DE69219752D1 - Photoinitiatorsystem und eine dieses enthaltende photopolymerisierbare Zusammensetzung - Google Patents

Photoinitiatorsystem und eine dieses enthaltende photopolymerisierbare Zusammensetzung

Info

Publication number
DE69219752D1
DE69219752D1 DE69219752T DE69219752T DE69219752D1 DE 69219752 D1 DE69219752 D1 DE 69219752D1 DE 69219752 T DE69219752 T DE 69219752T DE 69219752 T DE69219752 T DE 69219752T DE 69219752 D1 DE69219752 D1 DE 69219752D1
Authority
DE
Germany
Prior art keywords
same
composition containing
photopolymerizable composition
photoinitiator system
photoinitiator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69219752T
Other languages
English (en)
Other versions
DE69219752T2 (de
Inventor
Futami Kaneko
Makoto Kaji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=40303614&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69219752(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Application granted granted Critical
Publication of DE69219752D1 publication Critical patent/DE69219752D1/de
Publication of DE69219752T2 publication Critical patent/DE69219752T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
DE69219752T 1990-11-22 1992-01-16 Photoinitiatorsystem und eine dieses enthaltende photopolymerisierbare Zusammensetzung Expired - Fee Related DE69219752T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2319484A JP2551232B2 (ja) 1990-11-22 1990-11-22 新規な光開始剤系及びこれを用いた光重合性組成物
EP92300385A EP0551697B1 (de) 1990-11-22 1992-01-16 Photoinitiatorsystem und eine dieses enthaltende photopolymerisierbare Zusammensetzung

Publications (2)

Publication Number Publication Date
DE69219752D1 true DE69219752D1 (de) 1997-06-19
DE69219752T2 DE69219752T2 (de) 1997-08-28

Family

ID=40303614

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69219752T Expired - Fee Related DE69219752T2 (de) 1990-11-22 1992-01-16 Photoinitiatorsystem und eine dieses enthaltende photopolymerisierbare Zusammensetzung

Country Status (3)

Country Link
EP (1) EP0551697B1 (de)
JP (1) JP2551232B2 (de)
DE (1) DE69219752T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5858617A (en) * 1996-03-12 1999-01-12 Konica Corporation Photopolymerizable composition and presensitized planographic printing plate employing the same
US6335144B1 (en) * 1999-04-27 2002-01-01 Fuji Photo Film Co., Ltd. Photopolymerizable composition for short wavelength semiconductor laser exposure
JP5374403B2 (ja) 2009-02-13 2013-12-25 三菱製紙株式会社 感光性平版印刷版材料
DE112011101165T5 (de) 2010-03-29 2013-03-28 Mitsubishi Paper Mills Limited Fotoempfindliche Zusammensetzung und fotoempfindliches lithographisches Druckplattenmaterial

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4713401A (en) * 1984-12-20 1987-12-15 Martin Riediker Titanocenes and a radiation-polymerizable composition containing these titanocenes
GB8515475D0 (en) * 1985-06-19 1985-07-24 Ciba Geigy Ag Forming images
EP0269573B1 (de) * 1986-11-26 1991-03-27 Ciba-Geigy Ag Flüssige Photoinitiatorgemische
DE3864530D1 (de) * 1987-02-02 1991-10-10 Ciba Geigy Ag Photoinitiatorengemische enthaltend ein titanocen und ein 3-ketocoumarin.
JP2536594B2 (ja) * 1987-06-08 1996-09-18 日立化成工業株式会社 光重合開始剤及びこれを用いた光重合性組成物
US5026625A (en) * 1987-12-01 1991-06-25 Ciba-Geigy Corporation Titanocenes, the use thereof, and n-substituted fluoroanilines
DE3832032A1 (de) * 1988-09-21 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JPH02154261A (ja) * 1988-12-06 1990-06-13 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性エレメント
JPH02154262A (ja) * 1988-12-06 1990-06-13 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性エレメント
JPH02157845A (ja) * 1988-12-12 1990-06-18 Hitachi Chem Co Ltd 感光性樹脂組成物およびこれを用いた感光性エレメント
EP0401166B1 (de) * 1989-06-01 1995-02-22 Ciba-Geigy Ag Neue, stickstoffhaltige Titanocene und deren Verwendung

Also Published As

Publication number Publication date
JPH04194857A (ja) 1992-07-14
DE69219752T2 (de) 1997-08-28
EP0551697A1 (de) 1993-07-21
JP2551232B2 (ja) 1996-11-06
EP0551697B1 (de) 1997-05-14

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8365 Fully valid after opposition proceedings
8339 Ceased/non-payment of the annual fee