DE3686344D1 - Photopolymerisierbare zusammensetzung und photoinitiatorsystem. - Google Patents

Photopolymerisierbare zusammensetzung und photoinitiatorsystem.

Info

Publication number
DE3686344D1
DE3686344D1 DE8686200593T DE3686344T DE3686344D1 DE 3686344 D1 DE3686344 D1 DE 3686344D1 DE 8686200593 T DE8686200593 T DE 8686200593T DE 3686344 T DE3686344 T DE 3686344T DE 3686344 D1 DE3686344 D1 DE 3686344D1
Authority
DE
Germany
Prior art keywords
photopolymerizable composition
photoinitiator system
photoinitiator
photopolymerizable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8686200593T
Other languages
English (en)
Other versions
DE3686344T2 (de
Inventor
Koning Adrianus Johannes De
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Covestro Resins BV
Original Assignee
DSM Resins BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DSM Resins BV filed Critical DSM Resins BV
Application granted granted Critical
Publication of DE3686344D1 publication Critical patent/DE3686344D1/de
Publication of DE3686344T2 publication Critical patent/DE3686344T2/de
Anticipated expiration legal-status Critical
Revoked legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
DE8686200593T 1984-12-06 1986-04-08 Photopolymerisierbare zusammensetzung und photoinitiatorsystem. Revoked DE3686344T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8403706A NL8403706A (nl) 1984-12-06 1984-12-06 Fotopolymeriseerbare samenstelling en een fotoinitiatorsysteem.
NL8501022A NL8501022A (nl) 1984-12-06 1985-04-09 Fotopolymeriseerbare samenstelling en een fotoinitiatorsysteem.

Publications (2)

Publication Number Publication Date
DE3686344D1 true DE3686344D1 (de) 1992-09-17
DE3686344T2 DE3686344T2 (de) 1993-03-25

Family

ID=36915560

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686200593T Revoked DE3686344T2 (de) 1984-12-06 1986-04-08 Photopolymerisierbare zusammensetzung und photoinitiatorsystem.

Country Status (8)

Country Link
EP (2) EP0185423A1 (de)
AU (1) AU581989B2 (de)
CH (1) CH667461A5 (de)
DE (1) DE3686344T2 (de)
ES (2) ES8704187A1 (de)
IN (1) IN167407B (de)
NL (2) NL8403706A (de)
PT (2) PT81619B (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6261908A (ja) * 1985-09-11 1987-03-18 G C Dental Ind Corp 歯科修復用光重合性組成物
JPH062767B2 (ja) * 1989-02-10 1994-01-12 日本ペイント株式会社 光硬化性組成物
GB2237023B (en) * 1989-10-06 1993-09-29 Toa Gosei Chem Ind A catalytic composition for photopolymerization and a photopolymerizable composition containing the same
US5217760A (en) * 1990-07-20 1993-06-08 Loctite Corporation Free radically curable formulations employing dithiolate catalysts
CA2479942A1 (en) * 2002-04-26 2003-11-06 Albemarle Corporation A new class of amine coinitiators in photoinitiated polymerizations
US20060293404A1 (en) * 2003-04-24 2006-12-28 Santobianco John G New class of amine coinitiators in photoinitiated polymerizations
EP1645583A1 (de) * 2004-10-06 2006-04-12 Cytec Surface Specialties, S.A. Strahlenhärtbare Pulverlackzusammensetzungen
CN101415762A (zh) * 2006-04-12 2009-04-22 雅宝公司 用于过氧化物引发的固化体系的胺促进剂混合物

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1408265A (en) * 1971-10-18 1975-10-01 Ici Ltd Photopolymerisable composition
AU469775B2 (en) * 1971-10-18 1976-02-26 Imperial Chemical Industries Ltd. Photopolymerisable composition
US3715293A (en) * 1971-12-17 1973-02-06 Union Carbide Corp Acetophenone-type photosensitizers for radiation curable coatings
GB1467645A (en) * 1973-01-31 1977-03-16 Sun Chemical Corp Photoinitiator systems
US3933682A (en) * 1973-01-31 1976-01-20 Sun Chemical Corporation Photopolymerization co-initiator systems
US3966573A (en) * 1974-10-31 1976-06-29 Sun Chemical Corporation Photopolymerization co-initiator systems
US4131529A (en) * 1976-06-05 1978-12-26 Basf Aktiengesellschaft Photoinitiators for photopolymerizable coating compositions

Also Published As

Publication number Publication date
ES553774A0 (es) 1988-08-01
ES8802576A1 (es) 1988-08-01
PT82354A (en) 1986-05-01
DE3686344T2 (de) 1993-03-25
EP0197616A1 (de) 1986-10-15
PT81619B (pt) 1987-10-20
ES549632A0 (es) 1987-03-16
NL8403706A (nl) 1986-07-01
EP0197616B1 (de) 1992-08-12
AU581989B2 (en) 1989-03-09
EP0185423A1 (de) 1986-06-25
ES8704187A1 (es) 1987-03-16
IN167407B (de) 1990-10-20
CH667461A5 (de) 1988-10-14
PT81619A (en) 1986-06-11
NL8501022A (nl) 1986-11-03
AU5791986A (en) 1987-12-03
PT82354B (en) 1987-09-08

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8331 Complete revocation