WO2012036491A3 - 누설 전류형 변압기를 이용한 플라즈마 처리장치 - Google Patents

누설 전류형 변압기를 이용한 플라즈마 처리장치 Download PDF

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Publication number
WO2012036491A3
WO2012036491A3 PCT/KR2011/006830 KR2011006830W WO2012036491A3 WO 2012036491 A3 WO2012036491 A3 WO 2012036491A3 KR 2011006830 W KR2011006830 W KR 2011006830W WO 2012036491 A3 WO2012036491 A3 WO 2012036491A3
Authority
WO
WIPO (PCT)
Prior art keywords
leakage current
current transformer
chamber
treatment device
generation electrode
Prior art date
Application number
PCT/KR2011/006830
Other languages
English (en)
French (fr)
Other versions
WO2012036491A2 (ko
Inventor
이제원
Original Assignee
인제대학교 산학협력단
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 인제대학교 산학협력단 filed Critical 인제대학교 산학협력단
Priority to US13/822,745 priority Critical patent/US20130175927A1/en
Publication of WO2012036491A2 publication Critical patent/WO2012036491A2/ko
Publication of WO2012036491A3 publication Critical patent/WO2012036491A3/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32669—Particular magnets or magnet arrangements for controlling the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32834—Exhausting

Abstract

본 발명의 누설 전류형 변압기를 이용한 플라즈마 처리 장치는 플라즈마가 형성되는 밀폐 공간을 제공하고, 그 내부에 피처리 샘플이 수용되는 챔버, 상기 챔버 내부를 진공 상태로 형성하기 위한 배기부, 상기 챔버 내에 고정되며 양극과 음극이 서로 대향하여 설치되는 플라즈마 발생 전극, 상기 챔버 외부에 설치되고 상기 플라즈마 발생 전극에 전원을 공급하는 가변 전원 공급기 및 상기 가변 전원 공급기와 상기 플라즈마 발생 전극 사이에 설치되며, 상기 플라즈마 발생 전극에 인가하는 전압과 전류를 조절하는 누설 전류형 변압기를 포함한다.
PCT/KR2011/006830 2010-09-17 2011-09-16 누설 전류형 변압기를 이용한 플라즈마 처리장치 WO2012036491A2 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US13/822,745 US20130175927A1 (en) 2010-09-17 2011-09-16 Plasma treatment apparatus using leakage current transformer

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020100091544A KR101147349B1 (ko) 2010-09-17 2010-09-17 누설 전류형 변압기를 이용한 플라즈마 처리장치
KR10-2010-0091544 2010-09-17

Publications (2)

Publication Number Publication Date
WO2012036491A2 WO2012036491A2 (ko) 2012-03-22
WO2012036491A3 true WO2012036491A3 (ko) 2012-06-07

Family

ID=45832115

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2011/006830 WO2012036491A2 (ko) 2010-09-17 2011-09-16 누설 전류형 변압기를 이용한 플라즈마 처리장치

Country Status (3)

Country Link
US (1) US20130175927A1 (ko)
KR (1) KR101147349B1 (ko)
WO (1) WO2012036491A2 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5808012B2 (ja) * 2011-12-27 2015-11-10 東京エレクトロン株式会社 プラズマ処理装置
KR101559104B1 (ko) * 2013-02-27 2015-10-12 인제대학교 산학협력단 냉음극 플라즈마를 이용한 실리카 박막의 제조 방법
KR101567041B1 (ko) * 2013-03-04 2015-11-09 인제대학교 산학협력단 냉음극 플라즈마를 이용한 산화 아연 박막의 제조 방법

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JP2813896B2 (ja) * 1989-08-31 1998-10-22 茂樹 花村 プラズマ放電管
JP2005235448A (ja) * 2004-02-17 2005-09-02 Pearl Kogyo Co Ltd プラズマ処理方法及びその装置
JP2006196224A (ja) * 2005-01-11 2006-07-27 Sharp Corp プラズマ処理装置
JP2010034014A (ja) * 2008-07-30 2010-02-12 Mory Engineering Co Ltd プラズマ処理装置

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US3687832A (en) * 1970-11-23 1972-08-29 Surface Activation Corp Production of improved polymeric materials using electrical gas discharges
JPS568645B2 (ko) * 1974-09-05 1981-02-25
US4570106A (en) * 1982-02-18 1986-02-11 Elscint, Inc. Plasma electron source for cold-cathode discharge device or the like
US4458180A (en) * 1982-02-18 1984-07-03 Elscint Ltd. Plasma electron source for cold-cathode discharge device or the like
DE3483800D1 (de) * 1983-05-10 1991-02-07 Toshiba Kawasaki Kk Verfahren zum reaktiven ionenaetzen.
EP0136364B1 (de) * 1983-09-23 1988-07-20 Ibm Deutschland Gmbh Verfahren und Anordnung zum selektiven, selbstjustierten Aufbringen von Metallschichten und Verwendung des Verfahrens
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JP2813896B2 (ja) * 1989-08-31 1998-10-22 茂樹 花村 プラズマ放電管
JP2005235448A (ja) * 2004-02-17 2005-09-02 Pearl Kogyo Co Ltd プラズマ処理方法及びその装置
JP2006196224A (ja) * 2005-01-11 2006-07-27 Sharp Corp プラズマ処理装置
JP2010034014A (ja) * 2008-07-30 2010-02-12 Mory Engineering Co Ltd プラズマ処理装置

Also Published As

Publication number Publication date
KR101147349B1 (ko) 2012-05-23
KR20120029630A (ko) 2012-03-27
US20130175927A1 (en) 2013-07-11
WO2012036491A2 (ko) 2012-03-22

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