NL1015690C2 - Sluis voor vacu³mkamer. - Google Patents

Sluis voor vacu³mkamer. Download PDF

Info

Publication number
NL1015690C2
NL1015690C2 NL1015690A NL1015690A NL1015690C2 NL 1015690 C2 NL1015690 C2 NL 1015690C2 NL 1015690 A NL1015690 A NL 1015690A NL 1015690 A NL1015690 A NL 1015690A NL 1015690 C2 NL1015690 C2 NL 1015690C2
Authority
NL
Netherlands
Prior art keywords
closing means
internal
passage
vacuum chamber
lock according
Prior art date
Application number
NL1015690A
Other languages
English (en)
Dutch (nl)
Inventor
Michael Adrianus Theodo Hompus
Marinus Fransiscus Johan Evers
Original Assignee
Otb Group Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to NL1015690A priority Critical patent/NL1015690C2/nl
Application filed by Otb Group Bv filed Critical Otb Group Bv
Priority to EP01952049A priority patent/EP1299571B1/de
Priority to JP2002509550A priority patent/JP2004502869A/ja
Priority to PCT/NL2001/000475 priority patent/WO2002004697A1/en
Priority to US10/332,381 priority patent/US7198678B2/en
Priority to AU2001272844A priority patent/AU2001272844A1/en
Priority to AT01952049T priority patent/ATE370262T1/de
Priority to DE60129975T priority patent/DE60129975T2/de
Priority to CNB018155154A priority patent/CN1291061C/zh
Priority to ES01952049T priority patent/ES2291331T3/es
Priority to DE60142012T priority patent/DE60142012D1/de
Priority to EP01202632A priority patent/EP1172456B1/de
Priority to US09/902,617 priority patent/US6615547B2/en
Priority to JP2001211704A priority patent/JP3757239B2/ja
Application granted granted Critical
Publication of NL1015690C2 publication Critical patent/NL1015690C2/nl
Priority to HK02105031.8A priority patent/HK1043161B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F7/00—Magnets
    • H01F7/02—Permanent magnets [PM]
    • H01F7/04—Means for releasing the attractive force

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Electron Tubes For Measurement (AREA)
  • Element Separation (AREA)
  • Details Of Valves (AREA)
  • Magnetically Actuated Valves (AREA)
  • Chemical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Drying Of Semiconductors (AREA)
NL1015690A 2000-07-12 2000-07-12 Sluis voor vacu³mkamer. NL1015690C2 (nl)

Priority Applications (15)

Application Number Priority Date Filing Date Title
NL1015690A NL1015690C2 (nl) 2000-07-12 2000-07-12 Sluis voor vacu³mkamer.
CNB018155154A CN1291061C (zh) 2000-07-12 2001-06-26 在一个基底上进行至少一种工艺作业的设备和组件
PCT/NL2001/000475 WO2002004697A1 (en) 2000-07-12 2001-06-26 Apparatus for performing at least one process on a substrate
US10/332,381 US7198678B2 (en) 2000-07-12 2001-06-26 Apparatus for performing at least one process on a substrate
AU2001272844A AU2001272844A1 (en) 2000-07-12 2001-06-26 Apparatus for performing at least one process on a substrate
AT01952049T ATE370262T1 (de) 2000-07-12 2001-06-26 Vorrichtung zur durchführung mindestens einer behandlung eines substrates
EP01952049A EP1299571B1 (de) 2000-07-12 2001-06-26 Vorrichtung zur durchführung mindestens einer behandlung eines substrates
JP2002509550A JP2004502869A (ja) 2000-07-12 2001-06-26 基材に少なくとも一つのプロセスを実施するための装置
ES01952049T ES2291331T3 (es) 2000-07-12 2001-06-26 Aparato para realizar al menos un proceso sobre un sustrato.
DE60129975T DE60129975T2 (de) 2000-07-12 2001-06-26 Vorrichtung zur durchführung mindestens einer behandlung eines substrates
DE60142012T DE60142012D1 (de) 2000-07-12 2001-07-09 Schleuse für Vakuumkammer
EP01202632A EP1172456B1 (de) 2000-07-12 2001-07-09 Schleuse für Vakuumkammer
US09/902,617 US6615547B2 (en) 2000-07-12 2001-07-12 Lock for vacuum chamber
JP2001211704A JP3757239B2 (ja) 2000-07-12 2001-07-12 真空室用ロックおよび真空室ならびに回路
HK02105031.8A HK1043161B (en) 2000-07-12 2002-07-05 Lock for vacuum chamber

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL1015690A NL1015690C2 (nl) 2000-07-12 2000-07-12 Sluis voor vacu³mkamer.
NL1015690 2000-07-12

Publications (1)

Publication Number Publication Date
NL1015690C2 true NL1015690C2 (nl) 2002-01-15

Family

ID=19771725

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1015690A NL1015690C2 (nl) 2000-07-12 2000-07-12 Sluis voor vacu³mkamer.

Country Status (11)

Country Link
US (2) US7198678B2 (de)
EP (2) EP1299571B1 (de)
JP (2) JP2004502869A (de)
CN (1) CN1291061C (de)
AT (1) ATE370262T1 (de)
AU (1) AU2001272844A1 (de)
DE (2) DE60129975T2 (de)
ES (1) ES2291331T3 (de)
HK (1) HK1043161B (de)
NL (1) NL1015690C2 (de)
WO (1) WO2002004697A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004027752A1 (de) 2004-06-08 2006-01-05 Leybold Optics Gmbh Schleusenvorrichtung
US7611322B2 (en) 2004-11-18 2009-11-03 Intevac, Inc. Processing thin wafers
EA008187B1 (ru) * 2005-06-07 2007-04-27 Владимир Яковлевич ШИРИПОВ Способ очистки теневых масок в производстве дисплеев (варианты) и устройство для его реализации
EP1862624B1 (de) * 2006-06-01 2017-02-15 Pilz Auslandsbeteiligungen GmbH Zuhalteeinrichtung für eine Zugangsschutzvorrichtung
JP6282917B2 (ja) * 2014-04-11 2018-02-21 株式会社Ihi 真空処理装置
DE102016107990A1 (de) * 2016-04-29 2017-11-02 Von Ardenne Gmbh Vakuumprozesskammer
CN117026189B (zh) * 2023-08-15 2026-03-03 北京维开科技有限公司 一种孪生工艺腔室的磁控溅射系统

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4676884A (en) * 1986-07-23 1987-06-30 The Boc Group, Inc. Wafer processing machine with evacuated wafer transporting and storage system
US5451131A (en) * 1992-06-19 1995-09-19 International Business Machines Corporation Dockable interface airlock between process enclosure and interprocess transfer container
JPH07292470A (ja) * 1994-04-25 1995-11-07 Toshiba Emi Ltd 真空装置でのディスクの保持方法及び保持装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57207313A (en) * 1981-06-16 1982-12-20 Toshiba Corp Method of demagnetizing induction electric equipment
US4842683A (en) * 1986-12-19 1989-06-27 Applied Materials, Inc. Magnetic field-enhanced plasma etch reactor
DE59001807D1 (de) * 1990-03-26 1993-07-22 Leybold Ag Vorrichtung zum ein- und ausschleusen eines werkstuecks in eine vakuumkammer.
JPH07292740A (ja) 1994-04-25 1995-11-07 Tokai Rika Co Ltd 弁駆動装置及び衛生器具の自動洗浄装置
JP2001524259A (ja) * 1995-07-10 2001-11-27 シーヴィシー、プラダクツ、インク マイクロエレクトロニクス製造装置用プログラマブル超クリーン電磁サブストレート回転装置及び方法
DE19605598C1 (de) 1996-02-15 1996-10-31 Singulus Technologies Gmbh Vorrichtung zum Greifen und Halten von Substraten
JP3076775B2 (ja) * 1997-07-31 2000-08-14 芝浦メカトロニクス株式会社 真空処理装置
DE19742923A1 (de) * 1997-09-29 1999-04-01 Leybold Systems Gmbh Vorrichtung zum Beschichten eines im wesentlichen flachen, scheibenförmigen Substrats
DE19814834A1 (de) * 1998-04-02 1999-10-07 Leybold Systems Gmbh Vorrichtung zum Greifen und Halten eines flachen Substrats

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4676884A (en) * 1986-07-23 1987-06-30 The Boc Group, Inc. Wafer processing machine with evacuated wafer transporting and storage system
US5451131A (en) * 1992-06-19 1995-09-19 International Business Machines Corporation Dockable interface airlock between process enclosure and interprocess transfer container
JPH07292470A (ja) * 1994-04-25 1995-11-07 Toshiba Emi Ltd 真空装置でのディスクの保持方法及び保持装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 1996, no. 03 29 March 1996 (1996-03-29) *

Also Published As

Publication number Publication date
US20020021542A1 (en) 2002-02-21
AU2001272844A1 (en) 2002-01-21
WO2002004697A1 (en) 2002-01-17
CN1291061C (zh) 2006-12-20
JP2002139166A (ja) 2002-05-17
EP1299571A1 (de) 2003-04-09
DE60129975T2 (de) 2008-05-15
HK1043161A1 (en) 2002-09-06
CN1455827A (zh) 2003-11-12
US6615547B2 (en) 2003-09-09
US20040083968A1 (en) 2004-05-06
US7198678B2 (en) 2007-04-03
DE60129975D1 (de) 2007-09-27
JP2004502869A (ja) 2004-01-29
EP1299571B1 (de) 2007-08-15
HK1043161B (en) 2011-02-18
EP1172456A1 (de) 2002-01-16
JP3757239B2 (ja) 2006-03-22
ATE370262T1 (de) 2007-09-15
EP1172456B1 (de) 2010-05-05
ES2291331T3 (es) 2008-03-01
DE60142012D1 (de) 2010-06-17

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Legal Events

Date Code Title Description
PD2B A search report has been drawn up
SD Assignments of patents

Owner name: OTB SOLAR B.V.

Effective date: 20090604

V1 Lapsed because of non-payment of the annual fee

Effective date: 20120201