MX2015008261A - Dispositivo de bombardeo de iones y metodo para usar el mismo para limpiar una superficie de sustrato. - Google Patents
Dispositivo de bombardeo de iones y metodo para usar el mismo para limpiar una superficie de sustrato.Info
- Publication number
- MX2015008261A MX2015008261A MX2015008261A MX2015008261A MX2015008261A MX 2015008261 A MX2015008261 A MX 2015008261A MX 2015008261 A MX2015008261 A MX 2015008261A MX 2015008261 A MX2015008261 A MX 2015008261A MX 2015008261 A MX2015008261 A MX 2015008261A
- Authority
- MX
- Mexico
- Prior art keywords
- electrode
- ion bombardment
- same
- substrate surface
- vacuum chamber
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using ion beam radiation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4584—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally the substrate being rotated
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/332—Coating
- H01J2237/3321—CVD [Chemical Vapor Deposition]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/335—Cleaning
Abstract
Se proporciona un dispositivo de bombardeo de iones (1) para estabilizar y limpiar la superficie de un sustrato. El dispositivo está provisto con lo siguiente: una cámara de vacío (2); por lo menos un electrodo (3) que está dispuesto sobre la cara de la pared interior de la cámara de vacío (2) y emite electrones; una pluralidad de ánodos (4) que reciben los electrones a partir del electrodo (3) y que están dispuestos con el fin de estar orientados hacia el electrodo con el sustrato intercalado entre los mismos; y una pluralidad de fuentes de alimentación de descarga (5) que se corresponden con los ánodos (4) respectivamente. Cada una de las fuentes de alimentación de descarga (5) está aislada con respecto a la cámara de vacío (2) y proporciona al ánodo (4) que se corresponde con la fuente de alimentación de descarga (5) relevante unas corrientes y tensiones que pueden establecerse de manera independiente una de otra, generando de ese modo una descarga luminiscente entre tal ánodo (4) y el electrodo (3).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013022264A JP6076112B2 (ja) | 2013-02-07 | 2013-02-07 | イオンボンバードメント装置及びこの装置を用いた基材の表面のクリーニング方法 |
PCT/JP2014/000047 WO2014122876A1 (ja) | 2013-02-07 | 2014-01-09 | イオンボンバードメント装置及びこの装置を用いた基材の表面のクリーニング方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
MX2015008261A true MX2015008261A (es) | 2015-09-29 |
MX368879B MX368879B (es) | 2019-10-21 |
Family
ID=51299478
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2015008261A MX368879B (es) | 2013-02-07 | 2014-01-09 | Dispositivo de bombardeo de iones y metodo para usar el mismo para limpiar una superficie de sustrato. |
Country Status (12)
Country | Link |
---|---|
US (1) | US20150299847A1 (es) |
EP (1) | EP2955244A4 (es) |
JP (1) | JP6076112B2 (es) |
KR (2) | KR20170045397A (es) |
CN (1) | CN104968826B (es) |
BR (1) | BR112015019027A8 (es) |
CA (1) | CA2893118C (es) |
IL (1) | IL239072B (es) |
MX (1) | MX368879B (es) |
RU (1) | RU2015137774A (es) |
TW (1) | TWI489513B (es) |
WO (1) | WO2014122876A1 (es) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108699690B (zh) * | 2015-11-05 | 2021-07-09 | 布勒阿尔策瑙有限责任公司 | 用于真空涂覆的装置和方法 |
JP6476261B1 (ja) * | 2017-10-17 | 2019-02-27 | 株式会社神戸製鋼所 | 成膜方法 |
CN108054079A (zh) * | 2017-11-29 | 2018-05-18 | 上海华力微电子有限公司 | 焊盘结晶缺陷的去除方法 |
KR102336559B1 (ko) * | 2019-11-26 | 2021-12-08 | 세메스 주식회사 | 부품 표면 처리 방법 및 부품 처리 장치 |
CN111029278B (zh) * | 2019-12-10 | 2021-06-29 | 长江存储科技有限责任公司 | 一种晶圆片的加工方法和系统 |
US20220162737A1 (en) * | 2020-11-25 | 2022-05-26 | Oem Group, Llc | Systems and methods for in-situ etching prior to physical vapor deposition in the same chamber |
CN115354298A (zh) * | 2022-07-05 | 2022-11-18 | 湖南红太阳光电科技有限公司 | 一种pecvd设备石墨舟清洗系统 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE29615190U1 (de) * | 1996-03-11 | 1996-11-28 | Balzers Verschleissschutz Gmbh | Anlage zur Beschichtung von Werkstücken |
US5917286A (en) * | 1996-05-08 | 1999-06-29 | Advanced Energy Industries, Inc. | Pulsed direct current power supply configurations for generating plasmas |
JP2871675B2 (ja) * | 1997-03-24 | 1999-03-17 | 川崎重工業株式会社 | 圧力勾配型電子ビーム励起プラズマ発生装置 |
DE10018143C5 (de) * | 2000-04-12 | 2012-09-06 | Oerlikon Trading Ag, Trübbach | DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems |
US6504307B1 (en) * | 2000-11-30 | 2003-01-07 | Advanced Cardiovascular Systems, Inc. | Application of variable bias voltage on a cylindrical grid enclosing a target |
JP4402898B2 (ja) * | 2003-04-22 | 2010-01-20 | 株式会社神戸製鋼所 | 物理的蒸着装置 |
JP2004156091A (ja) * | 2002-11-06 | 2004-06-03 | Denso Corp | 硬質被膜製造方法 |
JP4541045B2 (ja) * | 2004-06-24 | 2010-09-08 | 日立ツール株式会社 | 皮膜形成方法及びその皮膜形成方法を用いた被覆部材 |
US20070240982A1 (en) * | 2005-10-17 | 2007-10-18 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | Arc ion plating apparatus |
JP4693002B2 (ja) * | 2005-10-17 | 2011-06-01 | 株式会社神戸製鋼所 | アークイオンプレーティング装置 |
JP2009001898A (ja) * | 2007-05-24 | 2009-01-08 | Nissin Electric Co Ltd | 真空処理方法及び真空処理装置 |
CN102823331A (zh) * | 2010-02-17 | 2012-12-12 | 视觉动力控股有限公司 | 产生用于对衬底表面图案化的等离子体放电的设备和方法 |
JP5649333B2 (ja) * | 2010-06-01 | 2015-01-07 | 株式会社神戸製鋼所 | イオンボンバードメント装置及びこの装置を用いた基材表面のクリーニング方法 |
TWI432600B (zh) * | 2010-06-11 | 2014-04-01 | Ind Tech Res Inst | 表面處理裝置及其方法 |
JP5689051B2 (ja) * | 2011-11-25 | 2015-03-25 | 株式会社神戸製鋼所 | イオンボンバードメント装置 |
-
2013
- 2013-02-07 JP JP2013022264A patent/JP6076112B2/ja active Active
-
2014
- 2014-01-09 CA CA2893118A patent/CA2893118C/en active Active
- 2014-01-09 BR BR112015019027A patent/BR112015019027A8/pt not_active Application Discontinuation
- 2014-01-09 KR KR1020177010680A patent/KR20170045397A/ko not_active Application Discontinuation
- 2014-01-09 MX MX2015008261A patent/MX368879B/es active IP Right Grant
- 2014-01-09 WO PCT/JP2014/000047 patent/WO2014122876A1/ja active Application Filing
- 2014-01-09 KR KR1020157021066A patent/KR101935090B1/ko active IP Right Grant
- 2014-01-09 EP EP14748572.6A patent/EP2955244A4/en not_active Withdrawn
- 2014-01-09 US US14/651,004 patent/US20150299847A1/en not_active Abandoned
- 2014-01-09 RU RU2015137774A patent/RU2015137774A/ru unknown
- 2014-01-09 CN CN201480007860.6A patent/CN104968826B/zh active Active
- 2014-01-22 TW TW103102264A patent/TWI489513B/zh active
-
2015
- 2015-05-28 IL IL239072A patent/IL239072B/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
RU2015137774A (ru) | 2017-03-13 |
CA2893118C (en) | 2019-02-12 |
WO2014122876A1 (ja) | 2014-08-14 |
BR112015019027A8 (pt) | 2019-11-12 |
EP2955244A4 (en) | 2016-10-05 |
IL239072A0 (en) | 2015-07-30 |
KR101935090B1 (ko) | 2019-01-03 |
TW201438053A (zh) | 2014-10-01 |
IL239072B (en) | 2019-05-30 |
CN104968826B (zh) | 2017-06-09 |
KR20150104149A (ko) | 2015-09-14 |
CN104968826A (zh) | 2015-10-07 |
CA2893118A1 (en) | 2014-08-14 |
EP2955244A1 (en) | 2015-12-16 |
BR112015019027A2 (pt) | 2017-07-18 |
JP6076112B2 (ja) | 2017-02-08 |
JP2014152356A (ja) | 2014-08-25 |
TWI489513B (zh) | 2015-06-21 |
KR20170045397A (ko) | 2017-04-26 |
US20150299847A1 (en) | 2015-10-22 |
MX368879B (es) | 2019-10-21 |
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