NL8003874A - Veldeffektcapaciteit. - Google Patents

Veldeffektcapaciteit. Download PDF

Info

Publication number
NL8003874A
NL8003874A NL8003874A NL8003874A NL8003874A NL 8003874 A NL8003874 A NL 8003874A NL 8003874 A NL8003874 A NL 8003874A NL 8003874 A NL8003874 A NL 8003874A NL 8003874 A NL8003874 A NL 8003874A
Authority
NL
Netherlands
Prior art keywords
field effect
region
electrode
insulated
source
Prior art date
Application number
NL8003874A
Other languages
English (en)
Dutch (nl)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Priority to NL8003874A priority Critical patent/NL8003874A/nl
Priority to US06/272,459 priority patent/US4453090A/en
Priority to DE19813124237 priority patent/DE3124237A1/de
Priority to CA000380899A priority patent/CA1160760A/en
Priority to IT22671/81A priority patent/IT1138000B/it
Priority to FR8112940A priority patent/FR2486310A1/fr
Priority to JP56101408A priority patent/JPS5745268A/ja
Priority to GB8120268A priority patent/GB2079535B/en
Publication of NL8003874A publication Critical patent/NL8003874A/nl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/0805—Capacitors only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
    • H01L27/092—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/92—Capacitors having potential barriers
    • H01L29/94—Metal-insulator-semiconductors, e.g. MOS

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
NL8003874A 1980-07-04 1980-07-04 Veldeffektcapaciteit. NL8003874A (nl)

Priority Applications (8)

Application Number Priority Date Filing Date Title
NL8003874A NL8003874A (nl) 1980-07-04 1980-07-04 Veldeffektcapaciteit.
US06/272,459 US4453090A (en) 1980-07-04 1981-06-11 MOS Field-effect capacitor
DE19813124237 DE3124237A1 (de) 1980-07-04 1981-06-20 "feldeffektkapazitaet"
CA000380899A CA1160760A (en) 1980-07-04 1981-06-30 Field-effect capacitance
IT22671/81A IT1138000B (it) 1980-07-04 1981-07-01 Capacita' ad effetto di campo
FR8112940A FR2486310A1 (fr) 1980-07-04 1981-07-01 Capacite a effet de champ
JP56101408A JPS5745268A (en) 1980-07-04 1981-07-01 Field effect condenser
GB8120268A GB2079535B (en) 1980-07-04 1981-07-01 Field-effect capacitor

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8003874A NL8003874A (nl) 1980-07-04 1980-07-04 Veldeffektcapaciteit.
NL8003874 1980-07-04

Publications (1)

Publication Number Publication Date
NL8003874A true NL8003874A (nl) 1982-02-01

Family

ID=19835566

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8003874A NL8003874A (nl) 1980-07-04 1980-07-04 Veldeffektcapaciteit.

Country Status (8)

Country Link
US (1) US4453090A (de)
JP (1) JPS5745268A (de)
CA (1) CA1160760A (de)
DE (1) DE3124237A1 (de)
FR (1) FR2486310A1 (de)
GB (1) GB2079535B (de)
IT (1) IT1138000B (de)
NL (1) NL8003874A (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6068662U (ja) * 1983-10-17 1985-05-15 三洋電機株式会社 集積化コンデンサ
US4591738A (en) * 1983-10-27 1986-05-27 International Business Machines Corporation Charge pumping circuit
US4758873A (en) * 1986-05-16 1988-07-19 National Semiconductor Corporation Balanced MOS capacitor with low stray capacitance and high ESD survival
US4786828A (en) * 1987-05-15 1988-11-22 Hoffman Charles R Bias scheme for achieving voltage independent capacitance
JP3039930B2 (ja) * 1988-06-24 2000-05-08 株式会社日立製作所 Ｍｉｓ容量の接続方法
FR2694450B1 (fr) * 1992-07-30 1994-10-21 Sgs Thomson Microelectronics Condensateur en technologie CMOS.
FR2713399B1 (fr) * 1993-12-01 1996-03-01 Matra Mhs Dispositif de réduction du niveau de bruit d'un circuit intégré à plusieurs niveaux de conducteurs.
US5748035A (en) * 1994-05-27 1998-05-05 Arithmos, Inc. Channel coupled feedback circuits
DE4447307A1 (de) * 1994-12-31 1996-07-04 Bosch Gmbh Robert Schaltungsanordnung zur Verminderung der Spannungsabhängigkeit einer MOS-Kapazität
US5724095A (en) * 1995-10-03 1998-03-03 Omnivision Technologies Inc. Charge amplifier for MOS imaging array and method of making same
US5714907A (en) * 1996-07-29 1998-02-03 Intel Corporation Apparatus for providing digitally-adjustable floating MOS capacitance
US5926064A (en) * 1998-01-23 1999-07-20 National Semiconductor Corporation Floating MOS capacitor
US6010939A (en) 1998-03-31 2000-01-04 Vlsi Technology, Inc. Methods for making shallow trench capacitive structures
US6020616A (en) * 1998-03-31 2000-02-01 Vlsi Technology, Inc. Automated design of on-chip capacitive structures for suppressing inductive noise
DE19961487B4 (de) * 1999-09-30 2005-08-04 Infineon Technologies Ag Schaltungsanordnung zur Bildung eines MOS-Kondensators mit geringer Spannungsabhängigkeit und geringem Flächenbedarf
WO2001024277A1 (de) 1999-09-30 2001-04-05 Infineon Technologies Ag Schaltungsanordnung zur bildung eines mos-kondensators mit geringer spannungsabhängigkeit und geringem flächenbedarf
EP1553636B1 (de) * 2003-03-03 2013-05-01 Fujitsu Semiconductor Limited Variables mos-kapazitätsbauelement
JP2006005089A (ja) * 2004-06-16 2006-01-05 Fujitsu Ltd 半導体装置
US7728362B2 (en) * 2006-01-20 2010-06-01 International Business Machines Corporation Creating integrated circuit capacitance from gate array structures
TWI330946B (en) * 2007-03-12 2010-09-21 Via Tech Inc Phase-locked loop and compound mos capacitor thereof
US10892260B2 (en) * 2019-03-06 2021-01-12 Himax Technologies Limited Capacitor

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3285074A (en) * 1964-09-08 1966-11-15 Cons Electrodynamics Corp Amplitude damped transducer
US3407339A (en) * 1966-05-02 1968-10-22 North American Rockwell Voltage protection device utilizing a field effect transistor
US3983414A (en) * 1975-02-10 1976-09-28 Fairchild Camera And Instrument Corporation Charge cancelling structure and method for integrated circuits
FR2326761A1 (fr) * 1975-09-30 1977-04-29 Siemens Ag Memoire d'informations pour la memorisation d'informations sous forme de porteurs de charge electriques et procede pour sa mise en oeuvre
JPS52102690A (en) * 1976-02-25 1977-08-29 Hitachi Ltd Semiconductor capacitance device
DE2826192C2 (de) * 1978-06-15 1984-10-18 Philips Patentverwaltung Gmbh, 2000 Hamburg Schaltungsanordnung mit einem Halbleiterbauelement mit einer MOS-Kapazität
US4198580A (en) * 1978-05-30 1980-04-15 National Semiconductor Corporation MOSFET switching device with charge cancellation
US4384300A (en) * 1978-06-21 1983-05-17 Tokyo Shibaura Denki Kabushiki Kaisha Negative resistance device
JPS5939904B2 (ja) * 1978-09-28 1984-09-27 株式会社東芝 半導体装置
DE2842587A1 (de) * 1978-09-29 1980-04-17 Siemens Ag Isolierschichtkondensator

Also Published As

Publication number Publication date
CA1160760A (en) 1984-01-17
FR2486310B1 (de) 1984-12-28
JPS5745268A (en) 1982-03-15
JPS6349908B2 (de) 1988-10-06
DE3124237A1 (de) 1982-06-16
GB2079535A (en) 1982-01-20
FR2486310A1 (fr) 1982-01-08
IT8122671A0 (it) 1981-07-01
US4453090A (en) 1984-06-05
IT1138000B (it) 1986-09-10
GB2079535B (en) 1984-03-28

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A1B A search report has been drawn up
BV The patent application has lapsed