MY146519A - Method and apparatus for applying a voltage to a substrate during plating - Google Patents
Method and apparatus for applying a voltage to a substrate during platingInfo
- Publication number
- MY146519A MY146519A MYPI20052384A MYPI20052384A MY146519A MY 146519 A MY146519 A MY 146519A MY PI20052384 A MYPI20052384 A MY PI20052384A MY PI20052384 A MYPI20052384 A MY PI20052384A MY 146519 A MY146519 A MY 146519A
- Authority
- MY
- Malaysia
- Prior art keywords
- voltage
- substrates
- during plating
- applying
- substrate during
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 5
- 238000000034 method Methods 0.000 title abstract 3
- 238000007747 plating Methods 0.000 title abstract 3
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
- C25D17/08—Supporting racks, i.e. not for suspending
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/853,953 US7498062B2 (en) | 2004-05-26 | 2004-05-26 | Method and apparatus for applying a voltage to a substrate during plating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY146519A true MY146519A (en) | 2012-08-15 |
Family
ID=34936872
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI20052384A MY146519A (en) | 2004-05-26 | 2005-05-26 | Method and apparatus for applying a voltage to a substrate during plating |
Country Status (4)
| Country | Link |
|---|---|
| US (3) | US7498062B2 (enExample) |
| EP (1) | EP1600529A3 (enExample) |
| JP (1) | JP4839017B2 (enExample) |
| MY (1) | MY146519A (enExample) |
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| US6341935B1 (en) | 2000-06-14 | 2002-01-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Wafer boat having improved wafer holding capability |
| US6709563B2 (en) | 2000-06-30 | 2004-03-23 | Ebara Corporation | Copper-plating liquid, plating method and plating apparatus |
| US6418945B1 (en) | 2000-07-07 | 2002-07-16 | Semitool, Inc. | Dual cassette centrifugal processor |
| JP2002038275A (ja) * | 2000-07-25 | 2002-02-06 | Mitsubishi Materials Corp | 円板支持具 |
| US6528124B1 (en) | 2000-12-01 | 2003-03-04 | Komag, Inc. | Disk carrier |
| US6558750B2 (en) | 2001-07-16 | 2003-05-06 | Technic Inc. | Method of processing and plating planar articles |
| US6664122B1 (en) | 2001-10-19 | 2003-12-16 | Novellus Systems, Inc. | Electroless copper deposition method for preparing copper seed layers |
| US7067045B2 (en) * | 2002-10-18 | 2006-06-27 | Applied Materials, Inc. | Method and apparatus for sealing electrical contacts during an electrochemical deposition process |
| EP1493847A3 (en) * | 2003-07-04 | 2008-10-01 | Seiko Epson Corporation | Plating tool, plating method, electroplating apparatus, plated product, and method for producing plated product |
| US7498062B2 (en) * | 2004-05-26 | 2009-03-03 | Wd Media, Inc. | Method and apparatus for applying a voltage to a substrate during plating |
-
2004
- 2004-05-26 US US10/853,953 patent/US7498062B2/en not_active Expired - Fee Related
-
2005
- 2005-03-23 US US11/088,052 patent/US20050263401A1/en not_active Abandoned
- 2005-05-23 JP JP2005149681A patent/JP4839017B2/ja not_active Expired - Fee Related
- 2005-05-24 EP EP05011220A patent/EP1600529A3/en not_active Withdrawn
- 2005-05-26 MY MYPI20052384A patent/MY146519A/en unknown
-
2009
- 2009-02-13 US US12/371,397 patent/US7758732B1/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US20050274605A1 (en) | 2005-12-15 |
| US20050263401A1 (en) | 2005-12-01 |
| JP4839017B2 (ja) | 2011-12-14 |
| US7758732B1 (en) | 2010-07-20 |
| JP2005336612A (ja) | 2005-12-08 |
| EP1600529A2 (en) | 2005-11-30 |
| US7498062B2 (en) | 2009-03-03 |
| EP1600529A3 (en) | 2011-01-12 |
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