MX2009000449A - Aparato y metodo de recubrimiento. - Google Patents

Aparato y metodo de recubrimiento.

Info

Publication number
MX2009000449A
MX2009000449A MX2009000449A MX2009000449A MX2009000449A MX 2009000449 A MX2009000449 A MX 2009000449A MX 2009000449 A MX2009000449 A MX 2009000449A MX 2009000449 A MX2009000449 A MX 2009000449A MX 2009000449 A MX2009000449 A MX 2009000449A
Authority
MX
Mexico
Prior art keywords
magnetron
coating
sputter deposition
increasing
coating apparatus
Prior art date
Application number
MX2009000449A
Other languages
English (en)
Inventor
Dennis Terr
Alex Goruppa
Original Assignee
Teer Coatings Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GBGB0613877.0A external-priority patent/GB0613877D0/en
Priority claimed from GB0707801A external-priority patent/GB0707801D0/en
Application filed by Teer Coatings Ltd filed Critical Teer Coatings Ltd
Publication of MX2009000449A publication Critical patent/MX2009000449A/es

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M8/00Fuel cells; Manufacture thereof
    • H01M8/02Details
    • H01M8/0202Collectors; Separators, e.g. bipolar separators; Interconnectors
    • H01M8/0204Non-porous and characterised by the material
    • H01M8/0223Composites
    • H01M8/0228Composites in the form of layered or coated products
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M8/00Fuel cells; Manufacture thereof
    • H01M8/02Details
    • H01M8/0202Collectors; Separators, e.g. bipolar separators; Interconnectors
    • H01M8/0204Non-porous and characterised by the material
    • H01M8/0206Metals or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M8/00Fuel cells; Manufacture thereof
    • H01M8/02Details
    • H01M8/0202Collectors; Separators, e.g. bipolar separators; Interconnectors
    • H01M8/0204Non-porous and characterised by the material
    • H01M8/0213Gas-impermeable carbon-containing materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/50Fuel cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/30Self-sustaining carbon mass or layer with impregnant or other layer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31678Of metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Composite Materials (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Fuel Cell (AREA)

Abstract

La invención se relaciona con la provisión de un aparato y un método el cual puede ser usado para permitir la deposición electrónica de material sobre al menos un artículo para formar un recubrimiento sobre el mismo. La nueva forma del magnetrón descrito aquí permite un incremento en las velocidades de deposición electrónica a ser lograda a potencias más altas y sin producir daño al recubrimiento que se ha creado. Esto puede ser logrado por medio de un enfriamiento mejorado y el uso de un campo magnético relativamente alto en el magnetrón incrementando al mismo tiempo la potencia del magnetrón incrementando la corriente a una velocidad más rápida que el voltaje.
MX2009000449A 2006-07-13 2007-07-12 Aparato y metodo de recubrimiento. MX2009000449A (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB0613877.0A GB0613877D0 (en) 2006-07-13 2006-07-13 Coating apparatus and coating for an article
GB0707801A GB0707801D0 (en) 2007-04-23 2007-04-23 Improvments to the application of coatings, and the coating applied
PCT/GB2007/002600 WO2008007095A1 (en) 2006-07-13 2007-07-12 Coating apparatus and method

Publications (1)

Publication Number Publication Date
MX2009000449A true MX2009000449A (es) 2009-04-28

Family

ID=38617911

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2009000449A MX2009000449A (es) 2006-07-13 2007-07-12 Aparato y metodo de recubrimiento.

Country Status (7)

Country Link
US (1) US8440301B2 (es)
EP (1) EP2044237B1 (es)
JP (2) JP2009542918A (es)
CA (1) CA2660085C (es)
EA (2) EA201101662A1 (es)
MX (1) MX2009000449A (es)
WO (1) WO2008007095A1 (es)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5463216B2 (ja) * 2010-06-21 2014-04-09 トーヨーエイテック株式会社 クロム系硬質被膜、クロム系硬質被膜が表面に形成された金型、及びクロム系硬質被膜の製造方法
AT511605B1 (de) * 2011-12-12 2013-01-15 High Tech Coatings Gmbh Kohlenstoffbasierende beschichtung
CN103184421A (zh) * 2011-12-30 2013-07-03 鸿富锦精密工业(深圳)有限公司 真空溅射靶磁芯
GB201203219D0 (en) * 2012-02-24 2012-04-11 Teer Coatings Ltd Coating with conductive and corrosion resistance characteristics
EP2905355B1 (en) * 2012-10-01 2018-05-09 Nissan Motor Co., Ltd. In-line coating device and in-line coating method
US9303312B2 (en) * 2013-03-06 2016-04-05 Areesys Technologies, Inc. Film deposition apparatus with low plasma damage and low processing temperature
WO2015037315A1 (ja) * 2013-09-10 2015-03-19 株式会社島津製作所 成膜装置および成膜方法
US10858727B2 (en) 2016-08-19 2020-12-08 Applied Materials, Inc. High density, low stress amorphous carbon film, and process and equipment for its deposition
US20230193442A1 (en) * 2017-11-17 2023-06-22 Sms Group Gmbh Method for the preoxidation of strip steel in a reaction chamber arranged in a furnace chamber
JP7202968B2 (ja) * 2019-05-09 2023-01-12 東京エレクトロン株式会社 塗布処理方法、塗布処理装置及び記憶媒体
GB201914136D0 (en) * 2019-10-01 2019-11-13 Teer Coatings Ltd Improvements to carbon coatings, method and apparatus for applying them, and articles bearing such coatings
KR102302266B1 (ko) * 2021-05-06 2021-09-14 이주성 크롬 질화물(CrN)을 이용한 금형의 PVD 도금방법

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GB2028377B (en) * 1978-08-21 1982-12-08 Vac Tec Syst Magnetically-enhanced sputtering device
US4162954A (en) * 1978-08-21 1979-07-31 Vac-Tec Systems, Inc. Planar magnetron sputtering device
US4299678A (en) * 1979-07-23 1981-11-10 Spin Physics, Inc. Magnetic target plate for use in magnetron sputtering of magnetic films
DE3480245D1 (en) * 1983-12-05 1989-11-23 Leybold Ag Magnetron-cathodes for the sputtering of ferromagnetic targets
US4629548A (en) * 1985-04-03 1986-12-16 Varian Associates, Inc. Planar penning magnetron sputtering device
JP2619428B2 (ja) * 1987-11-04 1997-06-11 株式会社リコー 硬質導電性炭素膜
US5130005A (en) * 1990-10-31 1992-07-14 Materials Research Corporation Magnetron sputter coating method and apparatus with rotating magnet cathode
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CZ281073B6 (cs) * 1993-09-03 1996-06-12 Fyzikální ústav AVČR Způsob rozprašování materiálu katody
JPH07268622A (ja) * 1994-03-01 1995-10-17 Applied Sci & Technol Inc マイクロ波プラズマ付着源
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Also Published As

Publication number Publication date
EA201101662A1 (ru) 2012-05-30
US8440301B2 (en) 2013-05-14
WO2008007095A1 (en) 2008-01-17
EA200900182A1 (ru) 2009-06-30
CA2660085C (en) 2016-02-09
CA2660085A1 (en) 2008-01-17
EP2044237A1 (en) 2009-04-08
EP2044237B1 (en) 2020-12-16
US20110305912A1 (en) 2011-12-15
JP2014062325A (ja) 2014-04-10
JP2009542918A (ja) 2009-12-03

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