MX2007006725A - Puerta de transistor de efecto de campo organico. - Google Patents
Puerta de transistor de efecto de campo organico.Info
- Publication number
- MX2007006725A MX2007006725A MX2007006725A MX2007006725A MX2007006725A MX 2007006725 A MX2007006725 A MX 2007006725A MX 2007006725 A MX2007006725 A MX 2007006725A MX 2007006725 A MX2007006725 A MX 2007006725A MX 2007006725 A MX2007006725 A MX 2007006725A
- Authority
- MX
- Mexico
- Prior art keywords
- field effect
- electronic device
- effect transistors
- layers
- different
- Prior art date
Links
- 230000005669 field effect Effects 0.000 title claims abstract description 77
- 239000010410 layer Substances 0.000 claims abstract description 157
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 239000007788 liquid Substances 0.000 claims abstract description 21
- 238000007639 printing Methods 0.000 claims abstract description 21
- 239000004065 semiconductor Substances 0.000 claims description 87
- 239000000463 material Substances 0.000 claims description 21
- 229920000642 polymer Polymers 0.000 claims description 14
- 230000000295 complement effect Effects 0.000 claims description 6
- 239000002105 nanoparticle Substances 0.000 claims description 6
- 239000002904 solvent Substances 0.000 claims description 6
- 238000010345 tape casting Methods 0.000 claims description 5
- 239000012044 organic layer Substances 0.000 claims description 4
- 150000003384 small molecules Chemical class 0.000 claims description 4
- 239000002131 composite material Substances 0.000 claims description 3
- 230000008878 coupling Effects 0.000 claims description 3
- 238000010168 coupling process Methods 0.000 claims description 3
- 238000005859 coupling reaction Methods 0.000 claims description 3
- 239000000976 ink Substances 0.000 claims description 3
- 230000035699 permeability Effects 0.000 claims description 2
- 239000007772 electrode material Substances 0.000 claims 1
- 239000011810 insulating material Substances 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 15
- 230000000694 effects Effects 0.000 abstract description 6
- 239000002346 layers by function Substances 0.000 abstract description 2
- 230000008569 process Effects 0.000 abstract description 2
- 239000004020 conductor Substances 0.000 description 15
- 238000010586 diagram Methods 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- 230000006399 behavior Effects 0.000 description 7
- 239000010408 film Substances 0.000 description 5
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000002800 charge carrier Substances 0.000 description 4
- 230000010355 oscillation Effects 0.000 description 4
- 239000000725 suspension Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000000969 carrier Substances 0.000 description 3
- 238000010276 construction Methods 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 239000000839 emulsion Substances 0.000 description 3
- 238000007649 pad printing Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical class C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
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- 230000003287 optical effect Effects 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000002207 thermal evaporation Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 230000002730 additional effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000004069 differentiation Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- -1 polyphenylenevinylene Polymers 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K19/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00
- H10K19/10—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00 comprising field-effect transistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K19/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00
- H10K19/20—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00 comprising components having an active region that includes an inorganic semiconductor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Thin Film Transistor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102004059467A DE102004059467A1 (de) | 2004-12-10 | 2004-12-10 | Gatter aus organischen Feldeffekttransistoren |
| PCT/DE2005/002195 WO2006061000A2 (de) | 2004-12-10 | 2005-12-06 | Gatter aus organischen feldeffekttransistoren |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MX2007006725A true MX2007006725A (es) | 2007-07-25 |
Family
ID=36578264
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MX2007006725A MX2007006725A (es) | 2004-12-10 | 2005-12-06 | Puerta de transistor de efecto de campo organico. |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US20080197343A1 (enExample) |
| EP (1) | EP1825516A2 (enExample) |
| JP (1) | JP2008523595A (enExample) |
| KR (1) | KR20070085953A (enExample) |
| CN (1) | CN101076893A (enExample) |
| AU (1) | AU2005313714A1 (enExample) |
| CA (1) | CA2595114A1 (enExample) |
| DE (1) | DE102004059467A1 (enExample) |
| MX (1) | MX2007006725A (enExample) |
| TW (1) | TWI333701B (enExample) |
| WO (1) | WO2006061000A2 (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1735871A (zh) | 2003-05-16 | 2006-02-15 | 日本波技术集团有限公司 | 防止数字内容的未授权使用的系统 |
| JP2008010566A (ja) * | 2006-06-28 | 2008-01-17 | Ricoh Co Ltd | 半導体デバイス |
| DE102006037433B4 (de) | 2006-08-09 | 2010-08-19 | Ovd Kinegram Ag | Verfahren zur Herstellung eines Mehrschichtkörpers sowie Mehrschichtkörper |
| KR100790761B1 (ko) * | 2006-09-29 | 2008-01-03 | 한국전자통신연구원 | 인버터 |
| JP5104057B2 (ja) * | 2007-06-21 | 2012-12-19 | セイコーエプソン株式会社 | 半導体装置の製造方法 |
| US20090004368A1 (en) * | 2007-06-29 | 2009-01-01 | Weyerhaeuser Co. | Systems and methods for curing a deposited layer on a substrate |
| TWI412125B (zh) | 2007-07-17 | 2013-10-11 | Creator Technology Bv | 電子元件及電子元件之製法 |
| US20090165056A1 (en) * | 2007-12-19 | 2009-06-25 | General Instrument Corporation | Method and apparatus for scheduling a recording of an upcoming sdv program deliverable over a content delivery system |
| US7704786B2 (en) * | 2007-12-26 | 2010-04-27 | Organicid Inc. | Printed organic logic circuits using a floating gate transistor as a load device |
| US7888169B2 (en) * | 2007-12-26 | 2011-02-15 | Organicid, Inc. | Organic semiconductor device and method of manufacturing the same |
| US8463116B2 (en) * | 2008-07-01 | 2013-06-11 | Tap Development Limited Liability Company | Systems for curing deposited material using feedback control |
| JP2010034343A (ja) * | 2008-07-30 | 2010-02-12 | Sumitomo Chemical Co Ltd | 半導体装置の製造方法および半導体装置 |
| DE102009012302A1 (de) * | 2009-03-11 | 2010-09-23 | Polyic Gmbh & Co. Kg | Elektronisches Bauelement |
| JP5548976B2 (ja) * | 2009-06-25 | 2014-07-16 | セイコーエプソン株式会社 | 半導体装置 |
| JP5558222B2 (ja) * | 2010-06-18 | 2014-07-23 | シャープ株式会社 | 薄膜トランジスタ基板の製造方法 |
| CN107104188A (zh) * | 2017-04-20 | 2017-08-29 | 上海幂方电子科技有限公司 | 有机互补型非门器件的制备方法 |
| CN109920922B (zh) * | 2017-12-12 | 2020-07-17 | 京东方科技集团股份有限公司 | 有机发光器件及其制备方法、显示基板、显示驱动方法 |
| CN113130661A (zh) * | 2021-04-19 | 2021-07-16 | 湖南大学 | 一种无屏蔽三栅晶体管器件和基于其的电阻型全摆幅反相器 |
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-
2004
- 2004-12-10 DE DE102004059467A patent/DE102004059467A1/de not_active Ceased
-
2005
- 2005-12-06 MX MX2007006725A patent/MX2007006725A/es not_active Application Discontinuation
- 2005-12-06 US US11/721,244 patent/US20080197343A1/en not_active Abandoned
- 2005-12-06 KR KR1020077013005A patent/KR20070085953A/ko not_active Ceased
- 2005-12-06 CA CA002595114A patent/CA2595114A1/en not_active Abandoned
- 2005-12-06 CN CNA200580042446XA patent/CN101076893A/zh active Pending
- 2005-12-06 WO PCT/DE2005/002195 patent/WO2006061000A2/de not_active Ceased
- 2005-12-06 AU AU2005313714A patent/AU2005313714A1/en not_active Abandoned
- 2005-12-06 JP JP2007544729A patent/JP2008523595A/ja active Pending
- 2005-12-06 EP EP05850139A patent/EP1825516A2/de not_active Withdrawn
- 2005-12-07 TW TW094143111A patent/TWI333701B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| EP1825516A2 (de) | 2007-08-29 |
| AU2005313714A1 (en) | 2006-06-15 |
| WO2006061000A3 (de) | 2006-08-24 |
| TW200640050A (en) | 2006-11-16 |
| KR20070085953A (ko) | 2007-08-27 |
| WO2006061000A2 (de) | 2006-06-15 |
| JP2008523595A (ja) | 2008-07-03 |
| CN101076893A (zh) | 2007-11-21 |
| CA2595114A1 (en) | 2006-06-15 |
| US20080197343A1 (en) | 2008-08-21 |
| DE102004059467A1 (de) | 2006-07-20 |
| TWI333701B (en) | 2010-11-21 |
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| FA | Abandonment or withdrawal |