DE69219752T2 - Photoinitiatorsystem und eine dieses enthaltende photopolymerisierbare Zusammensetzung - Google Patents
Photoinitiatorsystem und eine dieses enthaltende photopolymerisierbare ZusammensetzungInfo
- Publication number
- DE69219752T2 DE69219752T2 DE69219752T DE69219752T DE69219752T2 DE 69219752 T2 DE69219752 T2 DE 69219752T2 DE 69219752 T DE69219752 T DE 69219752T DE 69219752 T DE69219752 T DE 69219752T DE 69219752 T2 DE69219752 T2 DE 69219752T2
- Authority
- DE
- Germany
- Prior art keywords
- same
- composition containing
- photopolymerizable composition
- photoinitiator system
- photoinitiator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2319484A JP2551232B2 (ja) | 1990-11-22 | 1990-11-22 | 新規な光開始剤系及びこれを用いた光重合性組成物 |
EP92300385A EP0551697B1 (de) | 1990-11-22 | 1992-01-16 | Photoinitiatorsystem und eine dieses enthaltende photopolymerisierbare Zusammensetzung |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69219752D1 DE69219752D1 (de) | 1997-06-19 |
DE69219752T2 true DE69219752T2 (de) | 1997-08-28 |
Family
ID=40303614
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69219752T Expired - Fee Related DE69219752T2 (de) | 1990-11-22 | 1992-01-16 | Photoinitiatorsystem und eine dieses enthaltende photopolymerisierbare Zusammensetzung |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0551697B1 (de) |
JP (1) | JP2551232B2 (de) |
DE (1) | DE69219752T2 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5858617A (en) * | 1996-03-12 | 1999-01-12 | Konica Corporation | Photopolymerizable composition and presensitized planographic printing plate employing the same |
US6335144B1 (en) * | 1999-04-27 | 2002-01-01 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition for short wavelength semiconductor laser exposure |
JP5374403B2 (ja) | 2009-02-13 | 2013-12-25 | 三菱製紙株式会社 | 感光性平版印刷版材料 |
DE112011101165T5 (de) | 2010-03-29 | 2013-03-28 | Mitsubishi Paper Mills Limited | Fotoempfindliche Zusammensetzung und fotoempfindliches lithographisches Druckplattenmaterial |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4713401A (en) * | 1984-12-20 | 1987-12-15 | Martin Riediker | Titanocenes and a radiation-polymerizable composition containing these titanocenes |
GB8515475D0 (en) * | 1985-06-19 | 1985-07-24 | Ciba Geigy Ag | Forming images |
DE3768919D1 (en) * | 1986-11-26 | 1991-05-02 | Ciba Geigy Ag | Fluessige photoinitiatorgemische. |
DE3864530D1 (de) * | 1987-02-02 | 1991-10-10 | Ciba Geigy Ag | Photoinitiatorengemische enthaltend ein titanocen und ein 3-ketocoumarin. |
JP2536594B2 (ja) * | 1987-06-08 | 1996-09-18 | 日立化成工業株式会社 | 光重合開始剤及びこれを用いた光重合性組成物 |
US5026625A (en) * | 1987-12-01 | 1991-06-25 | Ciba-Geigy Corporation | Titanocenes, the use thereof, and n-substituted fluoroanilines |
DE3832032A1 (de) * | 1988-09-21 | 1990-03-22 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
JPH02154262A (ja) * | 1988-12-06 | 1990-06-13 | Hitachi Chem Co Ltd | 感光性樹脂組成物及びこれを用いた感光性エレメント |
JPH02154261A (ja) * | 1988-12-06 | 1990-06-13 | Hitachi Chem Co Ltd | 感光性樹脂組成物及びこれを用いた感光性エレメント |
JPH02157845A (ja) * | 1988-12-12 | 1990-06-18 | Hitachi Chem Co Ltd | 感光性樹脂組成物およびこれを用いた感光性エレメント |
DE59008501D1 (de) * | 1989-06-01 | 1995-03-30 | Ciba Geigy Ag | Neue, stickstoffhaltige Titanocene und deren Verwendung. |
-
1990
- 1990-11-22 JP JP2319484A patent/JP2551232B2/ja not_active Expired - Lifetime
-
1992
- 1992-01-16 EP EP92300385A patent/EP0551697B1/de not_active Expired - Lifetime
- 1992-01-16 DE DE69219752T patent/DE69219752T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0551697A1 (de) | 1993-07-21 |
EP0551697B1 (de) | 1997-05-14 |
JPH04194857A (ja) | 1992-07-14 |
DE69219752D1 (de) | 1997-06-19 |
JP2551232B2 (ja) | 1996-11-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8363 | Opposition against the patent | ||
8365 | Fully valid after opposition proceedings | ||
8339 | Ceased/non-payment of the annual fee |