RU2006145309A - Химическое осаждение пара оксида металла, усиленное плазмой - Google Patents
Химическое осаждение пара оксида металла, усиленное плазмой Download PDFInfo
- Publication number
- RU2006145309A RU2006145309A RU2006145309/02A RU2006145309A RU2006145309A RU 2006145309 A RU2006145309 A RU 2006145309A RU 2006145309/02 A RU2006145309/02 A RU 2006145309/02A RU 2006145309 A RU2006145309 A RU 2006145309A RU 2006145309 A RU2006145309 A RU 2006145309A
- Authority
- RU
- Russia
- Prior art keywords
- metal oxide
- precursor
- oxide
- substrate
- plasma
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Vapour Deposition (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Laminated Bodies (AREA)
Claims (13)
1. Способ, включающий стадии 1) проведения предшественника оксида металла через коронный разряд или диэлектрический барьерный разряд в присутствии воздуха в качестве окисляющего агента для превращения предшественника в оксид металла усиленным плазмой химическим осаждением пара, и 2) отложения оксида металла на субстрат.
2. Способ по п.1, где предшественник оксида металла проводят через коронный разряд при атмосферном давлении или давлении, близком к нему.
3. Способ по п.2, где субстрат представляет собой пластик, который нагревается до температуры, не превышающей его Tg более чем на 50°С.
4. Способ по п.3, где предшественник оксида металла выбран из группы, состоящей из диэтилцинка, диметилцинка, ацетата цинка, тетрахлорида титана, диацетата диметилолова, ацетилацетоната цинка, гексафторацетилацетоната циркония, триметилиндия, триэтилиндия, церия (IV) (2,2,6,6-тетраметил-3,5-гептандионата) и карбамата цинка.
5. Способ по п.3, где предшественник оксида металла выбран из группы, состоящей из диэтилцинка, тетрахлорида титана, триметилиндия и диацетата диметилолова.
6. Способ по п.3, где инертный газ-носитель используется для предшественника.
7. Способ по п.6, где инертный газ-носитель представляет собой азот.
8. Способ по п.2, где предшественник оксида металла выбран из группы, состоящей из оксида цинка, оксида титана, оксида олова, оксида циркония и оксида церия.
9. Способ по п.2, где оксид металла представляет собой оксид индия-олова.
10. Способ отложения покрытия оксида металла на пластиковый субстрат, включающий стадии 1) проведения оксида металла и окисляющего агента, который представляет собой воздух, через коронный разряд для превращения усиленным плазмой химическим осаждением пара предшественника в оксид металла и 2) отложения оксида металла на пластиковый субстрат, где разряд поддерживается при атмосферном давлении или давлении, близком к нему, а субстрат нагревается до температуры, не превышающей его Tg более чем на 50°С.
11. Способ по п.9, где оксид металла осаждается одновременно или последовательно с усиленным плазмой химическим осаждением пара другого минерала на пластиковый субстрат.
12. Изделие, изготовленное способом по п.11.
13. Изделие по п.12, где другой материал представляет собой отложение органосилоксана или SiOx.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US57281304P | 2004-05-20 | 2004-05-20 | |
| US60/572,813 | 2004-05-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| RU2006145309A true RU2006145309A (ru) | 2008-06-27 |
Family
ID=34970263
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RU2006145309/02A RU2006145309A (ru) | 2004-05-20 | 2005-05-20 | Химическое осаждение пара оксида металла, усиленное плазмой |
Country Status (10)
| Country | Link |
|---|---|
| EP (1) | EP1756329A1 (ru) |
| JP (1) | JP2007538159A (ru) |
| KR (1) | KR20070012718A (ru) |
| CN (1) | CN1957109A (ru) |
| BR (1) | BRPI0510823A (ru) |
| CA (1) | CA2562914A1 (ru) |
| MX (1) | MXPA06013380A (ru) |
| RU (1) | RU2006145309A (ru) |
| SG (1) | SG151324A1 (ru) |
| WO (1) | WO2005113856A1 (ru) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007130448A2 (en) * | 2006-05-05 | 2007-11-15 | Pilkington Group Limited | Method of depositing zinc oxide coatings on a substrate |
| ATE547236T1 (de) * | 2007-05-01 | 2012-03-15 | Exatec Llc | Kantensanierung und in-situ-reparatur einer plasmabeschichtung |
| DE102007025151A1 (de) * | 2007-05-29 | 2008-09-04 | Innovent E.V. | Verfahren zum Beschichten eines Substrats |
| EP2145978A1 (fr) | 2008-07-16 | 2010-01-20 | AGC Flat Glass Europe SA | Procédé et installation pour le dépôt de couches sur un substrat |
| EP2145979A1 (fr) | 2008-07-16 | 2010-01-20 | AGC Flat Glass Europe SA | Procédé et installation pour le dépôt de couches sur les deux faces d'un substrat de façon simultanée |
| ES2335638B1 (es) * | 2008-08-01 | 2011-02-09 | Cosentino, S.A. | Articulo en forma de tabla o losa fabricado de aglomerado petreo recubierto con laminas delgadas transparentes de tio2 o zno mediante tecnicas de deposicion en via seca con alta resistencia frente a la degradacion solar. |
| JP2010250088A (ja) * | 2009-04-16 | 2010-11-04 | Konica Minolta Business Technologies Inc | 中間転写体、中間転写体の製造方法、及び画像形成装置 |
| KR101133250B1 (ko) * | 2009-09-29 | 2012-04-05 | 부산대학교 산학협력단 | 상압 플라즈마 표면처리된 폴리머 기판을 이용한 투명전극의 제조방법 |
| DE102012003943B4 (de) * | 2012-02-24 | 2017-09-14 | Innovent E.V. Technologieentwicklung | Verfahren zur Herstellung antibakterieller Nanoschichten auf Fäden oder textilen Materialien in Form von Gewebe, Gewirke oder Vlies, nach diesem Verfahren hergestelltes Erzeugnis und dessen Verwendung |
| DE102014118487A1 (de) * | 2014-12-12 | 2016-06-16 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum Abscheiden eines transparenten Mehrschichtsystems mit Kratzschutzeigenschaften |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6457767A (en) * | 1987-08-28 | 1989-03-06 | Seiko Epson Corp | Josephson effect element |
| JPH07506850A (ja) * | 1991-12-23 | 1995-07-27 | アクゾ ノーベル ナムローゼ フェンノートシャップ | ポリエチレンテレフタレートマトリックス及びサーモトロピック液晶ブロックコポリマーのブレンド |
| JP4024546B2 (ja) * | 2002-01-25 | 2007-12-19 | 住友ベークライト株式会社 | 無機薄膜付きフィルムの製造方法 |
| GB0217553D0 (en) * | 2002-07-30 | 2002-09-11 | Sheel David W | Titania coatings by CVD at atmospheric pressure |
-
2005
- 2005-05-20 MX MXPA06013380A patent/MXPA06013380A/es unknown
- 2005-05-20 RU RU2006145309/02A patent/RU2006145309A/ru unknown
- 2005-05-20 BR BRPI0510823-3A patent/BRPI0510823A/pt not_active Application Discontinuation
- 2005-05-20 WO PCT/US2005/017747 patent/WO2005113856A1/en active Application Filing
- 2005-05-20 CN CNA2005800162132A patent/CN1957109A/zh active Pending
- 2005-05-20 CA CA002562914A patent/CA2562914A1/en not_active Abandoned
- 2005-05-20 KR KR1020067024137A patent/KR20070012718A/ko not_active Application Discontinuation
- 2005-05-20 SG SG200902158-5A patent/SG151324A1/en unknown
- 2005-05-20 EP EP05747858A patent/EP1756329A1/en not_active Withdrawn
- 2005-05-20 JP JP2007527479A patent/JP2007538159A/ja not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| CA2562914A1 (en) | 2005-12-01 |
| KR20070012718A (ko) | 2007-01-26 |
| BRPI0510823A (pt) | 2007-12-26 |
| SG151324A1 (en) | 2009-04-30 |
| MXPA06013380A (es) | 2007-01-23 |
| WO2005113856A1 (en) | 2005-12-01 |
| CN1957109A (zh) | 2007-05-02 |
| JP2007538159A (ja) | 2007-12-27 |
| EP1756329A1 (en) | 2007-02-28 |
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