JP2007538159A - 金属酸化物のプラズマ強化化学蒸着 - Google Patents

金属酸化物のプラズマ強化化学蒸着 Download PDF

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Publication number
JP2007538159A
JP2007538159A JP2007527479A JP2007527479A JP2007538159A JP 2007538159 A JP2007538159 A JP 2007538159A JP 2007527479 A JP2007527479 A JP 2007527479A JP 2007527479 A JP2007527479 A JP 2007527479A JP 2007538159 A JP2007538159 A JP 2007538159A
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Japan
Prior art keywords
oxide
metal
precursor
substrate
zinc
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JP2007527479A
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English (en)
Japanese (ja)
Inventor
ピー． ディネガ，ドミトリー
エム． ウェイカート，クリストファー
Original Assignee
ダウ グローバル テクノロジーズ インコーポレイティド
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Publication of JP2007538159A publication Critical patent/JP2007538159A/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Laminated Bodies (AREA)
JP2007527479A 2004-05-20 2005-05-20 金属酸化物のプラズマ強化化学蒸着 Withdrawn JP2007538159A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US57281304P 2004-05-20 2004-05-20
PCT/US2005/017747 WO2005113856A1 (en) 2004-05-20 2005-05-20 Plasma enhanced chemical vapor deposition of metal oxide

Publications (1)

Publication Number Publication Date
JP2007538159A true JP2007538159A (ja) 2007-12-27

Family

ID=34970263

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007527479A Withdrawn JP2007538159A (ja) 2004-05-20 2005-05-20 金属酸化物のプラズマ強化化学蒸着

Country Status (10)

Country Link
EP (1) EP1756329A1 (ko)
JP (1) JP2007538159A (ko)
KR (1) KR20070012718A (ko)
CN (1) CN1957109A (ko)
BR (1) BRPI0510823A (ko)
CA (1) CA2562914A1 (ko)
MX (1) MXPA06013380A (ko)
RU (1) RU2006145309A (ko)
SG (1) SG151324A1 (ko)
WO (1) WO2005113856A1 (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010526210A (ja) * 2007-05-01 2010-07-29 エクスアテック、エル．エル．シー． プラズマコーティングのエッジヒーリング及び現場修復
JP2016113698A (ja) * 2014-12-12 2016-06-23 フラウンホーファー−ゲゼルシャフト ツル フェルデルング デル アンゲヴァンテン フォルシュング エー ファウＦｒａｕｎｈｏｆｅｒ−Ｇｅｓｅｌｌｓｃｈａｆｔ ｚｕｒ Ｆｏｅｒｄｅｒｕｎｇ ｄｅｒ ａｎｇｅｗａｎｄｔｅｎ Ｆｏｒｓｃｈｕｎｇ ｅ．Ｖ． 耐引掻特性を有する透明な多層系の堆積方法

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2024291A2 (en) * 2006-05-05 2009-02-18 Pilkington Group Limited Method of depositing zinc oxide coatings on a substrate
DE102007025151A1 (de) * 2007-05-29 2008-09-04 Innovent E.V. Verfahren zum Beschichten eines Substrats
EP2145979A1 (fr) 2008-07-16 2010-01-20 AGC Flat Glass Europe SA Procédé et installation pour le dépôt de couches sur les deux faces d'un substrat de façon simultanée
EP2145978A1 (fr) 2008-07-16 2010-01-20 AGC Flat Glass Europe SA Procédé et installation pour le dépôt de couches sur un substrat
ES2335638B1 (es) * 2008-08-01 2011-02-09 Cosentino, S.A. Articulo en forma de tabla o losa fabricado de aglomerado petreo recubierto con laminas delgadas transparentes de tio2 o zno mediante tecnicas de deposicion en via seca con alta resistencia frente a la degradacion solar.
JP2010250088A (ja) * 2009-04-16 2010-11-04 Konica Minolta Business Technologies Inc 中間転写体、中間転写体の製造方法、及び画像形成装置
KR101133250B1 (ko) * 2009-09-29 2012-04-05 부산대학교 산학협력단 상압 플라즈마 표면처리된 폴리머 기판을 이용한 투명전극의 제조방법
DE102012003943B4 (de) * 2012-02-24 2017-09-14 Innovent E.V. Technologieentwicklung Verfahren zur Herstellung antibakterieller Nanoschichten auf Fäden oder textilen Materialien in Form von Gewebe, Gewirke oder Vlies, nach diesem Verfahren hergestelltes Erzeugnis und dessen Verwendung
WO2024126566A1 (en) 2022-12-14 2024-06-20 Basf Coatings Gmbh Multilayer barrier film coated polymeric substrate, its manufacture and use in electronic devices

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6457767A (en) * 1987-08-28 1989-03-06 Seiko Epson Corp Josephson effect element
WO1993013172A1 (en) * 1991-12-23 1993-07-08 Akzo Nobel N.V. Blend of polyethylene terephthalate matrix and thermotropic liquid crystal block copolymer
JP4024546B2 (ja) * 2002-01-25 2007-12-19 住友ベークライト株式会社 無機薄膜付きフィルムの製造方法
GB0217553D0 (en) * 2002-07-30 2002-09-11 Sheel David W Titania coatings by CVD at atmospheric pressure

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010526210A (ja) * 2007-05-01 2010-07-29 エクスアテック、エル．エル．シー． プラズマコーティングのエッジヒーリング及び現場修復
JP2016113698A (ja) * 2014-12-12 2016-06-23 フラウンホーファー−ゲゼルシャフト ツル フェルデルング デル アンゲヴァンテン フォルシュング エー ファウＦｒａｕｎｈｏｆｅｒ−Ｇｅｓｅｌｌｓｃｈａｆｔ ｚｕｒ Ｆｏｅｒｄｅｒｕｎｇ ｄｅｒ ａｎｇｅｗａｎｄｔｅｎ Ｆｏｒｓｃｈｕｎｇ ｅ．Ｖ． 耐引掻特性を有する透明な多層系の堆積方法

Also Published As

Publication number Publication date
WO2005113856A1 (en) 2005-12-01
CA2562914A1 (en) 2005-12-01
RU2006145309A (ru) 2008-06-27
BRPI0510823A (pt) 2007-12-26
MXPA06013380A (es) 2007-01-23
KR20070012718A (ko) 2007-01-26
SG151324A1 (en) 2009-04-30
CN1957109A (zh) 2007-05-02
EP1756329A1 (en) 2007-02-28

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