CA3140095A1 - Pvd coatings comprising multi-anion high entropy alloy oxy-nitrides - Google Patents

Pvd coatings comprising multi-anion high entropy alloy oxy-nitrides Download PDF

Info

Publication number
CA3140095A1
CA3140095A1 CA3140095A CA3140095A CA3140095A1 CA 3140095 A1 CA3140095 A1 CA 3140095A1 CA 3140095 A CA3140095 A CA 3140095A CA 3140095 A CA3140095 A CA 3140095A CA 3140095 A1 CA3140095 A1 CA 3140095A1
Authority
CA
Canada
Prior art keywords
coating
elements
anion
hea
pvd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CA3140095A
Other languages
English (en)
French (fr)
Inventor
Siva Phani Kumar YALAMANCHILI
Helmut Rudigier
Doris FOPP-SPORI
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oerlikon Surface Solutions AG Pfaeffikon
Original Assignee
Oerlikon Surface Solutions AG Pfaeffikon
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Surface Solutions AG Pfaeffikon filed Critical Oerlikon Surface Solutions AG Pfaeffikon
Publication of CA3140095A1 publication Critical patent/CA3140095A1/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0676—Oxynitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • C23C14/345—Applying energy to the substrate during sputtering using substrate bias
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CA3140095A 2019-05-21 2020-05-25 Pvd coatings comprising multi-anion high entropy alloy oxy-nitrides Pending CA3140095A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201962850737P 2019-05-21 2019-05-21
US62/850,737 2019-05-21
PCT/EP2020/064441 WO2020234484A1 (en) 2019-05-21 2020-05-25 Pvd coatings comprising multi-anion high entropy alloy oxy-nitrides

Publications (1)

Publication Number Publication Date
CA3140095A1 true CA3140095A1 (en) 2020-11-26

Family

ID=73459582

Family Applications (1)

Application Number Title Priority Date Filing Date
CA3140095A Pending CA3140095A1 (en) 2019-05-21 2020-05-25 Pvd coatings comprising multi-anion high entropy alloy oxy-nitrides

Country Status (8)

Country Link
US (1) US20220220601A1 (enExample)
EP (1) EP3973086A1 (enExample)
JP (1) JP7679312B2 (enExample)
KR (1) KR20220010026A (enExample)
CN (1) CN113966408B (enExample)
CA (1) CA3140095A1 (enExample)
MX (1) MX2021014264A (enExample)
WO (1) WO2020234484A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022097652A1 (ja) * 2020-11-04 2022-05-12 日立金属株式会社 合金部材の製造方法、合金部材、および合金部材を用いた製造物
CN114642363B (zh) * 2020-12-21 2025-05-27 武汉苏泊尔炊具有限公司 锅具和煮食设备
CN112899629B (zh) * 2021-01-18 2022-07-19 南宁师范大学 一种高熵氧化物薄膜及其制备方法和应用
WO2023189595A1 (ja) * 2022-03-30 2023-10-05 三菱マテリアル株式会社 表面被覆切削工具
CN114875360B (zh) * 2022-05-24 2024-03-22 河南科技学院 一种抗高温氧化的NiAl/AlSiON多层复合涂层及制备方法
CN114934258B (zh) * 2022-05-24 2024-03-22 河南科技学院 一种SiAlON涂层的制备方法
CN114990509B (zh) * 2022-06-15 2024-07-12 西安热工研究院有限公司 一种中熵合金涂层的强化方法
CN116641022B (zh) * 2023-05-17 2026-04-21 西南大学 一种抗氧化高熵氮化物涂层的制备方法和应用
CN117305787B (zh) * 2023-09-28 2024-06-18 郑州大学 高熵涂层和原位锆硅扩散层的多层协同防护体系、制备方法及应用

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5060714B2 (ja) * 2004-09-30 2012-10-31 株式会社神戸製鋼所 耐摩耗性および耐酸化性に優れた硬質皮膜、並びに該硬質皮膜形成用ターゲット
SE529161C2 (sv) * 2005-06-22 2007-05-22 Seco Tools Ab Skärverktyg med kompositbeläggning för finbearbetning av härdade stål
JP4713413B2 (ja) * 2006-06-30 2011-06-29 株式会社神戸製鋼所 硬質皮膜およびその製造方法
KR20090052174A (ko) * 2007-11-20 2009-05-25 아이시스(주) 확산박막 증착 방법 및 장치
CN105671404B (zh) * 2014-11-19 2017-11-03 北京科技大学 一种氮氧共合金化的TiZrHfNb基高熵合金及其制备方法
US10280312B2 (en) * 2016-07-20 2019-05-07 Guardian Glass, LLC Coated article supporting high-entropy nitride and/or oxide thin film inclusive coating, and/or method of making the same
TWI607880B (zh) 2016-11-04 2017-12-11 國立清華大學 多層膜結構
KR101955370B1 (ko) * 2017-10-20 2019-03-07 충남대학교산학협력단 코발트크롬철망간니켈 질산화물 고엔트로피 합금 및 상기 박막의 제조방법
WO2020084166A1 (en) 2018-10-26 2020-04-30 Oerlikon Surface Solutions Ag, Pfäffikon Pvd coatings with a hea ceramic matrix with controlled precipitate structure

Also Published As

Publication number Publication date
CN113966408B (zh) 2024-05-03
JP2022533738A (ja) 2022-07-25
MX2021014264A (es) 2022-01-06
KR20220010026A (ko) 2022-01-25
BR112021023386A2 (pt) 2022-02-01
JP7679312B2 (ja) 2025-05-19
EP3973086A1 (en) 2022-03-30
WO2020234484A1 (en) 2020-11-26
CN113966408A (zh) 2022-01-21
US20220220601A1 (en) 2022-07-14

Similar Documents

Publication Publication Date Title
CA3140095A1 (en) Pvd coatings comprising multi-anion high entropy alloy oxy-nitrides
JP7480098B2 (ja) 改善された熱安定性を示すチタン－アルミニウム－タンタルベースの被覆物
Tsai et al. Oxidation resistance and characterization of (AlCrMoTaTi)-Six-N coating deposited via magnetron sputtering
US11649541B2 (en) PVD coatings with a HEA ceramic matrix with controlled precipitate structure
CN102177278B (zh) 非γ-相的立方AlCrO
UA61942C2 (uk) Металевий виріб та спосіб теплоізоляції металевої основи виробу
Wu et al. Microstructure, mechanical properties and oxidation resistance of (Zr, Hf) Nx coatings by magnetron co-sputtering
Mayrhofer et al. Influence of Nb on the phase stability of Ti–Al–N
KR102821766B1 (ko) Ti 및/또는 Si와 미세합금된 바나듐 알루미늄 니트라이드(VAlN)
JP6200488B2 (ja) 高められたコーティング特性を有するＳｉを用いたアーク堆積Ａｌ−Ｃｒ−Ｏコーティング
Dalbauer et al. In-situ XRD studies of arc evaporated Al-Cr-O coatings during oxidation
Landälv et al. Structural evolution in reactive RF magnetron sputtered (Cr, Zr) 2O3 coatings during annealing
Schalk et al. Microstructure, mechanical and optical properties of TiAlON coatings sputter-deposited with varying oxygen partial pressures
JP6895259B2 (ja) Ｍｏ−Ｓｉ−Ｂ層およびそれを製造する方法
JP7402869B2 (ja) 超合金基板用のｐｖｄバリアコーティング
BR112021023386B1 (pt) Método para produzir um revestimento, revestimento e uso do revestimento
Tsai et al. Microstructure and corrosion properties of multilayered CrAlN/SiN x coatings
US10774416B2 (en) Coating material comprising a ternary phase of Hf—B—C
Ast et al. The formation of a homogeneous α-alumina coating on a Ni-based superalloy from a layer stack deposited by cathodic arc evaporation

Legal Events

Date Code Title Description
EEER Examination request

Effective date: 20240503

D15 Examination report completed

Free format text: ST27 STATUS EVENT CODE: A-2-2-D10-D15-D126 (AS PROVIDED BY THE NATIONAL OFFICE); EVENT TEXT: EXAMINER'S REPORT

Effective date: 20250317

MFA Maintenance fee for application paid

Free format text: FEE DESCRIPTION TEXT: MF (APPLICATION, 5TH ANNIV.) - STANDARD

Year of fee payment: 5

U00 Fee paid

Free format text: ST27 STATUS EVENT CODE: A-2-2-U10-U00-U101 (AS PROVIDED BY THE NATIONAL OFFICE); EVENT TEXT: MAINTENANCE REQUEST RECEIVED

Effective date: 20250519

U11 Full renewal or maintenance fee paid

Free format text: ST27 STATUS EVENT CODE: A-2-2-U10-U11-U102 (AS PROVIDED BY THE NATIONAL OFFICE); EVENT TEXT: MAINTENANCE FEE PAYMENT PAID IN FULL

Effective date: 20250519

P11 Amendment of application requested

Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P11-P100 (AS PROVIDED BY THE NATIONAL OFFICE); EVENT TEXT: AMENDMENT RECEIVED - RESPONSE TO EXAMINER'S REQUISITION

Effective date: 20250715

W00 Other event occurred

Free format text: ST27 STATUS EVENT CODE: A-2-2-W10-W00-W111 (AS PROVIDED BY THE NATIONAL OFFICE); EVENT TEXT: CORRESPONDENT DETERMINED COMPLIANT

Effective date: 20250716

P11 Amendment of application requested

Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P11-P102 (AS PROVIDED BY THE NATIONAL OFFICE); EVENT TEXT: AMENDMENT DETERMINED COMPLIANT

Effective date: 20250725

P13 Application amended

Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P13-X000 (AS PROVIDED BY THE NATIONAL OFFICE); EVENT TEXT: APPLICATION AMENDED

Effective date: 20250725