JP7480098B2 - 改善された熱安定性を示すチタン-アルミニウム-タンタルベースの被覆物 - Google Patents
改善された熱安定性を示すチタン-アルミニウム-タンタルベースの被覆物 Download PDFInfo
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- 238000000576 coating method Methods 0.000 title claims description 68
- 230000001747 exhibiting effect Effects 0.000 title claims description 7
- -1 Titanium-aluminum-tantalum Chemical compound 0.000 title description 2
- 239000011248 coating agent Substances 0.000 claims description 47
- 238000000034 method Methods 0.000 claims description 40
- 230000007547 defect Effects 0.000 claims description 19
- 238000010891 electric arc Methods 0.000 claims description 12
- 238000007733 ion plating Methods 0.000 claims description 12
- 238000005240 physical vapour deposition Methods 0.000 claims description 12
- 238000000151 deposition Methods 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 11
- 229910052715 tantalum Inorganic materials 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 9
- 239000013078 crystal Substances 0.000 claims description 8
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 8
- 229910052720 vanadium Inorganic materials 0.000 claims description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 229910052804 chromium Inorganic materials 0.000 claims description 5
- 239000007789 gas Substances 0.000 claims description 5
- 229910052735 hafnium Inorganic materials 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims description 5
- 229910052758 niobium Inorganic materials 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- 238000000168 high power impulse magnetron sputter deposition Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 238000004663 powder metallurgy Methods 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 94
- 238000012360 testing method Methods 0.000 description 8
- 238000002441 X-ray diffraction Methods 0.000 description 7
- 239000002356 single layer Substances 0.000 description 7
- 229910004491 TaAlN Inorganic materials 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- 230000008021 deposition Effects 0.000 description 5
- 238000001755 magnetron sputter deposition Methods 0.000 description 5
- 238000002083 X-ray spectrum Methods 0.000 description 4
- UQZIWOQVLUASCR-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti] UQZIWOQVLUASCR-UHFFFAOYSA-N 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000003483 aging Methods 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000002173 high-resolution transmission electron microscopy Methods 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 238000005477 sputtering target Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- RVSGESPTHDDNTH-UHFFFAOYSA-N alumane;tantalum Chemical compound [AlH3].[Ta] RVSGESPTHDDNTH-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001603 reducing effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 238000004627 transmission electron microscopy Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0617—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
- C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3435—Applying energy to the substrate during sputtering
- C23C14/345—Applying energy to the substrate during sputtering using substrate bias
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
- C23C28/44—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by a measurable physical property of the alternating layer or system, e.g. thickness, density, hardness
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
Description
Me2はTi、Cr、V、Nb、Zr、Hf、Mo、Si及びWから一つ以上の元素であり、
XはO、C、及びBから一つ以上の元素であり、
0.2≦x≦0.7、0.7≦z≦1、0.02≦y≦0.80である。
Me2はTi、Cr、V、Nb、Zr、Hf、Mo、Si及びWから一つ以上の元素であり、
XはO、C、及びBから一つ以上の元素であり、
0.2≦x≦0.7、0.7≦z≦1、0.02≦y≦0.80である。
2 接着促進層
4 層
8 層
10 多層膜
12 少なくとも一つの層
20 被覆システム
Claims (6)
- 本体(1)、及び前記本体の表面の少なくとも一部に堆積された耐摩耗性被覆システム(20)を備えた被覆本体であって、前記耐摩耗性被覆システムは、互いに交互に堆積されたn個のA層(4)及びm個のB層(8)からなるタンタル含有多層膜(10)を含み、n及びmは1より大きい整数であり、前記多層膜(10)は、立方晶構造を示しており、前記B層はタンタルを含み、前記A層は前記B層より高い欠陥密度を示すことを特徴としており、
前記A層はアーク放電イオンプレーティング技術によって堆積され、前記B層は高出力インパルスマグネトロンスパッタリング(HIPIMS)技術により堆積され、前記A層及びB層の化学組成は、原子パーセントの係数を含む次の化学式で与えられることを特徴とする、被覆本体。
A層に対してはTi 1-xAlxNzX1-zであり、及びB層に対してはMe2 1-x―yAlxTayNzX1-zであり、
ここで、Me2はTi、Cr、V、Nb、Zr、Hf、Mo及びWから一つ以上の元素であり、
XはO、C、及びBから一つ以上の元素であり、及び
0.2≦x≦0.7、0.7≦z≦1、0.02≦y≦0.80である。 - 前記B層の厚さは、前記A層の厚さより小さく:A1>B1、A2>B2、A3>B3、…An>Bmであることを特徴とする、請求項1に記載の被覆本体。
- 前記A層の厚さは、前記B層の厚さより少なくとも15%大きく:A1≧1.15B1、A2≧1.15B2、A3≧1.15B3、…An≧1.15Bmであることを特徴とする、請求項2に記載の被覆本体。
- 前記A層及び/または前記B層を堆積することにおいて、反応性物理気相堆積技術が使用されることを特徴とする、請求項1から3のいずれか一項に記載の被覆本体を製造する方法。
- 窒素比率及び/または前記被覆システムのX要素に含まれる元素の少なくとも一つが、反応性気体から、または反応性気体混合物から、前記A層及び/またはB層内にそれぞれ組み込まれることを特徴とする、請求項4に記載の方法。
- 前記A層及び/またはB層を堆積するためのソース材料として使用される少なくとも一つのターゲットは、粉末冶金技術によって作られることを特徴とする、請求項4または5に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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DE102012017731.3A DE102012017731A1 (de) | 2012-09-08 | 2012-09-08 | Ti-Al-Ta-basierte Beschichtung mit einer verbesserten Temperaturbeständigkeit |
DE102012017731.3 | 2012-09-08 | ||
JP2019089963A JP2019143251A (ja) | 2012-09-08 | 2019-05-10 | 改善された熱安定性を示すチタン−アルミニウム−タンタルベースの被覆物 |
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JP2022003168A JP2022003168A (ja) | 2022-01-11 |
JP7480098B2 true JP7480098B2 (ja) | 2024-05-09 |
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JP2019089963A Pending JP2019143251A (ja) | 2012-09-08 | 2019-05-10 | 改善された熱安定性を示すチタン−アルミニウム−タンタルベースの被覆物 |
JP2021148118A Active JP7480098B2 (ja) | 2012-09-08 | 2021-09-10 | 改善された熱安定性を示すチタン-アルミニウム-タンタルベースの被覆物 |
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JP2019089963A Pending JP2019143251A (ja) | 2012-09-08 | 2019-05-10 | 改善された熱安定性を示すチタン−アルミニウム−タンタルベースの被覆物 |
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US (1) | US9506139B2 (ja) |
EP (1) | EP2893052B1 (ja) |
JP (3) | JP2015533936A (ja) |
KR (2) | KR102386800B1 (ja) |
CN (1) | CN105026605B (ja) |
BR (1) | BR112015005064A2 (ja) |
DE (1) | DE102012017731A1 (ja) |
WO (1) | WO2014037104A1 (ja) |
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DE102012017731A1 (de) * | 2012-09-08 | 2014-03-13 | Oerlikon Trading Ag, Trübbach | Ti-Al-Ta-basierte Beschichtung mit einer verbesserten Temperaturbeständigkeit |
JP6491031B2 (ja) * | 2014-06-24 | 2019-03-27 | 株式会社神戸製鋼所 | 積層型硬質皮膜および切削工具 |
US11090739B2 (en) * | 2015-12-14 | 2021-08-17 | Alp Havacilik Sanayi Ve Ticaret Anonim Sirketi | End-mills made of hard metal and ceramic combined by brazing method |
DE102016112928A1 (de) * | 2016-07-14 | 2018-01-18 | Hoppe Holding Ag | Verfahren zur Herstellung eines Bauteils mit einer Korrosionsschutzbeschichtung |
DE102016112927A1 (de) * | 2016-07-14 | 2018-02-01 | Hoppe Holding Ag | Bauteil mit Substrat und Korrosionsschutzbeschichtung |
WO2018215558A1 (en) | 2017-05-23 | 2018-11-29 | Oerlikon Surface Solutions Ag, Pfäffikon | Thick TiAlTaN/AlCrN multilayer coating films on turbine components |
EP3763465A4 (en) * | 2018-03-07 | 2021-08-04 | Sumitomo Electric Hardmetal Corp. | SURFACE-COATED CUTTING TOOL AND METHOD OF MANUFACTURING THEREOF |
WO2020070967A1 (ja) * | 2018-10-03 | 2020-04-09 | 住友電工ハードメタル株式会社 | 表面被覆切削工具及びその製造方法 |
CN110484870B (zh) * | 2019-08-15 | 2021-08-24 | 广东工业大学 | 一种多组元氮化物硬质涂层及其制备方法和应用 |
CN114150282B (zh) * | 2021-11-22 | 2022-08-09 | 苏州大学 | 一种纳米刀具涂层及其制备方法 |
WO2023143857A1 (en) | 2022-01-31 | 2023-08-03 | Oerlikon Surface Solutions Ag, Pfäffikon | METHOD FOR PRODUCING A MXAl1-XN BASED THIN FILMS WITH INCREASED THERMAL STABILITY |
JP7459450B2 (ja) | 2022-05-17 | 2024-04-02 | 株式会社タンガロイ | 被覆切削工具 |
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JP2011224688A (ja) | 2010-04-16 | 2011-11-10 | Mitsubishi Materials Corp | 表面被覆切削工具 |
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2013
- 2013-09-04 KR KR1020217013547A patent/KR102386800B1/ko active IP Right Grant
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- 2013-09-04 BR BR112015005064A patent/BR112015005064A2/pt not_active Application Discontinuation
- 2013-09-04 KR KR1020157008622A patent/KR20150048884A/ko active Application Filing
- 2013-09-04 WO PCT/EP2013/002658 patent/WO2014037104A1/en active Application Filing
- 2013-09-04 US US14/426,458 patent/US9506139B2/en active Active
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JP2022003168A (ja) | 2022-01-11 |
US20150259782A1 (en) | 2015-09-17 |
EP2893052A1 (en) | 2015-07-15 |
DE102012017731A1 (de) | 2014-03-13 |
KR20150048884A (ko) | 2015-05-07 |
WO2014037104A1 (en) | 2014-03-13 |
KR102386800B1 (ko) | 2022-04-14 |
CN105026605A (zh) | 2015-11-04 |
BR112015005064A2 (pt) | 2017-07-04 |
EP2893052B1 (en) | 2022-12-07 |
JP2019143251A (ja) | 2019-08-29 |
CN105026605B (zh) | 2018-01-26 |
KR20210054602A (ko) | 2021-05-13 |
JP2015533936A (ja) | 2015-11-26 |
US9506139B2 (en) | 2016-11-29 |
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