KR100412020B1 - 반도체 웨이퍼용 점착테이프 - Google Patents
반도체 웨이퍼용 점착테이프 Download PDFInfo
- Publication number
- KR100412020B1 KR100412020B1 KR10-2001-0012602A KR20010012602A KR100412020B1 KR 100412020 B1 KR100412020 B1 KR 100412020B1 KR 20010012602 A KR20010012602 A KR 20010012602A KR 100412020 B1 KR100412020 B1 KR 100412020B1
- Authority
- KR
- South Korea
- Prior art keywords
- weight
- adhesive tape
- wafer
- diisocyanate
- curing agent
- Prior art date
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Adhesive Tapes (AREA)
Abstract
Description
Claims (4)
- 고투명성 PO필름에 폴리우레탄계 공중합물을 도포하고, 폴리에스터 이형필름을 합판시키되, 상기 폴리우레탄계 공중합물은 지방족 우레탄 아크릴레이트(Urethane Acrylate)로 이루어지고,5~10중량%의 엔비닐피롤리돈 우레탄 아크릴레이트 모노머,5~10중량%의 이소시아네이트 에틸메타 아크릴레이트 모노머,5~10중량%의 하이드록시 터미네이티드 아크릴레이트 모노머,10~20중량%의 헥사네디올 이아크릴레이트 모노머,3~8중량%의 트리메티롤 프로판 트리아크릴레이트,광개시제로서 5~10중량%의 이소프로필 벤조이 에스테르,5~10중량%의 에틸아세테이트,0~5중량%의 경화제를 혼합하여 이루어지는 것을 특징으로 하는 반도체 웨이퍼용 점착 테이프.
- 제 1 항에 있어서,상기 경화제는 폴리아민(PA: Poly-amine), 또는 폴리아미도 레진(PAR: Polyamido Resin), 폴리설파이드 레진(Polysulfide Resin) 중 어느 하나로 이루어진 에폭시계 경화제로 하면서 0.5~3중량%의 혼합비율을 가지는 것을 특징으로 하는반도체 웨이퍼용 점착 테이프.
- 제 1 항에 있어서,상기 경화제는 트리베이직 소듐포스페이트(TSP:Tri-basic Sodiumphosphate)와 트리소듐 오르토포스페이트(Tri-sodium Orthophosphate)로 이루어진 인산염계 경화제로 하면서 0.1~2중량%의 혼합비율을 가지는 것을 특징으로 하는 반도체 웨이퍼용 점착 테이프.
- 제 1 항에 있어서,상기 경화제는 디메칠 아미노-에칠 메타클레이트, 4,4-디시클로헥실메탄 디이소시아네이트, 이소포론 디이소시아네이트, 2,4,6-트리이소프로필페닐 디이소시아네이트, 4,4-디페닐메탄 디이소시아네이트, 톨리딘 디이소시아네이트 및 나프탈렌 디이소시아네이트로 이루어진 이소시아네이트계 경화제로 하면서 1~3중량%의 혼합비율을 가지는 것을 특징으로 하는 반도체 웨이퍼용 점착 테이프.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2001-0012602A KR100412020B1 (ko) | 2001-03-12 | 2001-03-12 | 반도체 웨이퍼용 점착테이프 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2001-0012602A KR100412020B1 (ko) | 2001-03-12 | 2001-03-12 | 반도체 웨이퍼용 점착테이프 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20020072656A KR20020072656A (ko) | 2002-09-18 |
KR100412020B1 true KR100412020B1 (ko) | 2003-12-24 |
Family
ID=27697100
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2001-0012602A KR100412020B1 (ko) | 2001-03-12 | 2001-03-12 | 반도체 웨이퍼용 점착테이프 |
Country Status (1)
Country | Link |
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KR (1) | KR100412020B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101764167B1 (ko) | 2017-01-26 | 2017-08-02 | (주)엠티아이 | 레이저 스크라이빙 공정의 웨이퍼 보호용 코팅제 조성물 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20040004768A (ko) * | 2002-07-05 | 2004-01-16 | 삼성전기주식회사 | 마이크로 전기 기계 구조 칩의 다이싱 방법 |
KR100751182B1 (ko) * | 2006-07-25 | 2007-08-22 | 제일모직주식회사 | 박막 웨이퍼의 다이싱용 다이 본드 필름의 제조방법 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01123884A (ja) * | 1987-11-10 | 1989-05-16 | Toyo Ink Mfg Co Ltd | 粘着シート |
US4965127A (en) * | 1985-12-27 | 1990-10-23 | Fsk Kabushiki Kaisha | Adhesive sheets |
JPH0536826A (ja) * | 1991-07-31 | 1993-02-12 | Lintec Corp | ウエハ貼着用粘着シート |
JPH0745557A (ja) * | 1993-07-27 | 1995-02-14 | Lintec Corp | ウェハ貼着用粘着シート |
KR20000063979A (ko) * | 2000-08-14 | 2000-11-06 | 서영옥 | 자외선 경화형 점착제 조성물 및 반도체 웨이퍼 가공용점착시트 |
JP2001019911A (ja) * | 1999-07-09 | 2001-01-23 | Nippon Synthetic Chem Ind Co Ltd:The | 再剥離型粘着剤組成物 |
-
2001
- 2001-03-12 KR KR10-2001-0012602A patent/KR100412020B1/ko active IP Right Grant
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4965127A (en) * | 1985-12-27 | 1990-10-23 | Fsk Kabushiki Kaisha | Adhesive sheets |
JPH01123884A (ja) * | 1987-11-10 | 1989-05-16 | Toyo Ink Mfg Co Ltd | 粘着シート |
JPH0536826A (ja) * | 1991-07-31 | 1993-02-12 | Lintec Corp | ウエハ貼着用粘着シート |
JPH0745557A (ja) * | 1993-07-27 | 1995-02-14 | Lintec Corp | ウェハ貼着用粘着シート |
JP2001019911A (ja) * | 1999-07-09 | 2001-01-23 | Nippon Synthetic Chem Ind Co Ltd:The | 再剥離型粘着剤組成物 |
KR20000063979A (ko) * | 2000-08-14 | 2000-11-06 | 서영옥 | 자외선 경화형 점착제 조성물 및 반도체 웨이퍼 가공용점착시트 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101764167B1 (ko) | 2017-01-26 | 2017-08-02 | (주)엠티아이 | 레이저 스크라이빙 공정의 웨이퍼 보호용 코팅제 조성물 |
WO2018139725A1 (ko) * | 2017-01-26 | 2018-08-02 | (주)엠티아이 | 레이저 스크라이빙 공정의 웨이퍼 보호용 코팅제 조성물 |
Also Published As
Publication number | Publication date |
---|---|
KR20020072656A (ko) | 2002-09-18 |
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