AU2001272844A1 - Apparatus for performing at least one process on a substrate - Google Patents

Apparatus for performing at least one process on a substrate

Info

Publication number
AU2001272844A1
AU2001272844A1 AU2001272844A AU7284401A AU2001272844A1 AU 2001272844 A1 AU2001272844 A1 AU 2001272844A1 AU 2001272844 A AU2001272844 A AU 2001272844A AU 7284401 A AU7284401 A AU 7284401A AU 2001272844 A1 AU2001272844 A1 AU 2001272844A1
Authority
AU
Australia
Prior art keywords
sealing means
inner sealing
closing
lock
maintained
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001272844A
Inventor
Franciscus Cornelius Dings
Marinus Franciscus Johannes Evers
Anton Habraken
Michael Adrianus Theodorus Hompus
Ronaldus Joannes Cornelis Maria Kok
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
O T B Group BV
Original Assignee
O T B Group BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by O T B Group BV filed Critical O T B Group BV
Publication of AU2001272844A1 publication Critical patent/AU2001272844A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00Other details not peculiar to particular types of valves or cut-off apparatus
    • F16K51/02Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F7/00Magnets
    • H01F7/02Permanent magnets [PM]
    • H01F7/04Means for releasing the attractive force

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Tubes For Measurement (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Chemical Vapour Deposition (AREA)
  • Element Separation (AREA)
  • Details Of Valves (AREA)
  • Magnetically Actuated Valves (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

Lock for a vacuum chamber (6) which lock has a passage comprising an outer sealing means (2) and an inner sealing means (3) which outer sealing means can be maintained in the closed position under the influence of the pressure difference caused by the vacuum in the vacuum chamber, and can be opened against the force caused by said pressure difference, which inner sealing means can be maintained in the opened position under pretension and comprises closing means (4,5) for closing the inner sealing means against said pretension. The closing means comprise at least one electromagnet (4). <IMAGE>
AU2001272844A 2000-07-12 2001-06-26 Apparatus for performing at least one process on a substrate Abandoned AU2001272844A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
NL1015690A NL1015690C2 (en) 2000-07-12 2000-07-12 Lock for vacuum chamber.
NL1015690 2000-07-12
PCT/NL2001/000475 WO2002004697A1 (en) 2000-07-12 2001-06-26 Apparatus for performing at least one process on a substrate

Publications (1)

Publication Number Publication Date
AU2001272844A1 true AU2001272844A1 (en) 2002-01-21

Family

ID=19771725

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001272844A Abandoned AU2001272844A1 (en) 2000-07-12 2001-06-26 Apparatus for performing at least one process on a substrate

Country Status (11)

Country Link
US (2) US7198678B2 (en)
EP (2) EP1299571B1 (en)
JP (2) JP2004502869A (en)
CN (1) CN1291061C (en)
AT (1) ATE370262T1 (en)
AU (1) AU2001272844A1 (en)
DE (2) DE60129975T2 (en)
ES (1) ES2291331T3 (en)
HK (1) HK1043161B (en)
NL (1) NL1015690C2 (en)
WO (1) WO2002004697A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004027752A1 (en) * 2004-06-08 2006-01-05 Leybold Optics Gmbh lock device
US7611322B2 (en) 2004-11-18 2009-11-03 Intevac, Inc. Processing thin wafers
EA008187B1 (en) * 2005-06-07 2007-04-27 Владимир Яковлевич ШИРИПОВ Method of cleaning shadow masks in display production and device therefor
EP1862624B1 (en) * 2006-06-01 2017-02-15 Pilz Auslandsbeteiligungen GmbH Closing device for an access protection device
JP6282917B2 (en) 2014-04-11 2018-02-21 株式会社Ihi Vacuum processing equipment
DE102016107990A1 (en) * 2016-04-29 2017-11-02 Von Ardenne Gmbh Vacuum processing chamber

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57207313A (en) * 1981-06-16 1982-12-20 Toshiba Corp Method of demagnetizing induction electric equipment
US4676884A (en) * 1986-07-23 1987-06-30 The Boc Group, Inc. Wafer processing machine with evacuated wafer transporting and storage system
US4842683A (en) * 1986-12-19 1989-06-27 Applied Materials, Inc. Magnetic field-enhanced plasma etch reactor
DE59001807D1 (en) 1990-03-26 1993-07-22 Leybold Ag DEVICE FOR INPUTING AND EXHAUSTING A WORKPIECE IN A VACUUM CHAMBER.
US5451131A (en) * 1992-06-19 1995-09-19 International Business Machines Corporation Dockable interface airlock between process enclosure and interprocess transfer container
JP3873100B2 (en) * 1994-04-25 2007-01-24 芝浦メカトロニクス株式会社 Disk holding method and holding apparatus in vacuum apparatus
JPH07292740A (en) 1994-04-25 1995-11-07 Tokai Rika Co Ltd Automatic flushing device of valve driving device and sanitary ware
US5871588A (en) * 1995-07-10 1999-02-16 Cvc, Inc. Programmable ultraclean electromagnetic substrate rotation apparatus and method for microelectronics manufacturing equipment
DE19605598C1 (en) * 1996-02-15 1996-10-31 Singulus Technologies Gmbh Substrate hold and release mechanism for vacuum chamber
JP3076775B2 (en) * 1997-07-31 2000-08-14 芝浦メカトロニクス株式会社 Vacuum processing equipment
DE19742923A1 (en) * 1997-09-29 1999-04-01 Leybold Systems Gmbh Device for coating a substantially flat, disc-shaped substrate
DE19814834A1 (en) * 1998-04-02 1999-10-07 Leybold Systems Gmbh Gripping and holding apparatus for a flat substrate e.g. a compact disk substrate during vacuum thin film coating

Also Published As

Publication number Publication date
EP1299571A1 (en) 2003-04-09
CN1455827A (en) 2003-11-12
ES2291331T3 (en) 2008-03-01
US20040083968A1 (en) 2004-05-06
US7198678B2 (en) 2007-04-03
DE60129975D1 (en) 2007-09-27
WO2002004697A1 (en) 2002-01-17
JP2002139166A (en) 2002-05-17
NL1015690C2 (en) 2002-01-15
HK1043161A1 (en) 2002-09-06
HK1043161B (en) 2011-02-18
EP1299571B1 (en) 2007-08-15
DE60129975T2 (en) 2008-05-15
ATE370262T1 (en) 2007-09-15
EP1172456A1 (en) 2002-01-16
DE60142012D1 (en) 2010-06-17
US6615547B2 (en) 2003-09-09
US20020021542A1 (en) 2002-02-21
EP1172456B1 (en) 2010-05-05
JP3757239B2 (en) 2006-03-22
CN1291061C (en) 2006-12-20
JP2004502869A (en) 2004-01-29

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