MXPA06013380A - Deposito mejorado de plasma de vapor quimico de oxido de metal. - Google Patents
Deposito mejorado de plasma de vapor quimico de oxido de metal.Info
- Publication number
- MXPA06013380A MXPA06013380A MXPA06013380A MXPA06013380A MXPA06013380A MX PA06013380 A MXPA06013380 A MX PA06013380A MX PA06013380 A MXPA06013380 A MX PA06013380A MX PA06013380 A MXPA06013380 A MX PA06013380A MX PA06013380 A MXPA06013380 A MX PA06013380A
- Authority
- MX
- Mexico
- Prior art keywords
- metal oxide
- precursor
- substrate
- oxide
- zinc
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Vapour Deposition (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US57281304P | 2004-05-20 | 2004-05-20 | |
PCT/US2005/017747 WO2005113856A1 (en) | 2004-05-20 | 2005-05-20 | Plasma enhanced chemical vapor deposition of metal oxide |
Publications (1)
Publication Number | Publication Date |
---|---|
MXPA06013380A true MXPA06013380A (es) | 2007-01-23 |
Family
ID=34970263
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MXPA06013380A MXPA06013380A (es) | 2004-05-20 | 2005-05-20 | Deposito mejorado de plasma de vapor quimico de oxido de metal. |
Country Status (10)
Country | Link |
---|---|
EP (1) | EP1756329A1 (ru) |
JP (1) | JP2007538159A (ru) |
KR (1) | KR20070012718A (ru) |
CN (1) | CN1957109A (ru) |
BR (1) | BRPI0510823A (ru) |
CA (1) | CA2562914A1 (ru) |
MX (1) | MXPA06013380A (ru) |
RU (1) | RU2006145309A (ru) |
SG (1) | SG151324A1 (ru) |
WO (1) | WO2005113856A1 (ru) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BRPI0711292A2 (pt) * | 2006-05-05 | 2011-08-23 | Arkema Inc | processo de deposição quìmica em fase de vapor para deposição de um revestimento de óxido de zinco sobre um substrato contìnuo de vidro aquecido durante um processo de fabricação de vidro float |
US9950481B2 (en) * | 2007-05-01 | 2018-04-24 | Exatec Llc | Edge healing and field repair of plasma coating |
DE102007025151A1 (de) * | 2007-05-29 | 2008-09-04 | Innovent E.V. | Verfahren zum Beschichten eines Substrats |
EP2145978A1 (fr) | 2008-07-16 | 2010-01-20 | AGC Flat Glass Europe SA | Procédé et installation pour le dépôt de couches sur un substrat |
EP2145979A1 (fr) | 2008-07-16 | 2010-01-20 | AGC Flat Glass Europe SA | Procédé et installation pour le dépôt de couches sur les deux faces d'un substrat de façon simultanée |
ES2335638B1 (es) * | 2008-08-01 | 2011-02-09 | Cosentino, S.A. | Articulo en forma de tabla o losa fabricado de aglomerado petreo recubierto con laminas delgadas transparentes de tio2 o zno mediante tecnicas de deposicion en via seca con alta resistencia frente a la degradacion solar. |
JP2010250088A (ja) * | 2009-04-16 | 2010-11-04 | Konica Minolta Business Technologies Inc | 中間転写体、中間転写体の製造方法、及び画像形成装置 |
KR101133250B1 (ko) * | 2009-09-29 | 2012-04-05 | 부산대학교 산학협력단 | 상압 플라즈마 표면처리된 폴리머 기판을 이용한 투명전극의 제조방법 |
DE102012003943B4 (de) * | 2012-02-24 | 2017-09-14 | Innovent E.V. Technologieentwicklung | Verfahren zur Herstellung antibakterieller Nanoschichten auf Fäden oder textilen Materialien in Form von Gewebe, Gewirke oder Vlies, nach diesem Verfahren hergestelltes Erzeugnis und dessen Verwendung |
DE102014118487A1 (de) * | 2014-12-12 | 2016-06-16 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum Abscheiden eines transparenten Mehrschichtsystems mit Kratzschutzeigenschaften |
WO2024126566A1 (en) | 2022-12-14 | 2024-06-20 | Basf Coatings Gmbh | Multilayer barrier film coated polymeric substrate, its manufacture and use in electronic devices |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6457767A (en) * | 1987-08-28 | 1989-03-06 | Seiko Epson Corp | Josephson effect element |
JPH07506850A (ja) * | 1991-12-23 | 1995-07-27 | アクゾ ノーベル ナムローゼ フェンノートシャップ | ポリエチレンテレフタレートマトリックス及びサーモトロピック液晶ブロックコポリマーのブレンド |
JP4024546B2 (ja) * | 2002-01-25 | 2007-12-19 | 住友ベークライト株式会社 | 無機薄膜付きフィルムの製造方法 |
GB0217553D0 (en) * | 2002-07-30 | 2002-09-11 | Sheel David W | Titania coatings by CVD at atmospheric pressure |
-
2005
- 2005-05-20 KR KR1020067024137A patent/KR20070012718A/ko not_active Application Discontinuation
- 2005-05-20 SG SG200902158-5A patent/SG151324A1/en unknown
- 2005-05-20 CN CNA2005800162132A patent/CN1957109A/zh active Pending
- 2005-05-20 CA CA002562914A patent/CA2562914A1/en not_active Abandoned
- 2005-05-20 RU RU2006145309/02A patent/RU2006145309A/ru unknown
- 2005-05-20 MX MXPA06013380A patent/MXPA06013380A/es unknown
- 2005-05-20 BR BRPI0510823-3A patent/BRPI0510823A/pt not_active Application Discontinuation
- 2005-05-20 JP JP2007527479A patent/JP2007538159A/ja not_active Withdrawn
- 2005-05-20 WO PCT/US2005/017747 patent/WO2005113856A1/en active Application Filing
- 2005-05-20 EP EP05747858A patent/EP1756329A1/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
CN1957109A (zh) | 2007-05-02 |
BRPI0510823A (pt) | 2007-12-26 |
SG151324A1 (en) | 2009-04-30 |
CA2562914A1 (en) | 2005-12-01 |
KR20070012718A (ko) | 2007-01-26 |
EP1756329A1 (en) | 2007-02-28 |
RU2006145309A (ru) | 2008-06-27 |
JP2007538159A (ja) | 2007-12-27 |
WO2005113856A1 (en) | 2005-12-01 |
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