SE9302208D0 - DISCONTINUED - Google Patents
DISCONTINUEDInfo
- Publication number
- SE9302208D0 SE9302208D0 SE9302208A SE9302208A SE9302208D0 SE 9302208 D0 SE9302208 D0 SE 9302208D0 SE 9302208 A SE9302208 A SE 9302208A SE 9302208 A SE9302208 A SE 9302208A SE 9302208 D0 SE9302208 D0 SE 9302208D0
- Authority
- SE
- Sweden
- Prior art keywords
- surface layer
- decontamination agent
- decontamination
- removal
- deposited
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
- G21F9/001—Decontamination of contaminated objects, apparatus, clothes, food; Preventing contamination thereof
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Food Science & Technology (AREA)
- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
Decontamination by removal of a surface layer, generated or deposited on a material surface, wherein a decontamination agent is applied to said surface layer and a microwave field is applied to act on said deposited surface layer and the decontamination agent applied thereto to improve the penetration of the decontamination agent, the disintegration and at least partial dissolution as well as the removal of the surface layer, and to shorten the treatment time with a low addition of decontamination agent.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9302208A SE503373C2 (en) | 1993-06-28 | 1993-06-28 | When decontaminating surfaces in a nuclear plant |
PCT/SE1994/000637 WO1995000681A1 (en) | 1993-06-28 | 1994-06-28 | Method for decontamination |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9302208A SE503373C2 (en) | 1993-06-28 | 1993-06-28 | When decontaminating surfaces in a nuclear plant |
Publications (3)
Publication Number | Publication Date |
---|---|
SE9302208D0 true SE9302208D0 (en) | 1993-06-28 |
SE9302208L SE9302208L (en) | 1994-12-29 |
SE503373C2 SE503373C2 (en) | 1996-06-03 |
Family
ID=20390422
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE9302208A SE503373C2 (en) | 1993-06-28 | 1993-06-28 | When decontaminating surfaces in a nuclear plant |
Country Status (2)
Country | Link |
---|---|
SE (1) | SE503373C2 (en) |
WO (1) | WO1995000681A1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5834540A (en) * | 1996-10-01 | 1998-11-10 | Kt Holdings, Llc | Process and composition for soil remediation |
FR2759239B1 (en) * | 1997-01-31 | 1999-03-05 | Commissariat Energie Atomique | MICROWAVE APPLICATOR, AND ITS APPLICATION TO THE SURFACE SCARIFICATION OF CONTAMINATED CONCRETE |
US6714300B1 (en) | 1998-09-28 | 2004-03-30 | Therma-Wave, Inc. | Optical inspection equipment for semiconductor wafers with precleaning |
US6861619B1 (en) | 2000-02-07 | 2005-03-01 | Therma-Wave, Inc. | Method and apparatus for preparing semiconductor wafers for measurement |
US6261853B1 (en) | 2000-02-07 | 2001-07-17 | Therma-Wave, Inc. | Method and apparatus for preparing semiconductor wafers for measurement |
EP2596502B1 (en) * | 2010-07-21 | 2020-03-04 | Atomic Energy of Canada Limited | Reactor decontamination system and process |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH531910A (en) * | 1970-07-08 | 1972-12-31 | Battelle Memorial Institute | Oxidized sheet metal pickling process and installation for implementing this process |
JPS63210275A (en) * | 1987-02-24 | 1988-08-31 | Semiconductor Energy Lab Co Ltd | Method for removing unnecessary carbon matter in apparatus for producing carbon |
US5261965A (en) * | 1992-08-28 | 1993-11-16 | Texas Instruments Incorporated | Semiconductor wafer cleaning using condensed-phase processing |
-
1993
- 1993-06-28 SE SE9302208A patent/SE503373C2/en not_active IP Right Cessation
-
1994
- 1994-06-28 WO PCT/SE1994/000637 patent/WO1995000681A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
SE503373C2 (en) | 1996-06-03 |
SE9302208L (en) | 1994-12-29 |
WO1995000681A1 (en) | 1995-01-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
NUG | Patent has lapsed |
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