SE9302208D0 - Saett vid dekontaminering - Google Patents
Saett vid dekontamineringInfo
- Publication number
- SE9302208D0 SE9302208D0 SE9302208A SE9302208A SE9302208D0 SE 9302208 D0 SE9302208 D0 SE 9302208D0 SE 9302208 A SE9302208 A SE 9302208A SE 9302208 A SE9302208 A SE 9302208A SE 9302208 D0 SE9302208 D0 SE 9302208D0
- Authority
- SE
- Sweden
- Prior art keywords
- surface layer
- decontamination agent
- decontamination
- removal
- deposited
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
- G21F9/001—Decontamination of contaminated objects, apparatus, clothes, food; Preventing contamination thereof
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Food Science & Technology (AREA)
- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
- Cleaning By Liquid Or Steam (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9302208A SE503373C2 (sv) | 1993-06-28 | 1993-06-28 | Sätt vid dekontaminering av ytor i en kärnanläggning |
PCT/SE1994/000637 WO1995000681A1 (en) | 1993-06-28 | 1994-06-28 | Method for decontamination |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9302208A SE503373C2 (sv) | 1993-06-28 | 1993-06-28 | Sätt vid dekontaminering av ytor i en kärnanläggning |
Publications (3)
Publication Number | Publication Date |
---|---|
SE9302208D0 true SE9302208D0 (sv) | 1993-06-28 |
SE9302208L SE9302208L (sv) | 1994-12-29 |
SE503373C2 SE503373C2 (sv) | 1996-06-03 |
Family
ID=20390422
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE9302208A SE503373C2 (sv) | 1993-06-28 | 1993-06-28 | Sätt vid dekontaminering av ytor i en kärnanläggning |
Country Status (2)
Country | Link |
---|---|
SE (1) | SE503373C2 (sv) |
WO (1) | WO1995000681A1 (sv) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5834540A (en) * | 1996-10-01 | 1998-11-10 | Kt Holdings, Llc | Process and composition for soil remediation |
FR2759239B1 (fr) * | 1997-01-31 | 1999-03-05 | Commissariat Energie Atomique | Applicateur de micro-ondes, et son application a la scarification superficielle du beton contamine |
US6714300B1 (en) | 1998-09-28 | 2004-03-30 | Therma-Wave, Inc. | Optical inspection equipment for semiconductor wafers with precleaning |
US6861619B1 (en) | 2000-02-07 | 2005-03-01 | Therma-Wave, Inc. | Method and apparatus for preparing semiconductor wafers for measurement |
US6261853B1 (en) | 2000-02-07 | 2001-07-17 | Therma-Wave, Inc. | Method and apparatus for preparing semiconductor wafers for measurement |
EP2596502B1 (en) * | 2010-07-21 | 2020-03-04 | Atomic Energy of Canada Limited | Reactor decontamination system and process |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH531910A (fr) * | 1970-07-08 | 1972-12-31 | Battelle Memorial Institute | Procédé de décapage de tôle oxydée et installation pour la mise en oeuvre de ce procédé |
JPS63210275A (ja) * | 1987-02-24 | 1988-08-31 | Semiconductor Energy Lab Co Ltd | プラズマ反応装置内を清浄にする方法 |
US5261965A (en) * | 1992-08-28 | 1993-11-16 | Texas Instruments Incorporated | Semiconductor wafer cleaning using condensed-phase processing |
-
1993
- 1993-06-28 SE SE9302208A patent/SE503373C2/sv not_active IP Right Cessation
-
1994
- 1994-06-28 WO PCT/SE1994/000637 patent/WO1995000681A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO1995000681A1 (en) | 1995-01-05 |
SE9302208L (sv) | 1994-12-29 |
SE503373C2 (sv) | 1996-06-03 |
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Legal Events
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NUG | Patent has lapsed |
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