ATE119948T1 - Sputteranlage. - Google Patents

Sputteranlage.

Info

Publication number
ATE119948T1
ATE119948T1 AT91104804T AT91104804T ATE119948T1 AT E119948 T1 ATE119948 T1 AT E119948T1 AT 91104804 T AT91104804 T AT 91104804T AT 91104804 T AT91104804 T AT 91104804T AT E119948 T1 ATE119948 T1 AT E119948T1
Authority
AT
Austria
Prior art keywords
vacuum chamber
disc
opening
tray
exit opening
Prior art date
Application number
AT91104804T
Other languages
English (en)
Inventor
Jiro Ikeda
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2083795A external-priority patent/JP3044735B2/ja
Application filed by Sony Corp filed Critical Sony Corp
Application granted granted Critical
Publication of ATE119948T1 publication Critical patent/ATE119948T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Glass Compositions (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
AT91104804T 1990-03-30 1991-03-26 Sputteranlage. ATE119948T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP8379390 1990-03-30
JP2083795A JP3044735B2 (ja) 1990-03-30 1990-03-30 スパッタリング装置

Publications (1)

Publication Number Publication Date
ATE119948T1 true ATE119948T1 (de) 1995-04-15

Family

ID=26424832

Family Applications (1)

Application Number Title Priority Date Filing Date
AT91104804T ATE119948T1 (de) 1990-03-30 1991-03-26 Sputteranlage.

Country Status (5)

Country Link
US (1) US5135635A (de)
EP (1) EP0449227B1 (de)
KR (1) KR100192985B1 (de)
AT (1) ATE119948T1 (de)
DE (1) DE69108079T2 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0639697B2 (ja) * 1990-11-30 1994-05-25 株式会社芝浦製作所 基板のローディング装置
DE4232959C2 (de) * 1992-10-01 2001-05-10 Leybold Ag Vorrichtung zum Ein- und Ausschleusen scheibenförmiger Substrate
GB2272225B (en) * 1992-10-06 1996-07-17 Balzers Hochvakuum A method for masking a workpiece and a vacuum treatment facility
US5421893A (en) * 1993-02-26 1995-06-06 Applied Materials, Inc. Susceptor drive and wafer displacement mechanism
WO1994021839A1 (fr) * 1993-03-15 1994-09-29 Kabushiki Kaisha Kobeseikosho Appareil et systeme de placage ionique a l'arc
JPH08273207A (ja) * 1995-01-31 1996-10-18 Canon Inc 光情報記録媒体搬送用キヤリア、該キヤリアを用いた光情報記録媒体の製造方法及び製造装置
NL1002878C2 (nl) * 1996-04-16 1997-10-17 Robi Omp Mastering Dev Gmbh Sputterinrichting.
US5772773A (en) * 1996-05-20 1998-06-30 Applied Materials, Inc. Co-axial motorized wafer lift
EP0870850B1 (de) * 1997-04-11 2002-09-18 Leybold Systems GmbH Verfahren und Vorrichtung zum Be- und Entladen einer evakuierbaren Behandlungskammer
DE19742923A1 (de) * 1997-09-29 1999-04-01 Leybold Systems Gmbh Vorrichtung zum Beschichten eines im wesentlichen flachen, scheibenförmigen Substrats
US6105435A (en) 1997-10-24 2000-08-22 Cypress Semiconductor Corp. Circuit and apparatus for verifying a chamber seal, and method of depositing a material onto a substrate using the same
US6293749B1 (en) 1997-11-21 2001-09-25 Asm America, Inc. Substrate transfer system for semiconductor processing equipment
DE19806282C1 (de) * 1998-02-16 1999-03-25 Singulus Technologies Ag Vorrichtung und Verfahren von zum Belüften einer Vakuum-Bearbeitungskammer mit einer Transportkammer
DE19812670A1 (de) * 1998-03-23 1999-10-07 Singulus Technologies Ag Vorrichtung zum Transport von Substraten
US6899795B1 (en) 2000-01-18 2005-05-31 Unaxis Balzers Aktiengesellschaft Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers
JP5059269B2 (ja) * 2000-01-18 2012-10-24 オー・ツェー・エリコン・バルザース・アクチェンゲゼルシャフト スパッタチャンバならびに真空輸送チャンバおよびこれらのチャンバを備えた真空処理装置
DE10100427A1 (de) 2001-01-08 2002-07-18 Steag Hamatech Ag Verfahren und Vorrichtung zum Zusammenfügen von Substraten
DE10146838A1 (de) 2001-09-24 2003-04-10 Ptr Praez Stechnik Gmbh Werkstückzufuhrvorrichtung für eine Elektronenstrahlbearbeitungsvorrichtung
DE10247002B3 (de) * 2002-10-09 2004-02-26 Applied Films Gmbh & Co. Kg Durchlauf-Beschichtungsanlage
DE10355682B4 (de) * 2003-11-28 2008-10-30 Singulus Technologies Ag Trägeranordnung
DE10355678B4 (de) * 2003-11-28 2009-03-26 Singulus Technologies Ag Vakuumsystem, Verfahren zum Transport eines Objekts im Vakuum mittels des Vakuumsystems und Verwendung des Vakuumsystems
TWI274978B (en) * 2004-02-25 2007-03-01 Advanced Display Proc Eng Co Apparatus for manufacturing flat-panel display
CN100334634C (zh) * 2004-08-13 2007-08-29 精碟科技股份有限公司 盘片溅镀遮罩
TW200641880A (en) * 2005-04-26 2006-12-01 Steag Hamatech Ag Process and device for coating disk-shaped substrates for optical data carriers
WO2007010568A1 (en) * 2005-07-21 2007-01-25 Lpe S.P.A. System for supporting and rotating a susceptor inside a treatment chamber of a water treating apparatus
US7581916B2 (en) * 2006-07-14 2009-09-01 Ulvac-Phi, Inc. Sample introduction and transfer system and method
DE102011114593B4 (de) * 2011-09-30 2016-11-03 Manz Ag Transporteinrichtung zum Transportieren mehrerer Substrate in den Bereich einer Substrat-Behandlungseinrichtung sowie eine derart ausgestaltete Vakuumbehandlungseinrichtung

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH573985A5 (de) * 1973-11-22 1976-03-31 Balzers Patent Beteilig Ag
DE3716498C2 (de) * 1987-05-16 1994-08-04 Leybold Ag Vorrichtung zum Ein- und Ausschleusen von Werkstücken in eine Beschichtungskammer
DE3827343A1 (de) * 1988-08-12 1990-02-15 Leybold Ag Vorrichtung nach dem karussel-prinzip zum beschichten von substraten
DE3735284A1 (de) * 1987-10-17 1989-04-27 Leybold Ag Vorrichtung nach dem karussell-prinzip zum beschichten von substraten
JPH01237493A (ja) * 1988-03-17 1989-09-21 Ishikawajima Harima Heavy Ind Co Ltd コンクリート製原子炉格納容器とその構築方法
JPH0280569A (ja) * 1988-09-16 1990-03-20 Hitachi Ltd ロードロック機構を備えたミリング装置
JP3466607B2 (ja) * 1989-09-13 2003-11-17 ソニー株式会社 スパッタリング装置

Also Published As

Publication number Publication date
KR910017381A (ko) 1991-11-05
DE69108079D1 (de) 1995-04-20
US5135635A (en) 1992-08-04
EP0449227A3 (en) 1991-12-11
KR100192985B1 (ko) 1999-06-15
EP0449227B1 (de) 1995-03-15
EP0449227A2 (de) 1991-10-02
DE69108079T2 (de) 1995-11-02

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee