NL191241C - Kleefvel voor halfgeleiders. - Google Patents

Kleefvel voor halfgeleiders.

Info

Publication number
NL191241C
NL191241C NL8603269A NL8603269A NL191241C NL 191241 C NL191241 C NL 191241C NL 8603269 A NL8603269 A NL 8603269A NL 8603269 A NL8603269 A NL 8603269A NL 191241 C NL191241 C NL 191241C
Authority
NL
Netherlands
Prior art keywords
semiconductors
adhesive sheet
adhesive
sheet
Prior art date
Application number
NL8603269A
Other languages
English (en)
Other versions
NL191241B (nl
NL8603269A (nl
Original Assignee
Lintec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP60295189A external-priority patent/JPS62153376A/ja
Priority claimed from JP60295190A external-priority patent/JPS62153377A/ja
Priority claimed from JP60295188A external-priority patent/JPS62153375A/ja
Priority claimed from JP61045786A external-priority patent/JPS62205180A/ja
Priority claimed from JP61045785A external-priority patent/JPS62205179A/ja
Priority claimed from JP61161680A external-priority patent/JPS6317980A/ja
Application filed by Lintec Corp filed Critical Lintec Corp
Publication of NL8603269A publication Critical patent/NL8603269A/nl
Priority to NL9302150A priority Critical patent/NL193617C/nl
Publication of NL191241B publication Critical patent/NL191241B/nl
Application granted granted Critical
Publication of NL191241C publication Critical patent/NL191241C/nl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
    • C09J4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09J159/00 - C09J187/00
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J175/00—Adhesives based on polyureas or polyurethanes; Adhesives based on derivatives of such polymers
    • C09J175/04—Polyurethanes
    • C09J175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
    • C09J175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/20—Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22—Plastics; Metallised plastics
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38—Pressure-sensitive adhesives [PSA]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/03—Polymer mixtures characterised by other features containing three or more polymers in a blend
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2666/00—Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
    • C08L2666/02—Organic macromolecular compounds, natural resins, waxes or and bituminous materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L75/00—Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
    • C08L75/04—Polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68318—Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
    • H01L2221/68322—Auxiliary support including means facilitating the selective separation of some of a plurality of devices from the auxiliary support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/901—Printed circuit
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y10T428/2809—Web or sheet containing structurally defined element or component and having an adhesive outermost layer including irradiated or wave energy treated component

Landscapes

  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Dicing (AREA)
NL8603269A 1985-12-27 1986-12-23 Kleefvel voor halfgeleiders. NL191241C (nl)

Priority Applications (1)

Application Number Priority Date Filing Date Title
NL9302150A NL193617C (nl) 1985-12-27 1993-12-09 Kleefvel voor halfgeleiders.

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
JP29519085 1985-12-27
JP29518885 1985-12-27
JP29518985 1985-12-27
JP60295189A JPS62153376A (ja) 1985-12-27 1985-12-27 ウェハダイシング用粘着シート
JP60295190A JPS62153377A (ja) 1985-12-27 1985-12-27 ウェハダイシング用粘着シート
JP60295188A JPS62153375A (ja) 1985-12-27 1985-12-27 ウエハダイシング用粘着シート
JP61045786A JPS62205180A (ja) 1986-03-03 1986-03-03 粘着シ−ト
JP4578586 1986-03-03
JP4578686 1986-03-03
JP61045785A JPS62205179A (ja) 1986-03-03 1986-03-03 ウエハ貼着用粘着シ−ト
JP61161680A JPS6317980A (ja) 1986-07-09 1986-07-09 ウエハ貼着用粘着シ−ト
JP16168086 1986-07-09

Publications (3)

Publication Number Publication Date
NL8603269A NL8603269A (nl) 1987-07-16
NL191241B NL191241B (nl) 1994-11-01
NL191241C true NL191241C (nl) 1995-04-03

Family

ID=27550204

Family Applications (4)

Application Number Title Priority Date Filing Date
NL8603269A NL191241C (nl) 1985-12-27 1986-12-23 Kleefvel voor halfgeleiders.
NL9302148A NL9302148A (nl) 1985-12-27 1993-12-09 Kleefvel voor halfgeleiders.
NL9302149A NL9302149A (nl) 1985-12-27 1993-12-09 Kleefvel voor halfgeleiders.
NL9302147A NL9302147A (nl) 1985-12-27 1993-12-09 Kleefvel voor halfgeleiders.

Family Applications After (3)

Application Number Title Priority Date Filing Date
NL9302148A NL9302148A (nl) 1985-12-27 1993-12-09 Kleefvel voor halfgeleiders.
NL9302149A NL9302149A (nl) 1985-12-27 1993-12-09 Kleefvel voor halfgeleiders.
NL9302147A NL9302147A (nl) 1985-12-27 1993-12-09 Kleefvel voor halfgeleiders.

Country Status (10)

Country Link
US (2) US4756968A (nl)
KR (1) KR910007086B1 (nl)
DE (1) DE3639266A1 (nl)
FR (1) FR2592390B1 (nl)
GB (1) GB2184741B (nl)
HK (4) HK105792A (nl)
MY (2) MY100214A (nl)
NL (4) NL191241C (nl)
PH (1) PH23580A (nl)
SG (1) SG114492G (nl)

Families Citing this family (68)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3581514D1 (de) * 1984-05-29 1991-02-28 Mitsui Toatsu Chemicals Film zur behandlung von halbleiterwaffeln.
US5187007A (en) * 1985-12-27 1993-02-16 Lintec Corporation Adhesive sheets
DE3639266A1 (de) * 1985-12-27 1987-07-02 Fsk K K Haftfolie
EP0298448B1 (en) * 1987-07-08 1994-06-29 The Furukawa Electric Co., Ltd. Radiation-curable adhesive tape
US5149586A (en) * 1987-07-08 1992-09-22 Furukawa Electric Co., Ltd. Radiation-curable adhesive tape
US5281473A (en) * 1987-07-08 1994-01-25 Furakawa Electric Co., Ltd. Radiation-curable adhesive tape
US5326605A (en) * 1987-10-22 1994-07-05 Nichiban Company, Limited Reactive pressure sensitive adhesive composition, sealer tape, sheet or molding by use thereof
JPH0715893B2 (ja) * 1988-07-14 1995-02-22 株式会社東芝 ドーパントフイルムおよび半導体基板の不純物拡散方法
US5024867A (en) * 1987-10-28 1991-06-18 Kabushiki Kaisha Toshiba Dopant film and methods of diffusing impurity into and manufacturing a semiconductor wafer
JPH0715087B2 (ja) * 1988-07-21 1995-02-22 リンテック株式会社 粘接着テープおよびその使用方法
KR920702018A (ko) * 1989-08-01 1992-08-12 미시마 마사요시 웨이퍼 가공용 필름
US4985293A (en) * 1989-08-14 1991-01-15 Eastman Kodak Company Polymer blend for molded circuit boards and other selectively conductive molded devices
JP2683435B2 (ja) * 1989-12-14 1997-11-26 キヤノン株式会社 インクジェットノズル製造用接着剤
KR910015403A (ko) * 1990-02-14 1991-09-30 사와무라 하루오 웨이퍼 가공용 필름
US5051870A (en) * 1990-06-11 1991-09-24 Companion John A Electronic socket attachment method and identification system
DE4025405A1 (de) * 1990-08-10 1992-02-13 Schreiner Etiketten Traegerbahn
JP2922036B2 (ja) * 1991-10-31 1999-07-19 日東電工株式会社 耐熱性にすぐれた感圧性接着剤およびその接着シート類の製造方法
JPH05179211A (ja) * 1991-12-30 1993-07-20 Nitto Denko Corp ダイシング・ダイボンドフイルム
JP3382638B2 (ja) * 1992-07-17 2003-03-04 コニシ株式会社 粘着テープ
DE4230784A1 (de) * 1992-09-15 1994-03-17 Beiersdorf Ag Durch Strahlung partiell entklebendes Selbstklebeband (Dicing Tape)
JPH082106A (ja) * 1994-06-24 1996-01-09 Nippon Kayaku Co Ltd マーキング用組成物及びレーザーマーキング方法
JP3410202B2 (ja) * 1993-04-28 2003-05-26 日本テキサス・インスツルメンツ株式会社 ウェハ貼着用粘着シートおよびこれを用いた半導体装置の製造方法
JP2991593B2 (ja) * 1993-08-19 1999-12-20 株式会社東京精密 ダイシング装置の半導体ウェハ形状認識装置
JPH08267668A (ja) * 1995-03-29 1996-10-15 Nitta Ind Corp 研磨用ウエハ保持部材及びそのウエハ保持部材の研磨機定盤への脱着方法
US5670260A (en) * 1995-04-21 1997-09-23 Adhesives Research, Inc. Radiation-cured adhesive film having differential surface adhesion
DE19520238C2 (de) * 1995-06-02 1998-01-15 Beiersdorf Ag Selbstklebeband
JPH0917752A (ja) * 1995-06-28 1997-01-17 Sony Corp 偏平な被切削物の切断方法及びその装置
US5667889A (en) * 1995-11-21 1997-09-16 Imperial Chemical Industries Plc Polymeric film
US5955188A (en) * 1996-03-04 1999-09-21 Outlast Technologies, Inc. Skived foam article containing energy absorbing phase change material
US5677048A (en) * 1996-03-04 1997-10-14 Gateway Technologies, Inc. Coated skived foam and fabric article containing energy absorbing phase change material
GB2320615B (en) * 1996-12-19 2001-06-20 Lintec Corp Process for producing a chip and pressure sensitive adhesive sheet for said process
US6312800B1 (en) 1997-02-10 2001-11-06 Lintec Corporation Pressure sensitive adhesive sheet for producing a chip
JP4072927B2 (ja) * 1997-08-28 2008-04-09 リンテック株式会社 エネルギー線硬化型親水性粘着剤組成物およびその利用方法
US6235387B1 (en) 1998-03-30 2001-05-22 3M Innovative Properties Company Semiconductor wafer processing tapes
JP3739570B2 (ja) 1998-06-02 2006-01-25 リンテック株式会社 粘着シートおよびその利用方法
JP3410371B2 (ja) 1998-08-18 2003-05-26 リンテック株式会社 ウエハ裏面研削時の表面保護シートおよびその利用方法
JP3784202B2 (ja) * 1998-08-26 2006-06-07 リンテック株式会社 両面粘着シートおよびその使用方法
US7105226B2 (en) * 1998-08-26 2006-09-12 Lintec Corporation Pressure sensitive adhesive double coated sheet and method of use thereof
DE19850873A1 (de) * 1998-11-05 2000-05-11 Philips Corp Intellectual Pty Verfahren zum Bearbeiten eines Erzeugnisses der Halbleitertechnik
US6184064B1 (en) 2000-01-12 2001-02-06 Micron Technology, Inc. Semiconductor die back side surface and method of fabrication
US6472065B1 (en) * 2000-07-13 2002-10-29 3M Innovative Properties Company Clear adhesive sheet
US6759121B2 (en) 2000-07-13 2004-07-06 3M Innovative Properties Company Clear adhesive sheet
KR100412020B1 (ko) * 2001-03-12 2003-12-24 박광민 반도체 웨이퍼용 점착테이프
JP3544362B2 (ja) * 2001-03-21 2004-07-21 リンテック株式会社 半導体チップの製造方法
JP4115711B2 (ja) * 2002-02-14 2008-07-09 日東電工株式会社 フレキシブルプリント配線板固定用接着シート及びフレキシブルプリント配線板への電子部品の実装方法
KR20050037561A (ko) * 2002-07-24 2005-04-22 어드헤시브즈 리서치, 인코포레이티드 가변형성 감압 접착 테이프 및 디스플레이 스크린에서의그 용도
KR101016081B1 (ko) * 2002-07-26 2011-02-17 닛토덴코 가부시키가이샤 점착 시트와 그의 제조방법, 상기 점착 시트의 사용방법,및 상기 점착 시트에 사용되는 다층 시트와 그의 제조방법
US6969914B2 (en) * 2002-08-29 2005-11-29 Micron Technology, Inc. Electronic device package
US20040122408A1 (en) * 2002-12-24 2004-06-24 Potnis Prasad S. Dry-blend elastomer for elastic laminates
US6879050B2 (en) * 2003-02-11 2005-04-12 Micron Technology, Inc. Packaged microelectronic devices and methods for packaging microelectronic devices
US20050244631A1 (en) * 2004-04-28 2005-11-03 Mitsui Chemicals, Inc. Surface protecting film for semiconductor wafer and method of protecting semiconductor wafer using the same
US7368171B2 (en) * 2004-09-03 2008-05-06 H.B. Fuller Licensing & Financing, Inc. Laminating adhesive, laminate including the same, and method of making a laminate
DE102005055769A1 (de) * 2005-11-21 2007-05-24 Tesa Ag Verfahren zur temporären Fixierung eines polymeren Schichtmaterials auf rauen Oberflächen
JP5057697B2 (ja) * 2006-05-12 2012-10-24 日東電工株式会社 半導体ウエハ又は半導体基板加工用粘着シート
JP4620028B2 (ja) * 2006-10-19 2011-01-26 日東電工株式会社 基板加工用粘着シート
JP5101111B2 (ja) * 2007-01-05 2012-12-19 日東電工株式会社 半導体基板加工用粘着シート
KR101158962B1 (ko) * 2007-10-10 2012-06-21 우시오덴키 가부시키가이샤 엑시머 램프
JP2010053192A (ja) * 2008-08-27 2010-03-11 Nitto Denko Corp 粘着テープ又はシート
EP2368955A1 (de) 2010-03-26 2011-09-28 Sika Technology AG Formgedächtnis-Material auf Basis eines Strukturklebstoffs
GB201012595D0 (en) 2010-07-27 2010-09-08 Zephyros Inc Oriented structural adhesives
WO2013042698A1 (ja) * 2011-09-20 2013-03-28 日東電工株式会社 電子部品切断用加熱剥離型粘着シート及び電子部品切断方法
US9056438B2 (en) 2012-05-02 2015-06-16 3M Innovative Properties Company Curable composition, articles comprising the curable composition, and method of making the same
US10577523B2 (en) 2013-07-26 2020-03-03 Zephyros, Inc. Relating to thermosetting adhesive films
US10526511B2 (en) 2016-12-22 2020-01-07 Avery Dennison Corporation Convertible pressure sensitive adhesives comprising urethane (meth)acrylate oligomers
CN109825215A (zh) * 2017-11-23 2019-05-31 上海海优威新材料股份有限公司 用于晶圆研磨的多层复合膜及其制备方法
JP2021001311A (ja) * 2019-06-21 2021-01-07 日東電工株式会社 粘着シート、中間積層体、中間積層体の製造方法および製品積層体の製造方法
WO2020262048A1 (ja) * 2019-06-27 2020-12-30 日東電工株式会社 粘着シート、および粘着シート貼付品の製造方法
JP2023001915A (ja) 2021-06-21 2023-01-06 日東電工株式会社 半導体ウエハ加工用粘着シート

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE545403A (nl) * 1955-02-21
FR1572362A (nl) * 1968-04-12 1969-06-27
US4243500A (en) * 1978-12-04 1981-01-06 International Coatings, Co., Inc. Pressure sensitive adhesives
US4421822A (en) * 1979-08-20 1983-12-20 Minnesota Mining And Manufacturing Co. Ultraviolet polymerization of acrylate monomers using oxidizable tin compounds
EP0099856B1 (de) * 1982-06-24 1987-11-11 Ciba-Geigy Ag Photopolymerisierbares Beschichtungsmittel, photopolymerisierbares Material und seine Verwendung
JPS6057111A (ja) * 1983-09-05 1985-04-02 Sharp Corp 気化式石油燃焼器の気化装置
JPS6057340A (ja) * 1983-09-08 1985-04-03 Fuji Photo Film Co Ltd 焼出し性組成物
JPH0616524B2 (ja) * 1984-03-12 1994-03-02 日東電工株式会社 半導体ウエハ固定用接着薄板
JPS61148566A (ja) * 1984-12-23 1986-07-07 Kyodo Kumiai Yonago Computer Syst 医療事務計算用入力装置
JPS61158680A (ja) * 1984-12-28 1986-07-18 株式会社山武 中間接続コネクタ
EP0194706B1 (en) * 1985-02-14 1989-08-23 Bando Chemical Industries, Ltd. A pressure sensitive adhesive and a pressure sensitive adhesive film having thereon a layer of the same
JPS61194441A (ja) * 1985-02-19 1986-08-28 ウセベ　ソシエテ　アノニム 接着材樹脂組成物
DE3639266A1 (de) * 1985-12-27 1987-07-02 Fsk K K Haftfolie
JPS6428572A (en) * 1987-07-24 1989-01-31 Hitachi Ltd Burn-in board
JPH09179674A (ja) * 1995-12-25 1997-07-11 Kenwood Corp 設定データ変更装置

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HK105492A (en) 1993-01-08
GB2184741B (en) 1990-09-05
GB8630956D0 (en) 1987-02-04
FR2592390A1 (fr) 1987-07-03
SG114492G (en) 1992-12-24
US4756968A (en) 1988-07-12
HK105792A (en) 1993-01-08
NL9302147A (nl) 1994-04-05
KR910007086B1 (ko) 1991-09-16
GB2184741A (en) 1987-07-01
NL9302149A (nl) 1994-04-05
HK105592A (en) 1993-01-08
MY100214A (en) 1990-05-29
KR870006156A (ko) 1987-07-09
NL191241B (nl) 1994-11-01
DE3639266C2 (nl) 1990-02-08
MY104709A (en) 1994-05-31
US4965127A (en) 1990-10-23
PH23580A (en) 1989-09-11
NL9302148A (nl) 1994-04-05
FR2592390B1 (fr) 1993-03-12
HK105692A (en) 1993-01-08
NL8603269A (nl) 1987-07-16
DE3639266A1 (de) 1987-07-02

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