MXPA06013380A - Deposito mejorado de plasma de vapor quimico de oxido de metal. - Google Patents

Deposito mejorado de plasma de vapor quimico de oxido de metal.

Info

Publication number
MXPA06013380A
MXPA06013380A MXPA06013380A MXPA06013380A MXPA06013380A MX PA06013380 A MXPA06013380 A MX PA06013380A MX PA06013380 A MXPA06013380 A MX PA06013380A MX PA06013380 A MXPA06013380 A MX PA06013380A MX PA06013380 A MXPA06013380 A MX PA06013380A
Authority
MX
Mexico
Prior art keywords
metal oxide
precursor
substrate
oxide
zinc
Prior art date
Application number
MXPA06013380A
Other languages
English (en)
Spanish (es)
Inventor
Dmitry P Dinega
Christopher M Weikart
Original Assignee
Dow Global Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Global Technologies Inc filed Critical Dow Global Technologies Inc
Publication of MXPA06013380A publication Critical patent/MXPA06013380A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Laminated Bodies (AREA)
MXPA06013380A 2004-05-20 2005-05-20 Deposito mejorado de plasma de vapor quimico de oxido de metal. MXPA06013380A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US57281304P 2004-05-20 2004-05-20
PCT/US2005/017747 WO2005113856A1 (en) 2004-05-20 2005-05-20 Plasma enhanced chemical vapor deposition of metal oxide

Publications (1)

Publication Number Publication Date
MXPA06013380A true MXPA06013380A (es) 2007-01-23

Family

ID=34970263

Family Applications (1)

Application Number Title Priority Date Filing Date
MXPA06013380A MXPA06013380A (es) 2004-05-20 2005-05-20 Deposito mejorado de plasma de vapor quimico de oxido de metal.

Country Status (10)

Country Link
EP (1) EP1756329A1 (ko)
JP (1) JP2007538159A (ko)
KR (1) KR20070012718A (ko)
CN (1) CN1957109A (ko)
BR (1) BRPI0510823A (ko)
CA (1) CA2562914A1 (ko)
MX (1) MXPA06013380A (ko)
RU (1) RU2006145309A (ko)
SG (1) SG151324A1 (ko)
WO (1) WO2005113856A1 (ko)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009536144A (ja) * 2006-05-05 2009-10-08 ピルキングトン・グループ・リミテッド 基板上に酸化亜鉛コーティングを堆積させる方法
US9950481B2 (en) * 2007-05-01 2018-04-24 Exatec Llc Edge healing and field repair of plasma coating
DE102007025151A1 (de) * 2007-05-29 2008-09-04 Innovent E.V. Verfahren zum Beschichten eines Substrats
EP2145978A1 (fr) 2008-07-16 2010-01-20 AGC Flat Glass Europe SA Procédé et installation pour le dépôt de couches sur un substrat
EP2145979A1 (fr) 2008-07-16 2010-01-20 AGC Flat Glass Europe SA Procédé et installation pour le dépôt de couches sur les deux faces d'un substrat de façon simultanée
ES2335638B1 (es) * 2008-08-01 2011-02-09 Cosentino, S.A. Articulo en forma de tabla o losa fabricado de aglomerado petreo recubierto con laminas delgadas transparentes de tio2 o zno mediante tecnicas de deposicion en via seca con alta resistencia frente a la degradacion solar.
JP2010250088A (ja) * 2009-04-16 2010-11-04 Konica Minolta Business Technologies Inc 中間転写体、中間転写体の製造方法、及び画像形成装置
KR101133250B1 (ko) * 2009-09-29 2012-04-05 부산대학교 산학협력단 상압 플라즈마 표면처리된 폴리머 기판을 이용한 투명전극의 제조방법
DE102012003943B4 (de) * 2012-02-24 2017-09-14 Innovent E.V. Technologieentwicklung Verfahren zur Herstellung antibakterieller Nanoschichten auf Fäden oder textilen Materialien in Form von Gewebe, Gewirke oder Vlies, nach diesem Verfahren hergestelltes Erzeugnis und dessen Verwendung
DE102014118487A1 (de) * 2014-12-12 2016-06-16 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Abscheiden eines transparenten Mehrschichtsystems mit Kratzschutzeigenschaften

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6457767A (en) * 1987-08-28 1989-03-06 Seiko Epson Corp Josephson effect element
WO1993013172A1 (en) * 1991-12-23 1993-07-08 Akzo Nobel N.V. Blend of polyethylene terephthalate matrix and thermotropic liquid crystal block copolymer
JP4024546B2 (ja) * 2002-01-25 2007-12-19 住友ベークライト株式会社 無機薄膜付きフィルムの製造方法
GB0217553D0 (en) * 2002-07-30 2002-09-11 Sheel David W Titania coatings by CVD at atmospheric pressure

Also Published As

Publication number Publication date
RU2006145309A (ru) 2008-06-27
CA2562914A1 (en) 2005-12-01
SG151324A1 (en) 2009-04-30
EP1756329A1 (en) 2007-02-28
KR20070012718A (ko) 2007-01-26
JP2007538159A (ja) 2007-12-27
BRPI0510823A (pt) 2007-12-26
WO2005113856A1 (en) 2005-12-01
CN1957109A (zh) 2007-05-02

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