AU2001272844A1 - Apparatus for performing at least one process on a substrate - Google Patents
Apparatus for performing at least one process on a substrateInfo
- Publication number
- AU2001272844A1 AU2001272844A1 AU2001272844A AU7284401A AU2001272844A1 AU 2001272844 A1 AU2001272844 A1 AU 2001272844A1 AU 2001272844 A AU2001272844 A AU 2001272844A AU 7284401 A AU7284401 A AU 7284401A AU 2001272844 A1 AU2001272844 A1 AU 2001272844A1
- Authority
- AU
- Australia
- Prior art keywords
- sealing means
- inner sealing
- closing
- lock
- maintained
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
- C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
- F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F7/00—Magnets
- H01F7/02—Permanent magnets [PM]
- H01F7/04—Means for releasing the attractive force
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Electron Tubes For Measurement (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Sampling And Sample Adjustment (AREA)
- Chemical Vapour Deposition (AREA)
- Element Separation (AREA)
- Details Of Valves (AREA)
- Magnetically Actuated Valves (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Drying Of Semiconductors (AREA)
Abstract
Lock for a vacuum chamber (6) which lock has a passage comprising an outer sealing means (2) and an inner sealing means (3) which outer sealing means can be maintained in the closed position under the influence of the pressure difference caused by the vacuum in the vacuum chamber, and can be opened against the force caused by said pressure difference, which inner sealing means can be maintained in the opened position under pretension and comprises closing means (4,5) for closing the inner sealing means against said pretension. The closing means comprise at least one electromagnet (4). <IMAGE>
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL1015690A NL1015690C2 (en) | 2000-07-12 | 2000-07-12 | Lock for vacuum chamber. |
NL1015690 | 2000-07-12 | ||
PCT/NL2001/000475 WO2002004697A1 (en) | 2000-07-12 | 2001-06-26 | Apparatus for performing at least one process on a substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001272844A1 true AU2001272844A1 (en) | 2002-01-21 |
Family
ID=19771725
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001272844A Abandoned AU2001272844A1 (en) | 2000-07-12 | 2001-06-26 | Apparatus for performing at least one process on a substrate |
Country Status (11)
Country | Link |
---|---|
US (2) | US7198678B2 (en) |
EP (2) | EP1299571B1 (en) |
JP (2) | JP2004502869A (en) |
CN (1) | CN1291061C (en) |
AT (1) | ATE370262T1 (en) |
AU (1) | AU2001272844A1 (en) |
DE (2) | DE60129975T2 (en) |
ES (1) | ES2291331T3 (en) |
HK (1) | HK1043161B (en) |
NL (1) | NL1015690C2 (en) |
WO (1) | WO2002004697A1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004027752A1 (en) * | 2004-06-08 | 2006-01-05 | Leybold Optics Gmbh | lock device |
US7611322B2 (en) | 2004-11-18 | 2009-11-03 | Intevac, Inc. | Processing thin wafers |
EA008187B1 (en) * | 2005-06-07 | 2007-04-27 | Владимир Яковлевич ШИРИПОВ | Method of cleaning shadow masks in display production and device therefor |
EP1862624B1 (en) * | 2006-06-01 | 2017-02-15 | Pilz Auslandsbeteiligungen GmbH | Closing device for an access protection device |
JP6282917B2 (en) | 2014-04-11 | 2018-02-21 | 株式会社Ihi | Vacuum processing equipment |
DE102016107990A1 (en) * | 2016-04-29 | 2017-11-02 | Von Ardenne Gmbh | Vacuum processing chamber |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57207313A (en) * | 1981-06-16 | 1982-12-20 | Toshiba Corp | Method of demagnetizing induction electric equipment |
US4676884A (en) * | 1986-07-23 | 1987-06-30 | The Boc Group, Inc. | Wafer processing machine with evacuated wafer transporting and storage system |
US4842683A (en) * | 1986-12-19 | 1989-06-27 | Applied Materials, Inc. | Magnetic field-enhanced plasma etch reactor |
DE59001807D1 (en) | 1990-03-26 | 1993-07-22 | Leybold Ag | DEVICE FOR INPUTING AND EXHAUSTING A WORKPIECE IN A VACUUM CHAMBER. |
US5451131A (en) * | 1992-06-19 | 1995-09-19 | International Business Machines Corporation | Dockable interface airlock between process enclosure and interprocess transfer container |
JP3873100B2 (en) * | 1994-04-25 | 2007-01-24 | 芝浦メカトロニクス株式会社 | Disk holding method and holding apparatus in vacuum apparatus |
JPH07292740A (en) | 1994-04-25 | 1995-11-07 | Tokai Rika Co Ltd | Automatic flushing device of valve driving device and sanitary ware |
US5871588A (en) * | 1995-07-10 | 1999-02-16 | Cvc, Inc. | Programmable ultraclean electromagnetic substrate rotation apparatus and method for microelectronics manufacturing equipment |
DE19605598C1 (en) * | 1996-02-15 | 1996-10-31 | Singulus Technologies Gmbh | Substrate hold and release mechanism for vacuum chamber |
JP3076775B2 (en) * | 1997-07-31 | 2000-08-14 | 芝浦メカトロニクス株式会社 | Vacuum processing equipment |
DE19742923A1 (en) * | 1997-09-29 | 1999-04-01 | Leybold Systems Gmbh | Device for coating a substantially flat, disc-shaped substrate |
DE19814834A1 (en) * | 1998-04-02 | 1999-10-07 | Leybold Systems Gmbh | Gripping and holding apparatus for a flat substrate e.g. a compact disk substrate during vacuum thin film coating |
-
2000
- 2000-07-12 NL NL1015690A patent/NL1015690C2/en not_active IP Right Cessation
-
2001
- 2001-06-26 US US10/332,381 patent/US7198678B2/en not_active Expired - Fee Related
- 2001-06-26 AT AT01952049T patent/ATE370262T1/en not_active IP Right Cessation
- 2001-06-26 EP EP01952049A patent/EP1299571B1/en not_active Expired - Lifetime
- 2001-06-26 ES ES01952049T patent/ES2291331T3/en not_active Expired - Lifetime
- 2001-06-26 CN CNB018155154A patent/CN1291061C/en not_active Expired - Fee Related
- 2001-06-26 AU AU2001272844A patent/AU2001272844A1/en not_active Abandoned
- 2001-06-26 DE DE60129975T patent/DE60129975T2/en not_active Expired - Lifetime
- 2001-06-26 WO PCT/NL2001/000475 patent/WO2002004697A1/en active IP Right Grant
- 2001-06-26 JP JP2002509550A patent/JP2004502869A/en active Pending
- 2001-07-09 EP EP01202632A patent/EP1172456B1/en not_active Expired - Lifetime
- 2001-07-09 DE DE60142012T patent/DE60142012D1/en not_active Expired - Lifetime
- 2001-07-12 JP JP2001211704A patent/JP3757239B2/en not_active Expired - Fee Related
- 2001-07-12 US US09/902,617 patent/US6615547B2/en not_active Expired - Fee Related
-
2002
- 2002-07-05 HK HK02105031.8A patent/HK1043161B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP1299571A1 (en) | 2003-04-09 |
CN1455827A (en) | 2003-11-12 |
ES2291331T3 (en) | 2008-03-01 |
US20040083968A1 (en) | 2004-05-06 |
US7198678B2 (en) | 2007-04-03 |
DE60129975D1 (en) | 2007-09-27 |
WO2002004697A1 (en) | 2002-01-17 |
JP2002139166A (en) | 2002-05-17 |
NL1015690C2 (en) | 2002-01-15 |
HK1043161A1 (en) | 2002-09-06 |
HK1043161B (en) | 2011-02-18 |
EP1299571B1 (en) | 2007-08-15 |
DE60129975T2 (en) | 2008-05-15 |
ATE370262T1 (en) | 2007-09-15 |
EP1172456A1 (en) | 2002-01-16 |
DE60142012D1 (en) | 2010-06-17 |
US6615547B2 (en) | 2003-09-09 |
US20020021542A1 (en) | 2002-02-21 |
EP1172456B1 (en) | 2010-05-05 |
JP3757239B2 (en) | 2006-03-22 |
CN1291061C (en) | 2006-12-20 |
JP2004502869A (en) | 2004-01-29 |
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