IN167407B - - Google Patents
Info
- Publication number
- IN167407B IN167407B IN417/MAS/86A IN417MA1986A IN167407B IN 167407 B IN167407 B IN 167407B IN 417MA1986 A IN417MA1986 A IN 417MA1986A IN 167407 B IN167407 B IN 167407B
- Authority
- IN
- India
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Polymerisation Methods In General (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL8403706A NL8403706A (nl) | 1984-12-06 | 1984-12-06 | Fotopolymeriseerbare samenstelling en een fotoinitiatorsysteem. |
| NL8501022A NL8501022A (nl) | 1984-12-06 | 1985-04-09 | Fotopolymeriseerbare samenstelling en een fotoinitiatorsysteem. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IN167407B true IN167407B (es) | 1990-10-20 |
Family
ID=36915560
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IN417/MAS/86A IN167407B (es) | 1984-12-06 | 1986-05-28 |
Country Status (8)
| Country | Link |
|---|---|
| EP (2) | EP0185423A1 (es) |
| AU (1) | AU581989B2 (es) |
| CH (1) | CH667461A5 (es) |
| DE (1) | DE3686344T2 (es) |
| ES (2) | ES8704187A1 (es) |
| IN (1) | IN167407B (es) |
| NL (2) | NL8403706A (es) |
| PT (2) | PT81619B (es) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6261908A (ja) * | 1985-09-11 | 1987-03-18 | G C Dental Ind Corp | 歯科修復用光重合性組成物 |
| JPH062767B2 (ja) * | 1989-02-10 | 1994-01-12 | 日本ペイント株式会社 | 光硬化性組成物 |
| GB2237023B (en) * | 1989-10-06 | 1993-09-29 | Toa Gosei Chem Ind | A catalytic composition for photopolymerization and a photopolymerizable composition containing the same |
| US5217760A (en) * | 1990-07-20 | 1993-06-08 | Loctite Corporation | Free radically curable formulations employing dithiolate catalysts |
| JP2005523950A (ja) * | 2002-04-26 | 2005-08-11 | アルベマール・コーポレーシヨン | 光開始重合における新規な種類のアミン共開始剤 |
| US20060293404A1 (en) * | 2003-04-24 | 2006-12-28 | Santobianco John G | New class of amine coinitiators in photoinitiated polymerizations |
| EP1645583A1 (en) * | 2004-10-06 | 2006-04-12 | Cytec Surface Specialties, S.A. | Radiation curable powder coating compositions |
| KR20090004937A (ko) * | 2006-04-12 | 2009-01-12 | 알베마를 코포레이션 | 과산화물-개시 경화계를 위한 아민 촉진제 배합물 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU469775B2 (en) * | 1971-10-18 | 1976-02-26 | Imperial Chemical Industries Ltd. | Photopolymerisable composition |
| GB1408265A (en) * | 1971-10-18 | 1975-10-01 | Ici Ltd | Photopolymerisable composition |
| US3715293A (en) * | 1971-12-17 | 1973-02-06 | Union Carbide Corp | Acetophenone-type photosensitizers for radiation curable coatings |
| US3933682A (en) * | 1973-01-31 | 1976-01-20 | Sun Chemical Corporation | Photopolymerization co-initiator systems |
| GB1467645A (en) * | 1973-01-31 | 1977-03-16 | Sun Chemical Corp | Photoinitiator systems |
| US3966573A (en) * | 1974-10-31 | 1976-06-29 | Sun Chemical Corporation | Photopolymerization co-initiator systems |
| US4131529A (en) * | 1976-06-05 | 1978-12-26 | Basf Aktiengesellschaft | Photoinitiators for photopolymerizable coating compositions |
-
1984
- 1984-12-06 NL NL8403706A patent/NL8403706A/nl not_active Application Discontinuation
-
1985
- 1985-04-09 NL NL8501022A patent/NL8501022A/nl not_active Application Discontinuation
- 1985-12-04 EP EP85202013A patent/EP0185423A1/en not_active Ceased
- 1985-12-05 PT PT81619A patent/PT81619B/pt not_active IP Right Cessation
- 1985-12-05 ES ES549632A patent/ES8704187A1/es not_active Expired
-
1986
- 1986-04-08 DE DE8686200593T patent/DE3686344T2/de not_active Revoked
- 1986-04-08 ES ES553774A patent/ES8802576A1/es not_active Expired
- 1986-04-08 EP EP86200593A patent/EP0197616B1/en not_active Expired - Lifetime
- 1986-04-09 PT PT82354A patent/PT82354B/pt unknown
- 1986-05-26 AU AU57919/86A patent/AU581989B2/en not_active Ceased
- 1986-05-28 IN IN417/MAS/86A patent/IN167407B/en unknown
- 1986-06-03 CH CH2234/86A patent/CH667461A5/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| NL8501022A (nl) | 1986-11-03 |
| ES8802576A1 (es) | 1988-08-01 |
| CH667461A5 (de) | 1988-10-14 |
| PT81619A (en) | 1986-06-11 |
| NL8403706A (nl) | 1986-07-01 |
| ES553774A0 (es) | 1988-08-01 |
| EP0197616B1 (en) | 1992-08-12 |
| PT81619B (pt) | 1987-10-20 |
| DE3686344T2 (de) | 1993-03-25 |
| EP0185423A1 (en) | 1986-06-25 |
| PT82354B (en) | 1987-09-08 |
| ES549632A0 (es) | 1987-03-16 |
| AU5791986A (en) | 1987-12-03 |
| EP0197616A1 (en) | 1986-10-15 |
| AU581989B2 (en) | 1989-03-09 |
| PT82354A (en) | 1986-05-01 |
| DE3686344D1 (de) | 1992-09-17 |
| ES8704187A1 (es) | 1987-03-16 |