MX2021014264A - Revestimientos de pvd que comprenden oxinitruros de aleacion de alta entropia multianionicos. - Google Patents

Revestimientos de pvd que comprenden oxinitruros de aleacion de alta entropia multianionicos.

Info

Publication number
MX2021014264A
MX2021014264A MX2021014264A MX2021014264A MX2021014264A MX 2021014264 A MX2021014264 A MX 2021014264A MX 2021014264 A MX2021014264 A MX 2021014264A MX 2021014264 A MX2021014264 A MX 2021014264A MX 2021014264 A MX2021014264 A MX 2021014264A
Authority
MX
Mexico
Prior art keywords
multianionic
entropy alloy
high entropy
pvd coatings
elements
Prior art date
Application number
MX2021014264A
Other languages
English (en)
Spanish (es)
Inventor
Doris Fopp-Spori
Siva Phani Kumar Yalamanchili
Helmut Rudigier
Original Assignee
Oerlikon Surface Solutions Ag Pfaeffikon
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Surface Solutions Ag Pfaeffikon filed Critical Oerlikon Surface Solutions Ag Pfaeffikon
Publication of MX2021014264A publication Critical patent/MX2021014264A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0676—Oxynitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • C23C14/345—Applying energy to the substrate during sputtering using substrate bias
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
MX2021014264A 2019-05-21 2020-05-25 Revestimientos de pvd que comprenden oxinitruros de aleacion de alta entropia multianionicos. MX2021014264A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201962850737P 2019-05-21 2019-05-21
PCT/EP2020/064441 WO2020234484A1 (en) 2019-05-21 2020-05-25 Pvd coatings comprising multi-anion high entropy alloy oxy-nitrides

Publications (1)

Publication Number Publication Date
MX2021014264A true MX2021014264A (es) 2022-01-06

Family

ID=73459582

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2021014264A MX2021014264A (es) 2019-05-21 2020-05-25 Revestimientos de pvd que comprenden oxinitruros de aleacion de alta entropia multianionicos.

Country Status (8)

Country Link
US (1) US20220220601A1 (enExample)
EP (1) EP3973086A1 (enExample)
JP (1) JP7679312B2 (enExample)
KR (1) KR20220010026A (enExample)
CN (1) CN113966408B (enExample)
CA (1) CA3140095A1 (enExample)
MX (1) MX2021014264A (enExample)
WO (1) WO2020234484A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114642363B (zh) * 2020-12-21 2025-05-27 武汉苏泊尔炊具有限公司 锅具和煮食设备
CN112899629B (zh) * 2021-01-18 2022-07-19 南宁师范大学 一种高熵氧化物薄膜及其制备方法和应用
US20250205789A1 (en) * 2022-03-30 2025-06-26 Mitsubishi Materials Corporation Surface-coated cutting tool
CN114934258B (zh) * 2022-05-24 2024-03-22 河南科技学院 一种SiAlON涂层的制备方法
CN114875360B (zh) * 2022-05-24 2024-03-22 河南科技学院 一种抗高温氧化的NiAl/AlSiON多层复合涂层及制备方法
CN114990509B (zh) * 2022-06-15 2024-07-12 西安热工研究院有限公司 一种中熵合金涂层的强化方法
CN117305787B (zh) * 2023-09-28 2024-06-18 郑州大学 高熵涂层和原位锆硅扩散层的多层协同防护体系、制备方法及应用

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5060714B2 (ja) * 2004-09-30 2012-10-31 株式会社神戸製鋼所 耐摩耗性および耐酸化性に優れた硬質皮膜、並びに該硬質皮膜形成用ターゲット
SE529161C2 (sv) * 2005-06-22 2007-05-22 Seco Tools Ab Skärverktyg med kompositbeläggning för finbearbetning av härdade stål
JP4713413B2 (ja) * 2006-06-30 2011-06-29 株式会社神戸製鋼所 硬質皮膜およびその製造方法
KR20090052174A (ko) * 2007-11-20 2009-05-25 아이시스(주) 확산박막 증착 방법 및 장치
CN105671404B (zh) * 2014-11-19 2017-11-03 北京科技大学 一种氮氧共合金化的TiZrHfNb基高熵合金及其制备方法
US10280312B2 (en) * 2016-07-20 2019-05-07 Guardian Glass, LLC Coated article supporting high-entropy nitride and/or oxide thin film inclusive coating, and/or method of making the same
TWI607880B (zh) * 2016-11-04 2017-12-11 國立清華大學 多層膜結構
KR101955370B1 (ko) * 2017-10-20 2019-03-07 충남대학교산학협력단 코발트크롬철망간니켈 질산화물 고엔트로피 합금 및 상기 박막의 제조방법
JP2022505795A (ja) 2018-10-26 2022-01-14 エリコン・サーフェス・ソリューションズ・アクチェンゲゼルシャフト，プフェフィコーン 制御された析出物構造を有するｈｅａセラミック母材を有するｐｖｄコーティング

Also Published As

Publication number Publication date
EP3973086A1 (en) 2022-03-30
CN113966408A (zh) 2022-01-21
BR112021023386A2 (pt) 2022-02-01
JP7679312B2 (ja) 2025-05-19
WO2020234484A1 (en) 2020-11-26
CA3140095A1 (en) 2020-11-26
US20220220601A1 (en) 2022-07-14
CN113966408B (zh) 2024-05-03
KR20220010026A (ko) 2022-01-25
JP2022533738A (ja) 2022-07-25

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