ES8704187A1 - Procedimiento para preparar un articulo de resina. - Google Patents

Procedimiento para preparar un articulo de resina.

Info

Publication number
ES8704187A1
ES8704187A1 ES549632A ES549632A ES8704187A1 ES 8704187 A1 ES8704187 A1 ES 8704187A1 ES 549632 A ES549632 A ES 549632A ES 549632 A ES549632 A ES 549632A ES 8704187 A1 ES8704187 A1 ES 8704187A1
Authority
ES
Spain
Prior art keywords
photo
initiator system
photopolymerizable composition
initiator
hydrocarbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES549632A
Other languages
English (en)
Other versions
ES549632A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Covestro Resins BV
Original Assignee
DSM Resins BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DSM Resins BV filed Critical DSM Resins BV
Publication of ES549632A0 publication Critical patent/ES549632A0/es
Publication of ES8704187A1 publication Critical patent/ES8704187A1/es
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295Photolytic halogen compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

METODO DE PRODUCCION DE ARTICULOS DE RESINAS. CONSISTE EN CURAR UNA MEZCLA CONSTITUIDA POR UNA RESINA TERMOENDURECIBLE Y UN SISTEMA CATALIZADOR SENSIBLE A LA LUZ VISIBLE, QUE CONTIENE UN COMPUESTO DE FORMULA (I) Y UN COMPUESTO DE FORMULA R1R2R3N, EN LAS QUE A1, A2, R1, R2 Y R3 PUEDEN SER VARIOS TIPOS DE RADICALES; MEZCLA A LA QUE SE AÑADE 0,001 A 1% DE UN COMPUESTO POLIHALOGENADO Y 0,001 A 1% DE FOTOINICIADOR. ESTAS RESINAS TIENEN APLICACIONES PARA EL ENROLLADO DE FILAMENTOS PARA LA PRODUCCION DE TUBOS.
ES549632A 1984-12-06 1985-12-05 Procedimiento para preparar un articulo de resina. Expired ES8704187A1 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8403706A NL8403706A (nl) 1984-12-06 1984-12-06 Fotopolymeriseerbare samenstelling en een fotoinitiatorsysteem.
NL8501022A NL8501022A (nl) 1984-12-06 1985-04-09 Fotopolymeriseerbare samenstelling en een fotoinitiatorsysteem.

Publications (2)

Publication Number Publication Date
ES549632A0 ES549632A0 (es) 1987-03-16
ES8704187A1 true ES8704187A1 (es) 1987-03-16

Family

ID=36915560

Family Applications (2)

Application Number Title Priority Date Filing Date
ES549632A Expired ES8704187A1 (es) 1984-12-06 1985-12-05 Procedimiento para preparar un articulo de resina.
ES553774A Expired ES8802576A1 (es) 1984-12-06 1986-04-08 Un procedimiento para fabricar un articulo de una composicion fotopolimerizable

Family Applications After (1)

Application Number Title Priority Date Filing Date
ES553774A Expired ES8802576A1 (es) 1984-12-06 1986-04-08 Un procedimiento para fabricar un articulo de una composicion fotopolimerizable

Country Status (8)

Country Link
EP (2) EP0185423A1 (es)
AU (1) AU581989B2 (es)
CH (1) CH667461A5 (es)
DE (1) DE3686344T2 (es)
ES (2) ES8704187A1 (es)
IN (1) IN167407B (es)
NL (2) NL8403706A (es)
PT (2) PT81619B (es)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6261908A (ja) * 1985-09-11 1987-03-18 G C Dental Ind Corp 歯科修復用光重合性組成物
JPH062767B2 (ja) * 1989-02-10 1994-01-12 日本ペイント株式会社 光硬化性組成物
GB2237023B (en) * 1989-10-06 1993-09-29 Toa Gosei Chem Ind A catalytic composition for photopolymerization and a photopolymerizable composition containing the same
US5217760A (en) * 1990-07-20 1993-06-08 Loctite Corporation Free radically curable formulations employing dithiolate catalysts
JP2005523950A (ja) * 2002-04-26 2005-08-11 アルベマール・コーポレーシヨン 光開始重合における新規な種類のアミン共開始剤
US20060293404A1 (en) * 2003-04-24 2006-12-28 Santobianco John G New class of amine coinitiators in photoinitiated polymerizations
EP1645583A1 (en) * 2004-10-06 2006-04-12 Cytec Surface Specialties, S.A. Radiation curable powder coating compositions
KR20090004937A (ko) * 2006-04-12 2009-01-12 알베마를 코포레이션 과산화물-개시 경화계를 위한 아민 촉진제 배합물

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU469775B2 (en) * 1971-10-18 1976-02-26 Imperial Chemical Industries Ltd. Photopolymerisable composition
GB1408265A (en) * 1971-10-18 1975-10-01 Ici Ltd Photopolymerisable composition
US3715293A (en) * 1971-12-17 1973-02-06 Union Carbide Corp Acetophenone-type photosensitizers for radiation curable coatings
US3933682A (en) * 1973-01-31 1976-01-20 Sun Chemical Corporation Photopolymerization co-initiator systems
GB1467645A (en) * 1973-01-31 1977-03-16 Sun Chemical Corp Photoinitiator systems
US3966573A (en) * 1974-10-31 1976-06-29 Sun Chemical Corporation Photopolymerization co-initiator systems
US4131529A (en) * 1976-06-05 1978-12-26 Basf Aktiengesellschaft Photoinitiators for photopolymerizable coating compositions

Also Published As

Publication number Publication date
NL8501022A (nl) 1986-11-03
IN167407B (es) 1990-10-20
ES8802576A1 (es) 1988-08-01
CH667461A5 (de) 1988-10-14
PT81619A (en) 1986-06-11
NL8403706A (nl) 1986-07-01
ES553774A0 (es) 1988-08-01
EP0197616B1 (en) 1992-08-12
PT81619B (pt) 1987-10-20
DE3686344T2 (de) 1993-03-25
EP0185423A1 (en) 1986-06-25
PT82354B (en) 1987-09-08
ES549632A0 (es) 1987-03-16
AU5791986A (en) 1987-12-03
EP0197616A1 (en) 1986-10-15
AU581989B2 (en) 1989-03-09
PT82354A (en) 1986-05-01
DE3686344D1 (de) 1992-09-17

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