JP7679312B2 - マルチアニオン高エントロピー合金酸窒化物を含むｐｖｄコーティング - Google Patents

マルチアニオン高エントロピー合金酸窒化物を含むｐｖｄコーティング Download PDF

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JP7679312B2
JP7679312B2 JP2021569207A JP2021569207A JP7679312B2 JP 7679312 B2 JP7679312 B2 JP 7679312B2 JP 2021569207 A JP2021569207 A JP 2021569207A JP 2021569207 A JP2021569207 A JP 2021569207A JP 7679312 B2 JP7679312 B2 JP 7679312B2
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elements
coating
hea
lattice
pvd
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JP2022533738A (ja
JPWO2020234484A5 (enExample
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ヤラマンチリ，シバ・ファニ・クマール
ルディジェル，ヘルムート
フォップ－シュポリ，ドーリス
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Oerlikon Surface Solutions AG Pfaeffikon
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Oerlikon Surface Solutions AG Pfaeffikon
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0676—Oxynitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • C23C14/345—Applying energy to the substrate during sputtering using substrate bias
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP2021569207A 2019-05-21 2020-05-25 マルチアニオン高エントロピー合金酸窒化物を含むｐｖｄコーティング Active JP7679312B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201962850737P 2019-05-21 2019-05-21
US62/850,737 2019-05-21
PCT/EP2020/064441 WO2020234484A1 (en) 2019-05-21 2020-05-25 Pvd coatings comprising multi-anion high entropy alloy oxy-nitrides

Publications (3)

Publication Number Publication Date
JP2022533738A JP2022533738A (ja) 2022-07-25
JPWO2020234484A5 JPWO2020234484A5 (enExample) 2023-03-31
JP7679312B2 true JP7679312B2 (ja) 2025-05-19

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Country Link
US (1) US20220220601A1 (enExample)
EP (1) EP3973086A1 (enExample)
JP (1) JP7679312B2 (enExample)
KR (1) KR20220010026A (enExample)
CN (1) CN113966408B (enExample)
CA (1) CA3140095A1 (enExample)
MX (1) MX2021014264A (enExample)
WO (1) WO2020234484A1 (enExample)

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CN114642363B (zh) * 2020-12-21 2025-05-27 武汉苏泊尔炊具有限公司 锅具和煮食设备
CN112899629B (zh) * 2021-01-18 2022-07-19 南宁师范大学 一种高熵氧化物薄膜及其制备方法和应用
CN119053397A (zh) * 2022-03-30 2024-11-29 三菱综合材料株式会社 表面包覆切削工具
CN114934258B (zh) * 2022-05-24 2024-03-22 河南科技学院 一种SiAlON涂层的制备方法
CN114875360B (zh) * 2022-05-24 2024-03-22 河南科技学院 一种抗高温氧化的NiAl/AlSiON多层复合涂层及制备方法
CN114990509B (zh) * 2022-06-15 2024-07-12 西安热工研究院有限公司 一种中熵合金涂层的强化方法
CN117305787B (zh) * 2023-09-28 2024-06-18 郑州大学 高熵涂层和原位锆硅扩散层的多层协同防护体系、制备方法及应用

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180128952A1 (en) 2016-11-04 2018-05-10 National Tsing Hua University Multi-Film Structure
KR101955370B1 (ko) 2017-10-20 2019-03-07 충남대학교산학협력단 코발트크롬철망간니켈 질산화물 고엔트로피 합금 및 상기 박막의 제조방법

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JP5060714B2 (ja) * 2004-09-30 2012-10-31 株式会社神戸製鋼所 耐摩耗性および耐酸化性に優れた硬質皮膜、並びに該硬質皮膜形成用ターゲット
SE529161C2 (sv) * 2005-06-22 2007-05-22 Seco Tools Ab Skärverktyg med kompositbeläggning för finbearbetning av härdade stål
JP4713413B2 (ja) * 2006-06-30 2011-06-29 株式会社神戸製鋼所 硬質皮膜およびその製造方法
KR20090052174A (ko) * 2007-11-20 2009-05-25 아이시스(주) 확산박막 증착 방법 및 장치
CN105671404B (zh) * 2014-11-19 2017-11-03 北京科技大学 一种氮氧共合金化的TiZrHfNb基高熵合金及其制备方法
US10280312B2 (en) * 2016-07-20 2019-05-07 Guardian Glass, LLC Coated article supporting high-entropy nitride and/or oxide thin film inclusive coating, and/or method of making the same
JP2022505795A (ja) 2018-10-26 2022-01-14 エリコン・サーフェス・ソリューションズ・アクチェンゲゼルシャフト，プフェフィコーン 制御された析出物構造を有するｈｅａセラミック母材を有するｐｖｄコーティング

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180128952A1 (en) 2016-11-04 2018-05-10 National Tsing Hua University Multi-Film Structure
KR101955370B1 (ko) 2017-10-20 2019-03-07 충남대학교산학협력단 코발트크롬철망간니켈 질산화물 고엔트로피 합금 및 상기 박막의 제조방법

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Publication number Publication date
US20220220601A1 (en) 2022-07-14
KR20220010026A (ko) 2022-01-25
JP2022533738A (ja) 2022-07-25
BR112021023386A2 (pt) 2022-02-01
CN113966408A (zh) 2022-01-21
CN113966408B (zh) 2024-05-03
CA3140095A1 (en) 2020-11-26
WO2020234484A1 (en) 2020-11-26
EP3973086A1 (en) 2022-03-30
MX2021014264A (es) 2022-01-06

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