ES8802576A1 - Un procedimiento para fabricar un articulo de una composicion fotopolimerizable - Google Patents
Un procedimiento para fabricar un articulo de una composicion fotopolimerizableInfo
- Publication number
- ES8802576A1 ES8802576A1 ES553774A ES553774A ES8802576A1 ES 8802576 A1 ES8802576 A1 ES 8802576A1 ES 553774 A ES553774 A ES 553774A ES 553774 A ES553774 A ES 553774A ES 8802576 A1 ES8802576 A1 ES 8802576A1
- Authority
- ES
- Spain
- Prior art keywords
- photo
- initiator system
- photopolymerizable composition
- initiator
- hydrocarbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000003999 initiator Substances 0.000 title abstract 4
- 239000000203 mixture Substances 0.000 title abstract 2
- 239000004215 Carbon black (E152) Substances 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 229930195733 hydrocarbon Natural products 0.000 abstract 2
- 150000002430 hydrocarbons Chemical class 0.000 abstract 2
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical class 0.000 abstract 1
- 239000003638 chemical reducing agent Substances 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Polymerisation Methods In General (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Abstract
METODO DE PREPARACION DE COMPOSICIONES FOTOPOLIMERIZABLES. CONSISTE EN CURAR UNA RESINA TERMOESTABLE MEDIANTE LUZ VISIBLE, EN PRESENCIA DE UN CATALIZADOR CONSTITUIDO POR UN COMPUESTO FOTOINICIADOR, DE FORMULA (I) Y UN AGENTE REDUCTOR DE FORMULA R1R2R3N, EN LAS QUE A, R1, R2 Y R3 PUEDEN SER VARIOS TIPOS DE RADICALES, A UNA TEMPERATURA COMPRENDIDA ENTRE 0GC Y 200GC. ESTAS COMPOSICIONES TIENEN APLICACIONES EN EL LAMINADO PARA LA PRODUCCION DE ARTICULOS GRANDES, Y BOBINADO DE REFUERZO. *FORMULA*
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL8403706A NL8403706A (nl) | 1984-12-06 | 1984-12-06 | Fotopolymeriseerbare samenstelling en een fotoinitiatorsysteem. |
NL8501022A NL8501022A (nl) | 1984-12-06 | 1985-04-09 | Fotopolymeriseerbare samenstelling en een fotoinitiatorsysteem. |
Publications (2)
Publication Number | Publication Date |
---|---|
ES8802576A1 true ES8802576A1 (es) | 1988-08-01 |
ES553774A0 ES553774A0 (es) | 1988-08-01 |
Family
ID=36915560
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES549632A Expired ES8704187A1 (es) | 1984-12-06 | 1985-12-05 | Procedimiento para preparar un articulo de resina. |
ES553774A Expired ES8802576A1 (es) | 1984-12-06 | 1986-04-08 | Un procedimiento para fabricar un articulo de una composicion fotopolimerizable |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES549632A Expired ES8704187A1 (es) | 1984-12-06 | 1985-12-05 | Procedimiento para preparar un articulo de resina. |
Country Status (8)
Country | Link |
---|---|
EP (2) | EP0185423A1 (es) |
AU (1) | AU581989B2 (es) |
CH (1) | CH667461A5 (es) |
DE (1) | DE3686344T2 (es) |
ES (2) | ES8704187A1 (es) |
IN (1) | IN167407B (es) |
NL (2) | NL8403706A (es) |
PT (2) | PT81619B (es) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6261908A (ja) * | 1985-09-11 | 1987-03-18 | G C Dental Ind Corp | 歯科修復用光重合性組成物 |
JPH062767B2 (ja) * | 1989-02-10 | 1994-01-12 | 日本ペイント株式会社 | 光硬化性組成物 |
GB2237023B (en) * | 1989-10-06 | 1993-09-29 | Toa Gosei Chem Ind | A catalytic composition for photopolymerization and a photopolymerizable composition containing the same |
US5217760A (en) * | 1990-07-20 | 1993-06-08 | Loctite Corporation | Free radically curable formulations employing dithiolate catalysts |
CA2479942A1 (en) | 2002-04-26 | 2003-11-06 | Albemarle Corporation | A new class of amine coinitiators in photoinitiated polymerizations |
US20060293404A1 (en) * | 2003-04-24 | 2006-12-28 | Santobianco John G | New class of amine coinitiators in photoinitiated polymerizations |
EP1645583A1 (en) * | 2004-10-06 | 2006-04-12 | Cytec Surface Specialties, S.A. | Radiation curable powder coating compositions |
KR20090004937A (ko) * | 2006-04-12 | 2009-01-12 | 알베마를 코포레이션 | 과산화물-개시 경화계를 위한 아민 촉진제 배합물 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ZA727120B (en) * | 1971-10-18 | 1973-06-27 | Ici Ltd | Photopolymerisable composition |
GB1408265A (en) * | 1971-10-18 | 1975-10-01 | Ici Ltd | Photopolymerisable composition |
US3715293A (en) * | 1971-12-17 | 1973-02-06 | Union Carbide Corp | Acetophenone-type photosensitizers for radiation curable coatings |
US3933682A (en) * | 1973-01-31 | 1976-01-20 | Sun Chemical Corporation | Photopolymerization co-initiator systems |
GB1467645A (en) * | 1973-01-31 | 1977-03-16 | Sun Chemical Corp | Photoinitiator systems |
US3966573A (en) * | 1974-10-31 | 1976-06-29 | Sun Chemical Corporation | Photopolymerization co-initiator systems |
US4131529A (en) * | 1976-06-05 | 1978-12-26 | Basf Aktiengesellschaft | Photoinitiators for photopolymerizable coating compositions |
-
1984
- 1984-12-06 NL NL8403706A patent/NL8403706A/nl not_active Application Discontinuation
-
1985
- 1985-04-09 NL NL8501022A patent/NL8501022A/nl not_active Application Discontinuation
- 1985-12-04 EP EP85202013A patent/EP0185423A1/en not_active Ceased
- 1985-12-05 PT PT81619A patent/PT81619B/pt not_active IP Right Cessation
- 1985-12-05 ES ES549632A patent/ES8704187A1/es not_active Expired
-
1986
- 1986-04-08 EP EP86200593A patent/EP0197616B1/en not_active Expired - Lifetime
- 1986-04-08 ES ES553774A patent/ES8802576A1/es not_active Expired
- 1986-04-08 DE DE8686200593T patent/DE3686344T2/de not_active Revoked
- 1986-04-09 PT PT82354A patent/PT82354B/pt unknown
- 1986-05-26 AU AU57919/86A patent/AU581989B2/en not_active Ceased
- 1986-05-28 IN IN417/MAS/86A patent/IN167407B/en unknown
- 1986-06-03 CH CH2234/86A patent/CH667461A5/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
PT82354B (en) | 1987-09-08 |
EP0197616B1 (en) | 1992-08-12 |
EP0185423A1 (en) | 1986-06-25 |
NL8403706A (nl) | 1986-07-01 |
PT82354A (en) | 1986-05-01 |
NL8501022A (nl) | 1986-11-03 |
IN167407B (es) | 1990-10-20 |
ES549632A0 (es) | 1987-03-16 |
PT81619A (en) | 1986-06-11 |
CH667461A5 (de) | 1988-10-14 |
ES8704187A1 (es) | 1987-03-16 |
PT81619B (pt) | 1987-10-20 |
EP0197616A1 (en) | 1986-10-15 |
AU581989B2 (en) | 1989-03-09 |
AU5791986A (en) | 1987-12-03 |
DE3686344T2 (de) | 1993-03-25 |
ES553774A0 (es) | 1988-08-01 |
DE3686344D1 (de) | 1992-09-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Patent lapsed |
Effective date: 19960506 |