KR980005300U - Vacuum pad structure for wafer transfer of wafer alignment equipment - Google Patents

Vacuum pad structure for wafer transfer of wafer alignment equipment

Info

Publication number
KR980005300U
KR980005300U KR2019960016439U KR19960016439U KR980005300U KR 980005300 U KR980005300 U KR 980005300U KR 2019960016439 U KR2019960016439 U KR 2019960016439U KR 19960016439 U KR19960016439 U KR 19960016439U KR 980005300 U KR980005300 U KR 980005300U
Authority
KR
South Korea
Prior art keywords
wafer
pad structure
vacuum pad
alignment equipment
wafer transfer
Prior art date
Application number
KR2019960016439U
Other languages
Korean (ko)
Other versions
KR200143983Y1 (en
Inventor
이주용
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019960016439U priority Critical patent/KR200143983Y1/en
Publication of KR980005300U publication Critical patent/KR980005300U/en
Application granted granted Critical
Publication of KR200143983Y1 publication Critical patent/KR200143983Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR2019960016439U 1996-06-19 1996-06-19 Vacuum pad structure used in transporting wafer of alignment apparatus KR200143983Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019960016439U KR200143983Y1 (en) 1996-06-19 1996-06-19 Vacuum pad structure used in transporting wafer of alignment apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019960016439U KR200143983Y1 (en) 1996-06-19 1996-06-19 Vacuum pad structure used in transporting wafer of alignment apparatus

Publications (2)

Publication Number Publication Date
KR980005300U true KR980005300U (en) 1998-03-30
KR200143983Y1 KR200143983Y1 (en) 1999-06-15

Family

ID=19458904

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019960016439U KR200143983Y1 (en) 1996-06-19 1996-06-19 Vacuum pad structure used in transporting wafer of alignment apparatus

Country Status (1)

Country Link
KR (1) KR200143983Y1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8318512B2 (en) * 2009-04-29 2012-11-27 Applied Materials, Inc. Automated substrate handling and film quality inspection in solar cell processing

Also Published As

Publication number Publication date
KR200143983Y1 (en) 1999-06-15

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Legal Events

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A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

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