B12/00—Superconductive or hyperconductive conductors, cables, or transmission lines
- H01B12/02—Superconductive or hyperconductive conductors, cables, or transmission lines characterised by their form
- H01B12/06—Films or wires on bases or cores
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming superconductor layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/20—Permanent superconducting devices
- H10N60/203—Permanent superconducting devices comprising high-Tc ceramic materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming superconductor layers
- H10N60/0324—Processes for depositing or forming superconductor layers from a solution
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming superconductor layers
- H10N60/0521—Processes for depositing or forming superconductor layers by pulsed laser deposition, e.g. laser sputtering; laser ablation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/80—Material per se process of making same
- Y10S505/812—Stock
- Y10S505/813—Wire, tape, or film
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006140172A JP4690246B2 (ja) | 2006-05-19 | 2006-05-19 | 超電導薄膜材料およびその製造方法 |
PCT/JP2007/058657 WO2007135832A1 (ja) | 2006-05-19 | 2007-04-20 | 超電導薄膜材料およびその製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
NO20085230L true NO20085230L (no) | 2008-12-12 |
Family
ID=38723145
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO20085230A NO20085230L (no) | 2006-05-19 | 2008-12-12 | Superledende tynnfilmmateriale og fremgangsmate for fremstilling av superledende tynnfilmmateriale |
Country Status (12)
Country | Link |
---|---|
US (1) | US7858558B2 (ru) |
EP (1) | EP2031606B1 (ru) |
JP (1) | JP4690246B2 (ru) |
KR (1) | KR101110936B1 (ru) |
CN (1) | CN101449341B (ru) |
AU (1) | AU2007252693A1 (ru) |
CA (1) | CA2650894A1 (ru) |
MX (1) | MX2008014370A (ru) |
NO (1) | NO20085230L (ru) |
RU (1) | RU2384907C1 (ru) |
TW (1) | TW200807451A (ru) |
WO (1) | WO2007135832A1 (ru) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007220467A (ja) * | 2006-02-16 | 2007-08-30 | Sumitomo Electric Ind Ltd | 超電導薄膜材料の製造方法、超電導機器、および超電導薄膜材料 |
EP2120471A1 (en) | 2007-02-28 | 2009-11-18 | NTT DoCoMo, Inc. | Base station device and communication control method |
JP2010165502A (ja) * | 2009-01-14 | 2010-07-29 | Sumitomo Electric Ind Ltd | Re123超電導薄膜テープ線材の製造方法およびre123超電導薄膜テープ線材 |
JP2011113662A (ja) * | 2009-11-24 | 2011-06-09 | Sumitomo Electric Ind Ltd | 薄膜超電導線材用金属基材、その製造方法および薄膜超電導線材の製造方法 |
CN101916619B (zh) * | 2010-07-09 | 2011-09-07 | 北京工业大学 | 一种纳米颗粒掺杂的rebco薄膜及其制备方法 |
JP5838596B2 (ja) | 2011-05-30 | 2016-01-06 | 住友電気工業株式会社 | 超電導薄膜材料およびその製造方法 |
US9378869B2 (en) | 2011-11-15 | 2016-06-28 | Furukawa Electric Co., Ltd. | Superconductive wire material substrate, manufacturing method thereof and superconductive wire material |
JP5804926B2 (ja) * | 2011-12-12 | 2015-11-04 | 古河電気工業株式会社 | 超電導薄膜 |
US20140342916A1 (en) * | 2012-01-17 | 2014-11-20 | Sunam Co., Ltd. | Superconducting wire and method of forming the same |
KR101404534B1 (ko) | 2012-06-11 | 2014-06-09 | 가부시키가이샤후지쿠라 | 산화물 초전도 선재 및 초전도 코일 |
US9812233B2 (en) * | 2012-11-02 | 2017-11-07 | Furukawa Electric Co., Ltd. | Superconducting oxide thin film |
JP6244142B2 (ja) * | 2013-09-04 | 2017-12-06 | 東洋鋼鈑株式会社 | 超電導線材用基板及びその製造方法、並びに超電導線材 |
US9978481B2 (en) * | 2014-03-07 | 2018-05-22 | Sumitomo Electric Industries, Ltd. | Oxide superconducting thin film wire and method for producing same |
JP2016054050A (ja) * | 2014-09-03 | 2016-04-14 | 住友電気工業株式会社 | 超電導線材 |
RU2629136C2 (ru) * | 2015-11-25 | 2017-08-24 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Московский государственный университет имени М.В. Ломоносова" (МГУ) | Способ получения высокотемпературной сверхпроводящей пленки на кварцевой подложке |
KR101837828B1 (ko) * | 2016-04-28 | 2018-03-12 | 연세대학교 산학협력단 | 열전 재료, 이의 제조 방법 및 열전 소자 |
CN110291597B (zh) * | 2017-02-14 | 2021-04-30 | 住友电气工业株式会社 | 超导线材和超导线圈 |
JP6859805B2 (ja) | 2017-03-30 | 2021-04-14 | Tdk株式会社 | 積層体、熱電変換素子 |
US10804010B2 (en) * | 2017-05-12 | 2020-10-13 | American Superconductor Corporation | High temperature superconducting wires having increased engineering current densities |
CN108630357A (zh) * | 2018-03-30 | 2018-10-09 | 上海交通大学 | 一种利用有机溶液浸泡提高高温超导带材性能的方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5185317A (en) * | 1988-02-19 | 1993-02-09 | Northwestern University | Method of forming superconducting Tl-Ba-Ca-Cu-O films |
US5296460A (en) * | 1988-02-19 | 1994-03-22 | Northwestern University | CVD method for forming Bi -containing oxide superconducting films |
DE68909395T2 (de) * | 1989-02-10 | 1994-02-17 | Toshiba Kawasaki Kk | Verfahren zur Ablagerung eines dünnen Oxydfilms. |
US5032568A (en) * | 1989-09-01 | 1991-07-16 | Regents Of The University Of Minnesota | Deposition of superconducting thick films by spray inductively coupled plasma method |
SU1829818A1 (ru) | 1991-05-20 | 1995-07-09 | Московский институт электронной техники | Способ получения высокотемпературных сверхпроводящих пленок |
JPH07206437A (ja) | 1994-01-13 | 1995-08-08 | Toray Ind Inc | 超電導体およびその製造方法 |
US5883050A (en) * | 1996-10-30 | 1999-03-16 | The University Of Kansas | Hg-based superconducting cuprate films |
AU751092B2 (en) * | 1997-06-18 | 2002-08-08 | Massachusetts Institute Of Technology | Controlled conversion of metal oxyfluorides into superconducting oxides |
US6974501B1 (en) * | 1999-11-18 | 2005-12-13 | American Superconductor Corporation | Multi-layer articles and methods of making same |
US6673387B1 (en) * | 2000-07-14 | 2004-01-06 | American Superconductor Corporation | Control of oxide layer reaction rates |
JP4433589B2 (ja) * | 2000-08-29 | 2010-03-17 | 住友電気工業株式会社 | 高温超電導厚膜部材およびその製造方法 |
US6797313B2 (en) * | 2001-07-31 | 2004-09-28 | American Superconductor Corporation | Superconductor methods and reactors |
US6794339B2 (en) * | 2001-09-12 | 2004-09-21 | Brookhaven Science Associates | Synthesis of YBa2CU3O7 using sub-atmospheric processing |
JP4203606B2 (ja) * | 2002-11-08 | 2009-01-07 | 財団法人国際超電導産業技術研究センター | 酸化物超電導厚膜用組成物及び厚膜テープ状酸化物超電導体 |
JP2005038632A (ja) | 2003-07-16 | 2005-02-10 | Sumitomo Electric Ind Ltd | 酸化物超電導線材の製造方法 |
JP4626134B2 (ja) * | 2003-09-17 | 2011-02-02 | 住友電気工業株式会社 | 超電導体およびその製造方法 |
JP2007220467A (ja) * | 2006-02-16 | 2007-08-30 | Sumitomo Electric Ind Ltd | 超電導薄膜材料の製造方法、超電導機器、および超電導薄膜材料 |
-
2006
- 2006-05-19 JP JP2006140172A patent/JP4690246B2/ja not_active Expired - Fee Related
-
2007
- 2007-04-20 KR KR1020087030836A patent/KR101110936B1/ko active IP Right Grant
- 2007-04-20 AU AU2007252693A patent/AU2007252693A1/en not_active Abandoned
- 2007-04-20 WO PCT/JP2007/058657 patent/WO2007135832A1/ja active Application Filing
- 2007-04-20 MX MX2008014370A patent/MX2008014370A/es not_active Application Discontinuation
- 2007-04-20 CA CA 2650894 patent/CA2650894A1/en not_active Abandoned
- 2007-04-20 US US12/299,141 patent/US7858558B2/en not_active Expired - Fee Related
- 2007-04-20 CN CN200780018363.6A patent/CN101449341B/zh not_active Expired - Fee Related
- 2007-04-20 EP EP07742092.5A patent/EP2031606B1/en not_active Not-in-force
- 2007-04-20 RU RU2008150370A patent/RU2384907C1/ru not_active IP Right Cessation
- 2007-05-17 TW TW96117511A patent/TW200807451A/zh unknown
-
2008
- 2008-12-12 NO NO20085230A patent/NO20085230L/no not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
US20090137400A1 (en) | 2009-05-28 |
JP2007311234A (ja) | 2007-11-29 |
WO2007135832A1 (ja) | 2007-11-29 |
EP2031606A1 (en) | 2009-03-04 |
EP2031606B1 (en) | 2015-11-18 |
CN101449341A (zh) | 2009-06-03 |
CN101449341B (zh) | 2014-07-09 |
MX2008014370A (es) | 2008-11-27 |
KR101110936B1 (ko) | 2012-02-24 |
KR20090029216A (ko) | 2009-03-20 |
CA2650894A1 (en) | 2007-11-29 |
RU2384907C1 (ru) | 2010-03-20 |
TW200807451A (en) | 2008-02-01 |
JP4690246B2 (ja) | 2011-06-01 |
EP2031606A4 (en) | 2012-11-28 |
AU2007252693A1 (en) | 2007-11-29 |
US7858558B2 (en) | 2010-12-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FC2A | Withdrawal, rejection or dismissal of laid open patent application |