MY175409A - Sputtering target for magnetic recording film, and raw carbon material for use in producing same - Google Patents

Sputtering target for magnetic recording film, and raw carbon material for use in producing same

Info

Publication number
MY175409A
MY175409A MYPI2015703482A MYPI2015703482A MY175409A MY 175409 A MY175409 A MY 175409A MY PI2015703482 A MYPI2015703482 A MY PI2015703482A MY PI2015703482 A MYPI2015703482 A MY PI2015703482A MY 175409 A MY175409 A MY 175409A
Authority
MY
Malaysia
Prior art keywords
sputtering target
magnetic recording
carbon material
recording film
producing same
Prior art date
Application number
MYPI2015703482A
Other languages
English (en)
Inventor
Shin-Ichi Ogino
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of MY175409A publication Critical patent/MY175409A/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)
MYPI2015703482A 2013-04-26 2014-04-24 Sputtering target for magnetic recording film, and raw carbon material for use in producing same MY175409A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013094300 2013-04-26

Publications (1)

Publication Number Publication Date
MY175409A true MY175409A (en) 2020-06-24

Family

ID=51791958

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2015703482A MY175409A (en) 2013-04-26 2014-04-24 Sputtering target for magnetic recording film, and raw carbon material for use in producing same

Country Status (6)

Country Link
JP (1) JP5876155B2 (zh)
CN (1) CN104955981B (zh)
MY (1) MY175409A (zh)
SG (1) SG11201506097YA (zh)
TW (1) TWI595103B (zh)
WO (1) WO2014175392A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6383510B2 (ja) * 2016-03-07 2018-08-29 田中貴金属工業株式会社 ＦｅＰｔ−Ｃ系スパッタリングターゲット
JP7483999B1 (ja) 2023-09-22 2024-05-15 Ｊｘ金属株式会社 スパッタリングターゲット及びスパッタリングターゲット組立品

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000012020A (ja) * 1998-06-23 2000-01-14 Nippon Steel Corp リチウム二次電池負極用炭素材料
US20070189916A1 (en) * 2002-07-23 2007-08-16 Heraeus Incorporated Sputtering targets and methods for fabricating sputtering targets having multiple materials
KR100470151B1 (ko) * 2002-10-29 2005-02-05 한국과학기술원 ＦｅＰｔＣ 박막을 이용한 고밀도 자기기록매체 및 그제조방법
JP5428561B2 (ja) * 2009-06-16 2014-02-26 株式会社Ｇｓユアサ 直接形燃料電池システム及びその運転停止方法
JP5678414B2 (ja) * 2009-06-17 2015-03-04 三菱化学株式会社 黒鉛負極材料及びその製造方法、並びにそれを用いたリチウム二次電池用負極及びリチウム二次電池
WO2012086335A1 (ja) * 2010-12-20 2012-06-28 Jx日鉱日石金属株式会社 Ｃ粒子が分散したＦｅ－Ｐｔ系スパッタリングターゲット
JP5912559B2 (ja) * 2011-03-30 2016-04-27 田中貴金属工業株式会社 ＦｅＰｔ−Ｃ系スパッタリングターゲットの製造方法
US9683284B2 (en) * 2011-03-30 2017-06-20 Jx Nippon Mining & Metals Corporation Sputtering target for magnetic recording film
JP6037197B2 (ja) * 2011-05-09 2016-12-07 三菱マテリアル株式会社 磁気記録媒体膜形成用スパッタリングターゲットおよびその製造方法

Also Published As

Publication number Publication date
CN104955981B (zh) 2018-01-23
WO2014175392A1 (ja) 2014-10-30
SG11201506097YA (en) 2015-09-29
CN104955981A (zh) 2015-09-30
TWI595103B (zh) 2017-08-11
JP5876155B2 (ja) 2016-03-02
JPWO2014175392A1 (ja) 2017-02-23
TW201508074A (zh) 2015-03-01

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