DE69108079T2 - Sputteranlage. - Google Patents
Sputteranlage.Info
- Publication number
- DE69108079T2 DE69108079T2 DE69108079T DE69108079T DE69108079T2 DE 69108079 T2 DE69108079 T2 DE 69108079T2 DE 69108079 T DE69108079 T DE 69108079T DE 69108079 T DE69108079 T DE 69108079T DE 69108079 T2 DE69108079 T2 DE 69108079T2
- Authority
- DE
- Germany
- Prior art keywords
- vacuum chamber
- disc
- opening
- tray
- exit opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2083795A JP3044735B2 (ja) | 1990-03-30 | 1990-03-30 | スパッタリング装置 |
JP8379390 | 1990-03-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69108079D1 DE69108079D1 (de) | 1995-04-20 |
DE69108079T2 true DE69108079T2 (de) | 1995-11-02 |
Family
ID=26424832
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69108079T Expired - Fee Related DE69108079T2 (de) | 1990-03-30 | 1991-03-26 | Sputteranlage. |
Country Status (5)
Country | Link |
---|---|
US (1) | US5135635A (de) |
EP (1) | EP0449227B1 (de) |
KR (1) | KR100192985B1 (de) |
AT (1) | ATE119948T1 (de) |
DE (1) | DE69108079T2 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10247002B3 (de) * | 2002-10-09 | 2004-02-26 | Applied Films Gmbh & Co. Kg | Durchlauf-Beschichtungsanlage |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0639697B2 (ja) * | 1990-11-30 | 1994-05-25 | 株式会社芝浦製作所 | 基板のローディング装置 |
DE4232959C2 (de) * | 1992-10-01 | 2001-05-10 | Leybold Ag | Vorrichtung zum Ein- und Ausschleusen scheibenförmiger Substrate |
GB2272225B (en) * | 1992-10-06 | 1996-07-17 | Balzers Hochvakuum | A method for masking a workpiece and a vacuum treatment facility |
US5421893A (en) * | 1993-02-26 | 1995-06-06 | Applied Materials, Inc. | Susceptor drive and wafer displacement mechanism |
US5730847A (en) * | 1993-03-15 | 1998-03-24 | Kabushiki Kaisha Kobeseikosho | Arc ion plating device and arc ion plating system |
JPH08273207A (ja) * | 1995-01-31 | 1996-10-18 | Canon Inc | 光情報記録媒体搬送用キヤリア、該キヤリアを用いた光情報記録媒体の製造方法及び製造装置 |
NL1002878C2 (nl) * | 1996-04-16 | 1997-10-17 | Robi Omp Mastering Dev Gmbh | Sputterinrichting. |
US5772773A (en) * | 1996-05-20 | 1998-06-30 | Applied Materials, Inc. | Co-axial motorized wafer lift |
EP0870850B1 (de) * | 1997-04-11 | 2002-09-18 | Leybold Systems GmbH | Verfahren und Vorrichtung zum Be- und Entladen einer evakuierbaren Behandlungskammer |
DE19742923A1 (de) * | 1997-09-29 | 1999-04-01 | Leybold Systems Gmbh | Vorrichtung zum Beschichten eines im wesentlichen flachen, scheibenförmigen Substrats |
US6105435A (en) * | 1997-10-24 | 2000-08-22 | Cypress Semiconductor Corp. | Circuit and apparatus for verifying a chamber seal, and method of depositing a material onto a substrate using the same |
US6293749B1 (en) | 1997-11-21 | 2001-09-25 | Asm America, Inc. | Substrate transfer system for semiconductor processing equipment |
DE19806282C1 (de) * | 1998-02-16 | 1999-03-25 | Singulus Technologies Ag | Vorrichtung und Verfahren von zum Belüften einer Vakuum-Bearbeitungskammer mit einer Transportkammer |
DE19812670A1 (de) * | 1998-03-23 | 1999-10-07 | Singulus Technologies Ag | Vorrichtung zum Transport von Substraten |
JP5059269B2 (ja) * | 2000-01-18 | 2012-10-24 | オー・ツェー・エリコン・バルザース・アクチェンゲゼルシャフト | スパッタチャンバならびに真空輸送チャンバおよびこれらのチャンバを備えた真空処理装置 |
US6899795B1 (en) | 2000-01-18 | 2005-05-31 | Unaxis Balzers Aktiengesellschaft | Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers |
DE10100427A1 (de) | 2001-01-08 | 2002-07-18 | Steag Hamatech Ag | Verfahren und Vorrichtung zum Zusammenfügen von Substraten |
DE10146838A1 (de) * | 2001-09-24 | 2003-04-10 | Ptr Praez Stechnik Gmbh | Werkstückzufuhrvorrichtung für eine Elektronenstrahlbearbeitungsvorrichtung |
DE10355678B4 (de) * | 2003-11-28 | 2009-03-26 | Singulus Technologies Ag | Vakuumsystem, Verfahren zum Transport eines Objekts im Vakuum mittels des Vakuumsystems und Verwendung des Vakuumsystems |
DE10355682B4 (de) * | 2003-11-28 | 2008-10-30 | Singulus Technologies Ag | Trägeranordnung |
TWI274978B (en) * | 2004-02-25 | 2007-03-01 | Advanced Display Proc Eng Co | Apparatus for manufacturing flat-panel display |
CN100334634C (zh) * | 2004-08-13 | 2007-08-29 | 精碟科技股份有限公司 | 盘片溅镀遮罩 |
TW200641880A (en) * | 2005-04-26 | 2006-12-01 | Steag Hamatech Ag | Process and device for coating disk-shaped substrates for optical data carriers |
JP2009502039A (ja) * | 2005-07-21 | 2009-01-22 | エルピーイー ソシエタ ペル アチオニ | ウェーハ処理装置の処理室の中でサセプタを支持し回転させるためのシステム |
US7581916B2 (en) * | 2006-07-14 | 2009-09-01 | Ulvac-Phi, Inc. | Sample introduction and transfer system and method |
DE102011114593B4 (de) * | 2011-09-30 | 2016-11-03 | Manz Ag | Transporteinrichtung zum Transportieren mehrerer Substrate in den Bereich einer Substrat-Behandlungseinrichtung sowie eine derart ausgestaltete Vakuumbehandlungseinrichtung |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH573985A5 (de) * | 1973-11-22 | 1976-03-31 | Balzers Patent Beteilig Ag | |
DE3716498C2 (de) * | 1987-05-16 | 1994-08-04 | Leybold Ag | Vorrichtung zum Ein- und Ausschleusen von Werkstücken in eine Beschichtungskammer |
DE3827343A1 (de) * | 1988-08-12 | 1990-02-15 | Leybold Ag | Vorrichtung nach dem karussel-prinzip zum beschichten von substraten |
DE3735284A1 (de) * | 1987-10-17 | 1989-04-27 | Leybold Ag | Vorrichtung nach dem karussell-prinzip zum beschichten von substraten |
JPH01237493A (ja) * | 1988-03-17 | 1989-09-21 | Ishikawajima Harima Heavy Ind Co Ltd | コンクリート製原子炉格納容器とその構築方法 |
JPH0280569A (ja) * | 1988-09-16 | 1990-03-20 | Hitachi Ltd | ロードロック機構を備えたミリング装置 |
JP3466607B2 (ja) * | 1989-09-13 | 2003-11-17 | ソニー株式会社 | スパッタリング装置 |
-
1991
- 1991-03-26 AT AT91104804T patent/ATE119948T1/de not_active IP Right Cessation
- 1991-03-26 DE DE69108079T patent/DE69108079T2/de not_active Expired - Fee Related
- 1991-03-26 EP EP91104804A patent/EP0449227B1/de not_active Expired - Lifetime
- 1991-03-29 US US07/677,766 patent/US5135635A/en not_active Expired - Lifetime
- 1991-03-29 KR KR1019910004954A patent/KR100192985B1/ko not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10247002B3 (de) * | 2002-10-09 | 2004-02-26 | Applied Films Gmbh & Co. Kg | Durchlauf-Beschichtungsanlage |
Also Published As
Publication number | Publication date |
---|---|
EP0449227A2 (de) | 1991-10-02 |
US5135635A (en) | 1992-08-04 |
DE69108079D1 (de) | 1995-04-20 |
EP0449227A3 (en) | 1991-12-11 |
KR100192985B1 (ko) | 1999-06-15 |
EP0449227B1 (de) | 1995-03-15 |
KR910017381A (ko) | 1991-11-05 |
ATE119948T1 (de) | 1995-04-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8328 | Change in the person/name/address of the agent |
Free format text: PATENTANWAELTE MUELLER & HOFFMANN, 81667 MUENCHEN |
|
8339 | Ceased/non-payment of the annual fee |