KR960015482B1 - 리토그라피용 현상액 및 리토그라피 공정 - Google Patents

리토그라피용 현상액 및 리토그라피 공정 Download PDF

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Publication number
KR960015482B1
KR960015482B1 KR1019930001611A KR930001611A KR960015482B1 KR 960015482 B1 KR960015482 B1 KR 960015482B1 KR 1019930001611 A KR1019930001611 A KR 1019930001611A KR 930001611 A KR930001611 A KR 930001611A KR 960015482 B1 KR960015482 B1 KR 960015482B1
Authority
KR
South Korea
Prior art keywords
surfactant
resist
developer
lithography
molecular weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
KR1019930001611A
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English (en)
Korean (ko)
Other versions
KR930018651A (ko
Inventor
오미타다히로
히사유끼 시마다
시게끼 시모무라
Original Assignee
오미 타다히로
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Publication date
Application filed by 오미 타다히로 filed Critical 오미 타다히로
Publication of KR930018651A publication Critical patent/KR930018651A/ko
Application granted granted Critical
Publication of KR960015482B1 publication Critical patent/KR960015482B1/ko
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1019930001611A 1992-02-07 1993-02-06 리토그라피용 현상액 및 리토그라피 공정 Expired - Lifetime KR960015482B1 (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP92-57081 1992-02-07
JP5708192 1992-02-07
JP92-233080 1992-08-07
JP4233082A JPH05303208A (ja) 1992-02-07 1992-08-07 リソグラフィ用現像液及びリソグラフィ工程
JP4233080A JPH05303207A (ja) 1992-02-07 1992-08-07 リソグラフィ用現像液及びリソグラフィ工程
JP92-233082 1992-08-07

Publications (2)

Publication Number Publication Date
KR930018651A KR930018651A (ko) 1993-09-22
KR960015482B1 true KR960015482B1 (ko) 1996-11-14

Family

ID=13045534

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019930001611A Expired - Lifetime KR960015482B1 (ko) 1992-02-07 1993-02-06 리토그라피용 현상액 및 리토그라피 공정

Country Status (4)

Country Link
JP (2) JPH05303207A (enrdf_load_stackoverflow)
KR (1) KR960015482B1 (enrdf_load_stackoverflow)
MY (1) MY121957A (enrdf_load_stackoverflow)
TW (1) TW259850B (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0150146B1 (ko) * 1995-12-20 1998-12-01 김광호 전자사진 현상방식 프린터의 전사전압 자동조절 제어방법
JP4015823B2 (ja) 2001-05-14 2007-11-28 株式会社東芝 アルカリ現像液の製造方法，アルカリ現像液，パターン形成方法，レジスト膜の剥離方法，及び薬液塗布装置
JP5619458B2 (ja) * 2010-03-31 2014-11-05 Hoya株式会社 レジストパターンの形成方法及びモールドの製造方法
JP7357535B2 (ja) * 2019-12-17 2023-10-06 三井化学株式会社 アルキレンオキシド重合体の製造方法
JP7422530B2 (ja) * 2019-12-17 2024-01-26 三井化学株式会社 アルキレンオキシド重合体の曇点測定用溶媒

Also Published As

Publication number Publication date
MY121957A (en) 2006-03-31
JPH05303208A (ja) 1993-11-16
KR930018651A (ko) 1993-09-22
JPH05303207A (ja) 1993-11-16
TW259850B (enrdf_load_stackoverflow) 1995-10-11

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