MY156642A - Sputtering target material and thin film manufactured using the material - Google Patents
Sputtering target material and thin film manufactured using the materialInfo
- Publication number
- MY156642A MY156642A MYPI2011003964A MYPI2011003964A MY156642A MY 156642 A MY156642 A MY 156642A MY PI2011003964 A MYPI2011003964 A MY PI2011003964A MY PI2011003964 A MYPI2011003964 A MY PI2011003964A MY 156642 A MY156642 A MY 156642A
- Authority
- MY
- Malaysia
- Prior art keywords
- sputtering target
- thin film
- target material
- film manufactured
- intermediate layer
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/0433—Nickel- or cobalt-based alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/03—Alloys based on nickel or cobalt based on nickel
- C22C19/05—Alloys based on nickel or cobalt based on nickel with chromium
- C22C19/051—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W
- C22C19/056—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W with the maximum Cr content being at least 10% but less than 20%
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/03—Alloys based on nickel or cobalt based on nickel
- C22C19/05—Alloys based on nickel or cobalt based on nickel with chromium
- C22C19/051—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W
- C22C19/057—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W with the maximum Cr content being less 10%
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
- G11B5/7371—Non-magnetic single underlayer comprising nickel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Powder Metallurgy (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009041817A JP5384969B2 (ja) | 2009-02-25 | 2009-02-25 | スパッタリングターゲット材およびこれを用いて製造した薄膜 |
Publications (1)
Publication Number | Publication Date |
---|---|
MY156642A true MY156642A (en) | 2016-03-15 |
Family
ID=42665497
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2011003964A MY156642A (en) | 2009-02-25 | 2010-02-22 | Sputtering target material and thin film manufactured using the material |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP5384969B2 (zh) |
CN (1) | CN102405303B (zh) |
MY (1) | MY156642A (zh) |
SG (1) | SG173769A1 (zh) |
TW (1) | TWI512126B (zh) |
WO (1) | WO2010098290A1 (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104646930B (zh) * | 2013-11-21 | 2017-07-04 | 安泰科技股份有限公司 | Ni‑W‑Cr合金靶材的制造方法 |
JP6431496B2 (ja) * | 2016-04-13 | 2018-11-28 | 山陽特殊製鋼株式会社 | 磁気記録媒体のシード層用合金、スパッタリングターゲット材および磁気記録媒体 |
CN114752816A (zh) * | 2022-03-15 | 2022-07-15 | 北京科技大学 | 一种等温锻造用模具合金及制备方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070253103A1 (en) * | 2006-04-27 | 2007-11-01 | Heraeus, Inc. | Soft magnetic underlayer in magnetic media and soft magnetic alloy based sputter target |
JP5111835B2 (ja) * | 2006-11-17 | 2013-01-09 | 山陽特殊製鋼株式会社 | (CoFe)ZrNb/Ta/Hf系ターゲット材およびその製造方法 |
JP5069051B2 (ja) * | 2007-07-13 | 2012-11-07 | Jx日鉱日石金属株式会社 | ニッケル合金スパッタリングターゲット |
JP2009026353A (ja) * | 2007-07-17 | 2009-02-05 | Hitachi Global Storage Technologies Netherlands Bv | 垂直磁気記録媒体 |
JP2010129115A (ja) * | 2008-11-26 | 2010-06-10 | Showa Denko Kk | 磁気記録媒体及びその製造方法並びに記憶装置 |
-
2009
- 2009-02-25 JP JP2009041817A patent/JP5384969B2/ja not_active Expired - Fee Related
-
2010
- 2010-02-22 WO PCT/JP2010/052640 patent/WO2010098290A1/ja active Application Filing
- 2010-02-22 SG SG2011059821A patent/SG173769A1/en unknown
- 2010-02-22 MY MYPI2011003964A patent/MY156642A/en unknown
- 2010-02-22 CN CN201080017054.9A patent/CN102405303B/zh not_active Expired - Fee Related
- 2010-02-25 TW TW099105518A patent/TWI512126B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW201100570A (en) | 2011-01-01 |
TWI512126B (zh) | 2015-12-11 |
JP5384969B2 (ja) | 2014-01-08 |
CN102405303B (zh) | 2014-05-21 |
JP2010196110A (ja) | 2010-09-09 |
WO2010098290A1 (ja) | 2010-09-02 |
CN102405303A (zh) | 2012-04-04 |
SG173769A1 (en) | 2011-09-29 |
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