TW200506082A - Shutter disk and blade for physical vapor deposition chamber - Google Patents

Shutter disk and blade for physical vapor deposition chamber

Info

Publication number
TW200506082A
TW200506082A TW093121934A TW93121934A TW200506082A TW 200506082 A TW200506082 A TW 200506082A TW 093121934 A TW093121934 A TW 093121934A TW 93121934 A TW93121934 A TW 93121934A TW 200506082 A TW200506082 A TW 200506082A
Authority
TW
Taiwan
Prior art keywords
shutter disk
vapor deposition
physical vapor
deposition chamber
blade
Prior art date
Application number
TW093121934A
Other languages
Chinese (zh)
Other versions
TWI356100B (en
Inventor
Michael Feltsman
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/626,471 external-priority patent/US7008517B2/en
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of TW200506082A publication Critical patent/TW200506082A/en
Application granted granted Critical
Publication of TWI356100B publication Critical patent/TWI356100B/en

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The present invention generally provides a method and apparatus for use in a physical vapor deposition chamber. In one embodiment, invention provides a shutter disk mechanism that eliminates the need for axially orientating a shutter disk to a robot blade that transfers the shutter disk to a substrate support.
TW93121934A 2003-07-24 2004-07-22 Shutter disk and blade for physical vapor depositi TWI356100B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/626,471 US7008517B2 (en) 2002-02-20 2003-07-24 Shutter disk and blade for physical vapor deposition chamber

Publications (2)

Publication Number Publication Date
TW200506082A true TW200506082A (en) 2005-02-16
TWI356100B TWI356100B (en) 2012-01-11

Family

ID=34590561

Family Applications (1)

Application Number Title Priority Date Filing Date
TW93121934A TWI356100B (en) 2003-07-24 2004-07-22 Shutter disk and blade for physical vapor depositi

Country Status (2)

Country Link
CN (1) CN1576386A (en)
TW (1) TWI356100B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI455226B (en) * 2007-03-09 2014-10-01 Applied Materials Inc High temperature anti-droop end effector for substrate transfer
TWI484052B (en) * 2008-09-22 2015-05-11 Applied Materials Inc Shutter disk for physical vapor deposition chamber
TWI569363B (en) * 2014-05-20 2017-02-01 A load device, a reaction chamber and a semiconductor processing device

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102945788B (en) * 2011-08-16 2015-04-15 北京北方微电子基地设备工艺研究中心有限责任公司 Shielding device and semiconductor processing equipment using same
CN103276352B (en) * 2013-05-02 2015-08-05 上海华力微电子有限公司 Baffle plate inductor block
CN104752262B (en) * 2013-12-31 2018-05-08 北京北方华创微电子装备有限公司 Block disc detector, detection method, reaction chamber and semiconductor processing equipment
CN104746002B (en) * 2013-12-31 2017-06-06 北京北方微电子基地设备工艺研究中心有限责任公司 One kind blocks disc transport apparatus, reaction chamber and plasma processing device
CN105097606B (en) * 2014-05-20 2018-05-08 北京北方华创微电子装备有限公司 One kind blocks disk and reaction chamber
CN106571284B (en) * 2015-10-09 2019-01-18 北京北方华创微电子装备有限公司 Block disc system, reaction chamber and semiconductor processing equipment
JP2018535324A (en) * 2015-11-24 2018-11-29 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Precoated shield for use in VHF-RF PVD chambers
US10851453B2 (en) * 2018-04-11 2020-12-01 Applied Materials, Inc. Methods and apparatus for shutter disk assembly detection
CN110904424B (en) * 2018-09-17 2022-01-07 北京北方华创微电子装备有限公司 Bracket mechanism and reaction chamber
CN111986976B (en) * 2019-05-22 2022-04-22 北京北方华创微电子装备有限公司 Process chamber and semiconductor processing equipment
US11817331B2 (en) * 2020-07-27 2023-11-14 Applied Materials, Inc. Substrate holder replacement with protective disk during pasting process
CN112501581B (en) * 2020-11-12 2022-02-22 北京北方华创微电子装备有限公司 Shielding disc bearing device in semiconductor processing equipment and semiconductor processing equipment
CN115074692B (en) * 2022-06-24 2023-10-13 北京北方华创微电子装备有限公司 Semiconductor process equipment and process chamber thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI455226B (en) * 2007-03-09 2014-10-01 Applied Materials Inc High temperature anti-droop end effector for substrate transfer
US9443752B2 (en) 2007-03-09 2016-09-13 Applied Materials, Inc. High temperature anti-droop end effector for substrate transfer
TWI484052B (en) * 2008-09-22 2015-05-11 Applied Materials Inc Shutter disk for physical vapor deposition chamber
TWI569363B (en) * 2014-05-20 2017-02-01 A load device, a reaction chamber and a semiconductor processing device

Also Published As

Publication number Publication date
CN1576386A (en) 2005-02-09
TWI356100B (en) 2012-01-11

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