NL7903411A - Rasterelektronenmicroscoop. - Google Patents

Rasterelektronenmicroscoop.

Info

Publication number
NL7903411A
NL7903411A NL7903411A NL7903411A NL7903411A NL 7903411 A NL7903411 A NL 7903411A NL 7903411 A NL7903411 A NL 7903411A NL 7903411 A NL7903411 A NL 7903411A NL 7903411 A NL7903411 A NL 7903411A
Authority
NL
Netherlands
Prior art keywords
electron microscope
grid electron
grid
microscope
electron
Prior art date
Application number
NL7903411A
Other languages
English (en)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of NL7903411A publication Critical patent/NL7903411A/nl

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/18Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
NL7903411A 1978-05-02 1979-05-01 Rasterelektronenmicroscoop. NL7903411A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19782819165 DE2819165A1 (de) 1978-05-02 1978-05-02 Rasterelektronenmikroskop

Publications (1)

Publication Number Publication Date
NL7903411A true NL7903411A (nl) 1979-11-06

Family

ID=6038477

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7903411A NL7903411A (nl) 1978-05-02 1979-05-01 Rasterelektronenmicroscoop.

Country Status (5)

Country Link
US (1) US4241259A (nl)
JP (1) JPS54144863A (nl)
DE (1) DE2819165A1 (nl)
GB (1) GB2020895B (nl)
NL (1) NL7903411A (nl)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0177717B1 (de) * 1984-09-04 1989-05-17 Siemens Aktiengesellschaft Verfahren zur automatischen Positionierung einer Korpuskularsonde
US4680468A (en) * 1985-08-05 1987-07-14 Canadian Patents And Development Limited-Societe Canadienne Des Brevets Et D'exploitation Limitee Particle detector
JPS6235641A (ja) * 1985-08-09 1987-02-16 Fujitsu Ltd 電子ビーム照射方法
JPS62148067U (nl) * 1986-03-11 1987-09-18
NL9000056A (nl) * 1990-01-10 1991-08-01 Philips Nv Afsluitinrichting voor deeltjesbundel apparaat.
US5170286A (en) * 1991-02-19 1992-12-08 The United States Of America As Represented By The Secretary Of The Department Of Health And Human Services Rapid exchange imaging chamber for stop-flow microscopy
DE4113111A1 (de) * 1991-04-22 1992-10-29 Siemens Ag Vakuum-signaldurchfuehrung
JPH0591357U (ja) * 1992-05-15 1993-12-14 道夫 竹迫 フィッシングチェア
US6897443B2 (en) * 2003-06-02 2005-05-24 Harald Gross Portable scanning electron microscope
EP1816668A2 (en) * 2006-02-01 2007-08-08 FEI Company Particle-optical apparatus with a predetermined final vacuum pressure
JP2007294365A (ja) * 2006-04-27 2007-11-08 Jeol Ltd 試料検査方法、試料保持体、及び試料検査装置並びに試料検査システム
CN101461026B (zh) * 2006-06-07 2012-01-18 Fei公司 与包含真空室的装置一起使用的滑动轴承
US8598524B2 (en) * 2006-06-07 2013-12-03 Fei Company Slider bearing for use with an apparatus comprising a vacuum chamber
JP2007335237A (ja) * 2006-06-15 2007-12-27 Apco:Kk 超小型sem
JP5189256B2 (ja) * 2006-07-06 2013-04-24 株式会社ソディック 電子ビーム照射表面改質装置
WO2008098084A1 (en) * 2007-02-06 2008-08-14 Fei Company High pressure charged particle beam system
US9679741B2 (en) 2010-11-09 2017-06-13 Fei Company Environmental cell for charged particle beam system
DE102011077635A1 (de) * 2011-06-16 2012-12-20 Carl Zeiss Nts Gmbh Hochspannungsversorgungseinheit für ein Teilchenstrahlgerät
CN102543637B (zh) * 2012-01-10 2015-07-22 青岛大学 一种原位双倾电镜样品杆的制备方法
JP7042071B2 (ja) 2016-12-20 2022-03-25 エフ・イ-・アイ・カンパニー eビーム操作用の局部的に排気された容積を用いる集積回路解析システムおよび方法
JP1688745S (nl) * 2020-10-26 2021-06-28

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2356963A (en) * 1942-08-29 1944-08-29 Rca Corp Electron microscope viewing chamber
US2472316A (en) * 1947-11-28 1949-06-07 Rca Corp Electron optical instrument
US3346736A (en) * 1964-09-22 1967-10-10 Applied Res Lab Inc Electron probe apparatus having an objective lens with an aperture for restricting fluid flow
US3766427A (en) * 1970-06-15 1973-10-16 American Optical Corp Field emission electron gun
US3678333A (en) * 1970-06-15 1972-07-18 American Optical Corp Field emission electron gun utilizing means for protecting the field emission tip from high voltage discharges
JPS4917167A (nl) * 1972-05-22 1974-02-15
US3790155A (en) * 1972-07-17 1974-02-05 Radiant Energy Systems X-y table for vacuum systems

Also Published As

Publication number Publication date
GB2020895B (en) 1982-05-06
DE2819165C2 (nl) 1989-01-12
JPS6130377B2 (nl) 1986-07-12
GB2020895A (en) 1979-11-21
US4241259A (en) 1980-12-23
JPS54144863A (en) 1979-11-12
DE2819165A1 (de) 1979-11-15

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Legal Events

Date Code Title Description
BA A request for search or an international-type search has been filed
A85 Still pending on 85-01-01
BB A search report has been drawn up
BC A request for examination has been filed
BI The patent application has been withdrawn