NL8403706A - Fotopolymeriseerbare samenstelling en een fotoinitiatorsysteem. - Google Patents

Fotopolymeriseerbare samenstelling en een fotoinitiatorsysteem. Download PDF

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Publication number
NL8403706A
NL8403706A NL8403706A NL8403706A NL8403706A NL 8403706 A NL8403706 A NL 8403706A NL 8403706 A NL8403706 A NL 8403706A NL 8403706 A NL8403706 A NL 8403706A NL 8403706 A NL8403706 A NL 8403706A
Authority
NL
Netherlands
Prior art keywords
compound
photopolymerizable composition
composition according
radicals
photoinitiator
Prior art date
Application number
NL8403706A
Other languages
English (en)
Dutch (nl)
Original Assignee
Dsm Resins Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dsm Resins Bv filed Critical Dsm Resins Bv
Priority to NL8403706A priority Critical patent/NL8403706A/nl
Priority to NL8501022A priority patent/NL8501022A/nl
Priority to EP85202013A priority patent/EP0185423A1/en
Priority to PT81619A priority patent/PT81619B/pt
Priority to ES549632A priority patent/ES8704187A1/es
Priority to ES553774A priority patent/ES8802576A1/es
Priority to DE8686200593T priority patent/DE3686344T2/de
Priority to EP86200593A priority patent/EP0197616B1/en
Priority to PT82354A priority patent/PT82354B/pt
Priority to AU57919/86A priority patent/AU581989B2/en
Priority to IN417/MAS/86A priority patent/IN167407B/en
Priority to CH2234/86A priority patent/CH667461A5/de
Publication of NL8403706A publication Critical patent/NL8403706A/nl

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295Photolytic halogen compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
NL8403706A 1984-12-06 1984-12-06 Fotopolymeriseerbare samenstelling en een fotoinitiatorsysteem. NL8403706A (nl)

Priority Applications (12)

Application Number Priority Date Filing Date Title
NL8403706A NL8403706A (nl) 1984-12-06 1984-12-06 Fotopolymeriseerbare samenstelling en een fotoinitiatorsysteem.
NL8501022A NL8501022A (nl) 1984-12-06 1985-04-09 Fotopolymeriseerbare samenstelling en een fotoinitiatorsysteem.
EP85202013A EP0185423A1 (en) 1984-12-06 1985-12-04 Photopolymerizable composition and a photo-initiator system
PT81619A PT81619B (pt) 1984-12-06 1985-12-05 Processo para a preparacao de uma composicao fotopolimerizavel contendo compostos etilenicamente insaturados e um sistema foto-iniciador adequado
ES549632A ES8704187A1 (es) 1984-12-06 1985-12-05 Procedimiento para preparar un articulo de resina.
ES553774A ES8802576A1 (es) 1984-12-06 1986-04-08 Un procedimiento para fabricar un articulo de una composicion fotopolimerizable
DE8686200593T DE3686344T2 (de) 1984-12-06 1986-04-08 Photopolymerisierbare zusammensetzung und photoinitiatorsystem.
EP86200593A EP0197616B1 (en) 1984-12-06 1986-04-08 Photopolymerizable composition and a photo-initiator system
PT82354A PT82354B (en) 1984-12-06 1986-04-09 Photopolymerizable composition and a photo-initiator system
AU57919/86A AU581989B2 (en) 1984-12-06 1986-05-26 Photopolymerizable composition and a photo-initiator system
IN417/MAS/86A IN167407B (pt) 1984-12-06 1986-05-28
CH2234/86A CH667461A5 (de) 1984-12-06 1986-06-03 Photopolymerisierbare zusammensetzung sowie photoinitiatorsystem.

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
NL8403706A NL8403706A (nl) 1984-12-06 1984-12-06 Fotopolymeriseerbare samenstelling en een fotoinitiatorsysteem.
NL8403706 1984-12-06
NL8501022 1985-04-09
NL8501022A NL8501022A (nl) 1984-12-06 1985-04-09 Fotopolymeriseerbare samenstelling en een fotoinitiatorsysteem.

Publications (1)

Publication Number Publication Date
NL8403706A true NL8403706A (nl) 1986-07-01

Family

ID=36915560

Family Applications (2)

Application Number Title Priority Date Filing Date
NL8403706A NL8403706A (nl) 1984-12-06 1984-12-06 Fotopolymeriseerbare samenstelling en een fotoinitiatorsysteem.
NL8501022A NL8501022A (nl) 1984-12-06 1985-04-09 Fotopolymeriseerbare samenstelling en een fotoinitiatorsysteem.

Family Applications After (1)

Application Number Title Priority Date Filing Date
NL8501022A NL8501022A (nl) 1984-12-06 1985-04-09 Fotopolymeriseerbare samenstelling en een fotoinitiatorsysteem.

Country Status (8)

Country Link
EP (2) EP0185423A1 (pt)
AU (1) AU581989B2 (pt)
CH (1) CH667461A5 (pt)
DE (1) DE3686344T2 (pt)
ES (2) ES8704187A1 (pt)
IN (1) IN167407B (pt)
NL (2) NL8403706A (pt)
PT (2) PT81619B (pt)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6261908A (ja) * 1985-09-11 1987-03-18 G C Dental Ind Corp 歯科修復用光重合性組成物
JPH062767B2 (ja) * 1989-02-10 1994-01-12 日本ペイント株式会社 光硬化性組成物
GB2237023B (en) * 1989-10-06 1993-09-29 Toa Gosei Chem Ind A catalytic composition for photopolymerization and a photopolymerizable composition containing the same
US5217760A (en) * 1990-07-20 1993-06-08 Loctite Corporation Free radically curable formulations employing dithiolate catalysts
CN1305911C (zh) * 2002-04-26 2007-03-21 雅宝公司 一种光引发聚合中的新型胺共引发剂
US20060293404A1 (en) * 2003-04-24 2006-12-28 Santobianco John G New class of amine coinitiators in photoinitiated polymerizations
EP1645583A1 (en) * 2004-10-06 2006-04-12 Cytec Surface Specialties, S.A. Radiation curable powder coating compositions
CA2648307A1 (en) * 2006-04-12 2007-10-18 Albemarle Corporation Amine promoter blends for peroxide-initiated curing systems

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1408265A (en) * 1971-10-18 1975-10-01 Ici Ltd Photopolymerisable composition
AU469775B2 (en) * 1971-10-18 1976-02-26 Imperial Chemical Industries Ltd. Photopolymerisable composition
US3715293A (en) * 1971-12-17 1973-02-06 Union Carbide Corp Acetophenone-type photosensitizers for radiation curable coatings
GB1467645A (en) * 1973-01-31 1977-03-16 Sun Chemical Corp Photoinitiator systems
US3933682A (en) * 1973-01-31 1976-01-20 Sun Chemical Corporation Photopolymerization co-initiator systems
US3966573A (en) * 1974-10-31 1976-06-29 Sun Chemical Corporation Photopolymerization co-initiator systems
US4131529A (en) * 1976-06-05 1978-12-26 Basf Aktiengesellschaft Photoinitiators for photopolymerizable coating compositions

Also Published As

Publication number Publication date
DE3686344T2 (de) 1993-03-25
DE3686344D1 (de) 1992-09-17
PT81619A (en) 1986-06-11
EP0185423A1 (en) 1986-06-25
EP0197616B1 (en) 1992-08-12
ES553774A0 (es) 1988-08-01
ES549632A0 (es) 1987-03-16
AU581989B2 (en) 1989-03-09
AU5791986A (en) 1987-12-03
ES8802576A1 (es) 1988-08-01
ES8704187A1 (es) 1987-03-16
CH667461A5 (de) 1988-10-14
PT82354A (en) 1986-05-01
PT81619B (pt) 1987-10-20
NL8501022A (nl) 1986-11-03
PT82354B (en) 1987-09-08
EP0197616A1 (en) 1986-10-15
IN167407B (pt) 1990-10-20

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BV The patent application has lapsed