JPS54144863A - Scan electron microscope - Google Patents

Scan electron microscope

Info

Publication number
JPS54144863A
JPS54144863A JP5399979A JP5399979A JPS54144863A JP S54144863 A JPS54144863 A JP S54144863A JP 5399979 A JP5399979 A JP 5399979A JP 5399979 A JP5399979 A JP 5399979A JP S54144863 A JPS54144863 A JP S54144863A
Authority
JP
Japan
Prior art keywords
electron microscope
scan electron
scan
microscope
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5399979A
Other languages
English (en)
Other versions
JPS6130377B2 (ja
Inventor
Fuoierubaumu Hansupeetaa
Otsutoo Yohan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of JPS54144863A publication Critical patent/JPS54144863A/ja
Publication of JPS6130377B2 publication Critical patent/JPS6130377B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
JP5399979A 1978-05-02 1979-05-01 Scan electron microscope Granted JPS54144863A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19782819165 DE2819165A1 (de) 1978-05-02 1978-05-02 Rasterelektronenmikroskop

Publications (2)

Publication Number Publication Date
JPS54144863A true JPS54144863A (en) 1979-11-12
JPS6130377B2 JPS6130377B2 (ja) 1986-07-12

Family

ID=6038477

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5399979A Granted JPS54144863A (en) 1978-05-02 1979-05-01 Scan electron microscope

Country Status (5)

Country Link
US (1) US4241259A (ja)
JP (1) JPS54144863A (ja)
DE (1) DE2819165A1 (ja)
GB (1) GB2020895B (ja)
NL (1) NL7903411A (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6235641A (ja) * 1985-08-09 1987-02-16 Fujitsu Ltd 電子ビーム照射方法
JP2007294365A (ja) * 2006-04-27 2007-11-08 Jeol Ltd 試料検査方法、試料保持体、及び試料検査装置並びに試料検査システム
JP2007335237A (ja) * 2006-06-15 2007-12-27 Apco:Kk 超小型ｓｅｍ
JP2008016306A (ja) * 2006-07-06 2008-01-24 Sodick Co Ltd 電子ビーム照射表面改質装置
JP2018136306A (ja) * 2016-12-20 2018-08-30 エフ・イ−・アイ・カンパニー ｅビーム操作用の局部的に排気された容積を用いる集積回路解析システムおよび方法

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0177717B1 (de) * 1984-09-04 1989-05-17 Siemens Aktiengesellschaft Verfahren zur automatischen Positionierung einer Korpuskularsonde
US4680468A (en) * 1985-08-05 1987-07-14 Canadian Patents And Development Limited-Societe Canadienne Des Brevets Et D'exploitation Limitee Particle detector
JPS62148067U (ja) * 1986-03-11 1987-09-18
NL9000056A (nl) * 1990-01-10 1991-08-01 Philips Nv Afsluitinrichting voor deeltjesbundel apparaat.
US5170286A (en) * 1991-02-19 1992-12-08 The United States Of America As Represented By The Secretary Of The Department Of Health And Human Services Rapid exchange imaging chamber for stop-flow microscopy
DE4113111A1 (de) * 1991-04-22 1992-10-29 Siemens Ag Vakuum-signaldurchfuehrung
JPH0591357U (ja) * 1992-05-15 1993-12-14 道夫 竹迫 フィッシングチェア
US6897443B2 (en) * 2003-06-02 2005-05-24 Harald Gross Portable scanning electron microscope
EP1816668A2 (en) * 2006-02-01 2007-08-08 FEI Company Particle-optical apparatus with a predetermined final vacuum pressure
CN101461026B (zh) * 2006-06-07 2012-01-18 Fei公司 与包含真空室的装置一起使用的滑动轴承
EP2033206B1 (en) * 2006-06-07 2011-06-08 FEI Company Slider bearing for use with an apparatus comprising a vacuum chamber
EP2109873B1 (en) * 2007-02-06 2017-04-05 FEI Company High pressure charged particle beam system
US9679741B2 (en) 2010-11-09 2017-06-13 Fei Company Environmental cell for charged particle beam system
DE102011077635A1 (de) * 2011-06-16 2012-12-20 Carl Zeiss Nts Gmbh Hochspannungsversorgungseinheit für ein Teilchenstrahlgerät
CN102543637B (zh) * 2012-01-10 2015-07-22 青岛大学 一种原位双倾电镜样品杆的制备方法
JP1688745S (ja) * 2020-10-26 2021-06-28

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2356963A (en) * 1942-08-29 1944-08-29 Rca Corp Electron microscope viewing chamber
US2472316A (en) * 1947-11-28 1949-06-07 Rca Corp Electron optical instrument
US3346736A (en) * 1964-09-22 1967-10-10 Applied Res Lab Inc Electron probe apparatus having an objective lens with an aperture for restricting fluid flow
US3766427A (en) * 1970-06-15 1973-10-16 American Optical Corp Field emission electron gun
US3678333A (en) * 1970-06-15 1972-07-18 American Optical Corp Field emission electron gun utilizing means for protecting the field emission tip from high voltage discharges
JPS4917167A (ja) * 1972-05-22 1974-02-15
US3790155A (en) * 1972-07-17 1974-02-05 Radiant Energy Systems X-y table for vacuum systems

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6235641A (ja) * 1985-08-09 1987-02-16 Fujitsu Ltd 電子ビーム照射方法
JPH0525178B2 (ja) * 1985-08-09 1993-04-12 Fujitsu Ltd
JP2007294365A (ja) * 2006-04-27 2007-11-08 Jeol Ltd 試料検査方法、試料保持体、及び試料検査装置並びに試料検査システム
JP2007335237A (ja) * 2006-06-15 2007-12-27 Apco:Kk 超小型ｓｅｍ
JP2008016306A (ja) * 2006-07-06 2008-01-24 Sodick Co Ltd 電子ビーム照射表面改質装置
JP2018136306A (ja) * 2016-12-20 2018-08-30 エフ・イ−・アイ・カンパニー ｅビーム操作用の局部的に排気された容積を用いる集積回路解析システムおよび方法

Also Published As

Publication number Publication date
NL7903411A (nl) 1979-11-06
DE2819165A1 (de) 1979-11-15
GB2020895A (en) 1979-11-21
GB2020895B (en) 1982-05-06
US4241259A (en) 1980-12-23
DE2819165C2 (ja) 1989-01-12
JPS6130377B2 (ja) 1986-07-12

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