MY156642A - Sputtering target material and thin film manufactured using the material - Google Patents

Sputtering target material and thin film manufactured using the material

Info

Publication number
MY156642A
MY156642A MYPI2011003964A MYPI2011003964A MY156642A MY 156642 A MY156642 A MY 156642A MY PI2011003964 A MYPI2011003964 A MY PI2011003964A MY PI2011003964 A MYPI2011003964 A MY PI2011003964A MY 156642 A MY156642 A MY 156642A
Authority
MY
Malaysia
Prior art keywords
sputtering target
thin film
target material
film manufactured
intermediate layer
Prior art date
Application number
MYPI2011003964A
Other languages
English (en)
Inventor
Kishida Atsushi
Sawada Toshiyuki
Original Assignee
Sanyo Special Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Special Steel Co Ltd filed Critical Sanyo Special Steel Co Ltd
Publication of MY156642A publication Critical patent/MY156642A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/0433—Nickel- or cobalt-based alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/03—Alloys based on nickel or cobalt based on nickel
    • C22C19/05—Alloys based on nickel or cobalt based on nickel with chromium
    • C22C19/051—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W
    • C22C19/056—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W with the maximum Cr content being at least 10% but less than 20%
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/03—Alloys based on nickel or cobalt based on nickel
    • C22C19/05—Alloys based on nickel or cobalt based on nickel with chromium
    • C22C19/051—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W
    • C22C19/057—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W with the maximum Cr content being less 10%
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G11B5/7371—Non-magnetic single underlayer comprising nickel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Powder Metallurgy (AREA)
MYPI2011003964A 2009-02-25 2010-02-22 Sputtering target material and thin film manufactured using the material MY156642A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009041817A JP5384969B2 (ja) 2009-02-25 2009-02-25 スパッタリングターゲット材およびこれを用いて製造した薄膜

Publications (1)

Publication Number Publication Date
MY156642A true MY156642A (en) 2016-03-15

Family

ID=42665497

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2011003964A MY156642A (en) 2009-02-25 2010-02-22 Sputtering target material and thin film manufactured using the material

Country Status (6)

Country Link
JP (1) JP5384969B2 (zh)
CN (1) CN102405303B (zh)
MY (1) MY156642A (zh)
SG (1) SG173769A1 (zh)
TW (1) TWI512126B (zh)
WO (1) WO2010098290A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104646930B (zh) * 2013-11-21 2017-07-04 安泰科技股份有限公司 Ni‑W‑Cr合金靶材的制造方法
JP6431496B2 (ja) * 2016-04-13 2018-11-28 山陽特殊製鋼株式会社 磁気記録媒体のシード層用合金、スパッタリングターゲット材および磁気記録媒体
CN114752816A (zh) * 2022-03-15 2022-07-15 北京科技大学 一种等温锻造用模具合金及制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070253103A1 (en) * 2006-04-27 2007-11-01 Heraeus, Inc. Soft magnetic underlayer in magnetic media and soft magnetic alloy based sputter target
JP5111835B2 (ja) * 2006-11-17 2013-01-09 山陽特殊製鋼株式会社 （ＣｏＦｅ）ＺｒＮｂ／Ｔａ／Ｈｆ系ターゲット材およびその製造方法
JP5069051B2 (ja) * 2007-07-13 2012-11-07 Ｊｘ日鉱日石金属株式会社 ニッケル合金スパッタリングターゲット
JP2009026353A (ja) * 2007-07-17 2009-02-05 Hitachi Global Storage Technologies Netherlands Bv 垂直磁気記録媒体
JP2010129115A (ja) * 2008-11-26 2010-06-10 Showa Denko Kk 磁気記録媒体及びその製造方法並びに記憶装置

Also Published As

Publication number Publication date
TW201100570A (en) 2011-01-01
TWI512126B (zh) 2015-12-11
JP5384969B2 (ja) 2014-01-08
CN102405303B (zh) 2014-05-21
JP2010196110A (ja) 2010-09-09
WO2010098290A1 (ja) 2010-09-02
CN102405303A (zh) 2012-04-04
SG173769A1 (en) 2011-09-29

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