MX13996A - Procedimiento para la preparacion de titanocenos yproducto obtenido. - Google Patents
Procedimiento para la preparacion de titanocenos yproducto obtenido.Info
- Publication number
- MX13996A MX13996A MX1399688A MX1399688A MX13996A MX 13996 A MX13996 A MX 13996A MX 1399688 A MX1399688 A MX 1399688A MX 1399688 A MX1399688 A MX 1399688A MX 13996 A MX13996 A MX 13996A
- Authority
- MX
- Mexico
- Prior art keywords
- titanocene
- procedure
- preparation
- product obtained
- substituted
- Prior art date
Links
- KOMDZQSPRDYARS-UHFFFAOYSA-N cyclopenta-1,3-diene titanium Chemical compound [Ti].C1C=CC=C1.C1C=CC=C1 KOMDZQSPRDYARS-UHFFFAOYSA-N 0.000 title 1
- -1 1-pyrryl Chemical group 0.000 abstract 1
- 125000002373 5 membered heterocyclic group Chemical group 0.000 abstract 1
- 125000004008 6 membered carbocyclic group Chemical group 0.000 abstract 1
- 125000004070 6 membered heterocyclic group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 abstract 1
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 abstract 1
- 229910052731 fluorine Inorganic materials 0.000 abstract 1
- 125000001153 fluoro group Chemical group F* 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 125000001424 substituent group Chemical group 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D207/32—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/325—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms with substituted hydrocarbon radicals directly attached to the ring nitrogen atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D207/32—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/33—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms with substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/333—Radicals substituted by oxygen or sulfur atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D207/32—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/33—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms with substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/335—Radicals substituted by nitrogen atoms not forming part of a nitro radical
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
- C07D405/04—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F17/00—Metallocenes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
- C07F7/0812—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te comprising a heterocyclic ring
- C07F7/0814—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te comprising a heterocyclic ring said ring is substituted at a C ring atom by Si
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/28—Titanium compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/148—Light sensitive titanium compound containing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Pyrrole Compounds (AREA)
- Dental Preparations (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH468387 | 1987-12-01 |
Publications (2)
Publication Number | Publication Date |
---|---|
MX13996A true MX13996A (es) | 1993-10-01 |
MX173654B MX173654B (es) | 1994-03-22 |
Family
ID=4280676
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX013996A MX173654B (es) | 1987-12-01 | 1988-11-30 | Procedimiento para la preparacion de titanocenos y producto obtenido |
Country Status (14)
Country | Link |
---|---|
US (2) | US5008302A (es) |
EP (1) | EP0318894B1 (es) |
JP (1) | JP2764288B2 (es) |
KR (1) | KR0120391B1 (es) |
AT (1) | ATE101613T1 (es) |
AU (1) | AU610953B2 (es) |
BR (1) | BR8806307A (es) |
CA (1) | CA1337765C (es) |
DE (1) | DE3887837D1 (es) |
HK (1) | HK103296A (es) |
MX (1) | MX173654B (es) |
RU (2) | RU1792538C (es) |
SU (1) | SU1713438A3 (es) |
ZA (1) | ZA888961B (es) |
Families Citing this family (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU599400B2 (en) * | 1986-08-01 | 1990-07-19 | Ciba-Geigy Ag | Titanocenes and their use |
US4954885A (en) * | 1987-02-25 | 1990-09-04 | Mitsubishi Denki Kabushiki Kaisha | Filter for separating luminance and chrominance signals from composite color television signal |
US5075467A (en) * | 1989-06-01 | 1991-12-24 | Ciba-Geigy Corporation | Process for the preparation of titanocenes containing o,o'-difluoroaryl ligands |
DE59007807D1 (de) * | 1989-06-01 | 1995-01-12 | Ciba Geigy Ag | Neue sauerstoffhaltige Titanocene und deren Verwendung. |
US5068371A (en) * | 1989-06-01 | 1991-11-26 | Ciba-Geigy Corporation | Novel nitrogen-containing titanocenes, and the use thereof |
IT1237084B (it) * | 1989-10-03 | 1993-05-18 | Chimia Prodotti E Processi Srl | Sensibilizzazione di composti metallorganici per la polimerizzazione radicalica fotocatalizzata e stabilizzazione dei preparati. |
DE4007428A1 (de) * | 1990-03-09 | 1991-09-12 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
EP0497552B1 (en) * | 1991-01-29 | 1996-05-22 | National Starch and Chemical Investment Holding Corporation | Photopolymerisable compositions |
US5087790A (en) * | 1991-06-12 | 1992-02-11 | University Of Southern California | Method for olefination of carbonyl compounds using titanocene derivatives |
TW237456B (es) * | 1992-04-09 | 1995-01-01 | Ciba Geigy | |
US5499127A (en) * | 1992-05-25 | 1996-03-12 | Sharp Kabushiki Kaisha | Liquid crystal display device having a larger gap between the substrates in the display area than in the sealant area |
AT401520B (de) * | 1994-03-22 | 1996-09-25 | Danubia Petrochem Polymere | Metallocene und deren einsatz für die olefinpolymerisation |
DE4418645C1 (de) | 1994-05-27 | 1995-12-14 | Sun Chemical Corp | Lichtempfindliches Gemisch und daraus herstellbares Aufzeichnungsmaterial |
JP3478630B2 (ja) * | 1995-02-09 | 2003-12-15 | 富士写真フイルム株式会社 | 光重合性組成物 |
US5731363A (en) * | 1995-03-20 | 1998-03-24 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition containing sensitizing dye and titanocene compound |
DE69620723T2 (de) | 1995-12-22 | 2002-12-05 | Mitsubishi Chem Corp | Fotopolymerisierbare Zusammensetzung für einen Farbfilter, Farbfilter und Flüssigkristallanzeigevorrichtung |
US5939148A (en) * | 1996-09-13 | 1999-08-17 | Kansai Paint Co., Ltd. | Visible laser-curable composition |
CN1052485C (zh) * | 1997-09-03 | 2000-05-17 | 中国石油化工总公司 | 茂金属钛化合物 |
EP1117698B1 (en) * | 1998-09-28 | 2006-04-19 | Kimberly-Clark Worldwide, Inc. | Chelates comprising chinoid groups as photoinitiators |
JP4130030B2 (ja) | 1999-03-09 | 2008-08-06 | 富士フイルム株式会社 | 感光性組成物および1,3−ジヒドロ−1−オキソ−2h−インデン誘導体化合物 |
DE19961355A1 (de) | 1999-12-17 | 2001-06-21 | S & C Polymer Silicon & Compos | Photoinitiatorsystem mit Titanocen-Initiatoren |
US6936384B2 (en) | 2002-08-01 | 2005-08-30 | Kodak Polychrome Graphics Llc | Infrared-sensitive composition containing a metallocene derivative |
DE10255663B4 (de) * | 2002-11-28 | 2006-05-04 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Elemente |
DE10255667B4 (de) * | 2002-11-28 | 2006-05-11 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Elemente mit ausgezeichneter Lagerbeständigkeit |
JP2005300908A (ja) | 2004-04-12 | 2005-10-27 | Konica Minolta Medical & Graphic Inc | 感光性組成物及び感光性平版印刷版材料 |
CN100541327C (zh) * | 2004-05-21 | 2009-09-16 | 明德国际仓储贸易(上海)有限公司 | 液晶显示元件散乱层光阻组成物 |
JP4452572B2 (ja) | 2004-07-06 | 2010-04-21 | 富士フイルム株式会社 | 感光性組成物およびそれを用いた画像記録方法 |
JP5089866B2 (ja) | 2004-09-10 | 2012-12-05 | 富士フイルム株式会社 | 平版印刷方法 |
JP5102454B2 (ja) | 2006-03-03 | 2012-12-19 | 富士フイルム株式会社 | チタノセン系化合物、感光性組成物、及び感光性転写シート |
CN101679555B (zh) | 2007-05-23 | 2012-05-23 | 昭和电工株式会社 | 具有醚键的反应性氨基甲酸酯化合物、固化性组合物及固化物 |
JP4890408B2 (ja) | 2007-09-28 | 2012-03-07 | 富士フイルム株式会社 | 重合性組成物及びそれを用いた平版印刷版原版、アルカリ可溶性ポリウレタン樹脂、並びに、ジオール化合物の製造方法 |
EP2342237B1 (en) | 2008-11-03 | 2014-04-23 | Basf Se | Photoinitiator mixtures |
JP5374403B2 (ja) | 2009-02-13 | 2013-12-25 | 三菱製紙株式会社 | 感光性平版印刷版材料 |
US20100227269A1 (en) | 2009-03-04 | 2010-09-09 | Simpson Christopher D | Imageable elements with colorants |
US20120208914A1 (en) | 2011-02-14 | 2012-08-16 | Deepak Shukla | Photoinitiator compositions and uses |
US20120207935A1 (en) | 2011-02-14 | 2012-08-16 | Deepak Shukla | Photocurable inks and methods of use |
US8816211B2 (en) | 2011-02-14 | 2014-08-26 | Eastman Kodak Company | Articles with photocurable and photocured compositions |
CN102584904A (zh) * | 2011-08-03 | 2012-07-18 | 湖北固润科技股份有限公司 | 光引发剂gr-fmt的生产方法 |
CN107340688B (zh) * | 2016-04-29 | 2022-05-06 | 东友精细化工有限公司 | 硬掩模用组合物 |
TWI766073B (zh) | 2017-07-21 | 2022-06-01 | 台橡股份有限公司 | 用於製備發泡體的組合物、發泡體以及包含該發泡體的鞋體 |
US10465029B2 (en) * | 2018-02-02 | 2019-11-05 | Pacific Light & Hologram, Inc. | Photosensitive resin and manufacturing method thereof |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4590287A (en) * | 1983-02-11 | 1986-05-20 | Ciba-Geigy Corporation | Fluorinated titanocenes and photopolymerizable composition containing same |
US4548891A (en) * | 1983-02-11 | 1985-10-22 | Ciba Geigy Corporation | Photopolymerizable compositions containing prepolymers with olefin double bonds and titanium metallocene photoinitiators |
US4713401A (en) * | 1984-12-20 | 1987-12-15 | Martin Riediker | Titanocenes and a radiation-polymerizable composition containing these titanocenes |
GB8515475D0 (en) * | 1985-06-19 | 1985-07-24 | Ciba Geigy Ag | Forming images |
KR910000199B1 (ko) * | 1986-04-15 | 1991-01-23 | 시바-가이기 코오포레이숀 | 액체 광개시제 혼합물 |
US4849320A (en) * | 1986-05-10 | 1989-07-18 | Ciba-Geigy Corporation | Method of forming images |
EP0269573B1 (de) * | 1986-11-26 | 1991-03-27 | Ciba-Geigy Ag | Flüssige Photoinitiatorgemische |
-
1988
- 1988-11-21 US US07/273,522 patent/US5008302A/en not_active Expired - Lifetime
- 1988-11-28 EP EP88119799A patent/EP0318894B1/de not_active Expired - Lifetime
- 1988-11-28 DE DE88119799T patent/DE3887837D1/de not_active Expired - Lifetime
- 1988-11-28 AT AT88119799T patent/ATE101613T1/de not_active IP Right Cessation
- 1988-11-29 CA CA000584482A patent/CA1337765C/en not_active Expired - Fee Related
- 1988-11-30 SU SU884356932A patent/SU1713438A3/ru active
- 1988-11-30 ZA ZA888961A patent/ZA888961B/xx unknown
- 1988-11-30 MX MX013996A patent/MX173654B/es unknown
- 1988-11-30 BR BR888806307A patent/BR8806307A/pt not_active IP Right Cessation
- 1988-12-01 JP JP63305137A patent/JP2764288B2/ja not_active Expired - Lifetime
- 1988-12-01 KR KR1019880016124A patent/KR0120391B1/ko not_active IP Right Cessation
- 1988-12-01 AU AU26462/88A patent/AU610953B2/en not_active Ceased
-
1989
- 1989-05-18 RU SU894614056A patent/RU1792538C/ru active
-
1990
- 1990-08-14 US US07/567,048 patent/US5106722A/en not_active Expired - Lifetime
-
1991
- 1991-11-14 RU SU915001952A patent/RU2086555C1/ru not_active IP Right Cessation
-
1996
- 1996-06-13 HK HK103296A patent/HK103296A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US5106722A (en) | 1992-04-21 |
RU1792538C (ru) | 1993-01-30 |
BR8806307A (pt) | 1989-08-15 |
US5008302A (en) | 1991-04-16 |
AU2646288A (en) | 1989-06-01 |
MX173654B (es) | 1994-03-22 |
SU1713438A3 (ru) | 1992-02-15 |
EP0318894A2 (de) | 1989-06-07 |
HK103296A (en) | 1996-06-21 |
CA1337765C (en) | 1995-12-19 |
EP0318894B1 (de) | 1994-02-16 |
KR0120391B1 (ko) | 1997-10-22 |
ATE101613T1 (de) | 1994-03-15 |
EP0318894A3 (en) | 1990-05-16 |
AU610953B2 (en) | 1991-05-30 |
JPH02291A (ja) | 1990-01-05 |
JP2764288B2 (ja) | 1998-06-11 |
RU2086555C1 (ru) | 1997-08-10 |
DE3887837D1 (de) | 1994-03-24 |
KR890009954A (ko) | 1989-08-05 |
ZA888961B (en) | 1989-07-26 |
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