MY121957A - Lithographic developer and lithographic process. - Google Patents

Lithographic developer and lithographic process.

Info

Publication number
MY121957A
MY121957A MYPI93000187A MYPI9300187A MY121957A MY 121957 A MY121957 A MY 121957A MY PI93000187 A MYPI93000187 A MY PI93000187A MY PI9300187 A MYPI9300187 A MY PI9300187A MY 121957 A MY121957 A MY 121957A
Authority
MY
Malaysia
Prior art keywords
resist
lithographic
developer
dissolving
region
Prior art date
Application number
MYPI93000187A
Other languages
English (en)
Inventor
Tadahiro Ohmi
Hisayuki Shimada
Shigeki Shimomura
Original Assignee
Canon Kk
Tadahiro Ohmi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk, Tadahiro Ohmi filed Critical Canon Kk
Publication of MY121957A publication Critical patent/MY121957A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
MYPI93000187A 1992-02-07 1993-02-05 Lithographic developer and lithographic process. MY121957A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP5708192 1992-02-07
JP4233082A JPH05303208A (ja) 1992-02-07 1992-08-07 リソグラフィ用現像液及びリソグラフィ工程
JP4233080A JPH05303207A (ja) 1992-02-07 1992-08-07 リソグラフィ用現像液及びリソグラフィ工程

Publications (1)

Publication Number Publication Date
MY121957A true MY121957A (en) 2006-03-31

Family

ID=13045534

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI93000187A MY121957A (en) 1992-02-07 1993-02-05 Lithographic developer and lithographic process.

Country Status (4)

Country Link
JP (2) JPH05303208A (enrdf_load_stackoverflow)
KR (1) KR960015482B1 (enrdf_load_stackoverflow)
MY (1) MY121957A (enrdf_load_stackoverflow)
TW (1) TW259850B (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0150146B1 (ko) * 1995-12-20 1998-12-01 김광호 전자사진 현상방식 프린터의 전사전압 자동조절 제어방법
JP4015823B2 (ja) 2001-05-14 2007-11-28 株式会社東芝 アルカリ現像液の製造方法，アルカリ現像液，パターン形成方法，レジスト膜の剥離方法，及び薬液塗布装置
JP5619458B2 (ja) * 2010-03-31 2014-11-05 Hoya株式会社 レジストパターンの形成方法及びモールドの製造方法
JP7357535B2 (ja) * 2019-12-17 2023-10-06 三井化学株式会社 アルキレンオキシド重合体の製造方法
JP7422530B2 (ja) * 2019-12-17 2024-01-26 三井化学株式会社 アルキレンオキシド重合体の曇点測定用溶媒

Also Published As

Publication number Publication date
KR960015482B1 (ko) 1996-11-14
TW259850B (enrdf_load_stackoverflow) 1995-10-11
KR930018651A (ko) 1993-09-22
JPH05303208A (ja) 1993-11-16
JPH05303207A (ja) 1993-11-16

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